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Content archived on 2024-05-21

Online monitoring and in situ control of epitaxy metal organic chemical vapor deposition - isce-mocvd -

Objective

Metal organic Chemical Vapour deposition (MOCVD) is a key manufacturing process for microelectronic and optic-electronic devices. However, in a MOCVD production process the deposition process is not monitorable, nor due to a lack of in-process mononitoring closed loop controllable. We focus on in site monitoring of the MOCVD process for the two material systems, which are the industrially most requested: alternary and quaternary {al , ga , in} -{as , p sb} semi conductors for optical communication applications and b) on gallium nitride (GAN) and related materials, which have promising applications for blue laser diodes, high power microwave semi conductor devices ect. This project aims on using, improving, combining and developing real time monitoring techniques and closed loop feedback control of epitaxial growth, where the sensors in site used are purely optical ones, compatible with different industrially used MOCVD growth systems.

Fields of science (EuroSciVoc)

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Programme(s)

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Topic(s)

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Funding Scheme

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CSC - Cost-sharing contracts

Coordinator

AIXTRON AG
EU contribution
No data
Total cost

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Participants (8)

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