Ziel
For many of the processing steps in the manufacture of thin film microelectronic devices, plasma is the only way to generate the required active chemical species. In the processing of ultra-thin layers with steady-state plasma there are problems associated with charging and breakdown of dielectric layers. Pulsed plasmas offer a way to overcome these problems, but new methods are required for the monitoring and control of such plasmas. The aim of this proposal is to develop and test the new diagnostic instrumentation required for pulsed plasma processing. Time-resolving Langmuir probes and optical spectrometry will be developed to diagnose the plasma, and optical reflectrometry will be used to monitor the film growth. The test bed for the validation of these new techniques will be a pulsed laser deposition facility for the manufacture of SQUID magnetometers. However, this new instrumentation will find application in a wide variety of pulsed plasma processes.
Wissenschaftliches Gebiet
Programm/Programme
Aufforderung zur Vorschlagseinreichung
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CSC - Cost-sharing contractsKoordinator
4000 ROSKILDE
Dänemark