Objective
Pushing 193 nm optical lithography to its limits, LICOTRENAS will provide IC makers with exposure tool performance necessary to manufacture ICs with 100nm (dense) and 70 nm (isolated) features. This project is part of a larger program to develop a high aperture 193 nm high throughput lithography tool, including stable materials, metrology, process, reticle know-how and to demonstrate its feasibility at 100 nm. The work in this specific project is divided in 2 workpackages: manufacturing metrology for materials and sub-systems, and integration of sub-systems plus evaluation of their performance at system level.
Call for proposal
Data not availableFunding Scheme
CSC - Cost-sharing contractsCoordinator
ASM LITHOGRAPHY B.V.
EU contribution
No data
Address
DE RUN 1110
5503 LA VELDHOVEN
Netherlands
5503 LA VELDHOVEN
Netherlands
Total cost
No data