Objective Pushing 193 nm optical lithography to its limits, LICOTRENAS will provide IC makers with exposure tool performance necessary to manufacture ICs with 100nm (dense) and 70 nm (isolated) features. This project is part of a larger program to develop a high aperture 193 nm high throughput lithography tool, including stable materials, metrology, process, reticle know-how and to demonstrate its feasibility at 100 nm. The work in this specific project is divided in 2 workpackages: manufacturing metrology for materials and sub-systems, and integration of sub-systems plus evaluation of their performance at system level. Programme(s) FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002" Topic(s) 1.1.2.-4.8.3 - Processes, equipment and materials Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator ASM LITHOGRAPHY B.V. EU contribution No data Address DE RUN 1110 5503 LA VELDHOVEN Netherlands See on map Total cost No data Participants (5) Sort alphabetically Sort by EU Contribution Expand all Collapse all CARL ZEISS Germany EU contribution No data Address 73446 OBERKOCHEN See on map Total cost No data HERAEUS QUARZGLAS GMBH & CO KG Germany EU contribution No data Address QUARZSTRASSE 63450 HANAU See on map Total cost No data HONEYWELL SPECIALTY CHEMICALS SEELZE GMBH Germany EU contribution No data Address WUNSTORFERSTRASSE 40 30926 SEELZE See on map Total cost No data LAMBDA PHYSIK AG Germany EU contribution No data Address HANS-BOECKLER-STRASSE 12 37073 GOETTINGEN See on map Total cost No data SCHOTT LITHOTEC AG Germany EU contribution No data Address OTTO-SCHOTT-STRASSE 13 07745 JENA See on map Total cost No data
