Objetivo
Pushing 193 nm optical lithography to its limits, LICOTRENAS will provide IC makers with exposure tool performance necessary to manufacture ICs with 100nm (dense) and 70 nm (isolated) features. This project is part of a larger program to develop a high aperture 193 nm high throughput lithography tool, including stable materials, metrology, process, reticle know-how and to demonstrate its feasibility at 100 nm. The work in this specific project is divided in 2 workpackages: manufacturing metrology for materials and sub-systems, and integration of sub-systems plus evaluation of their performance at system level.
Convocatoria de propuestas
Data not availableRégimen de financiación
CSC - Cost-sharing contractsCoordinador
ASM LITHOGRAPHY B.V.
Aportación de la UE
Sin datos
Dirección
DE RUN 1110
5503 LA VELDHOVEN
Países Bajos
5503 LA VELDHOVEN
Países Bajos
Coste total
Sin datos