Objective
The aim of the work is to deal with the main difficulties involved in the Plasma Assisted Chemical Vapour Deposition (PA-CVD) of amorphous hydro-generated silicon (a-Si:H)
Research has been carried out in order to deal with the main difficulties involved in the plasma assisted chemical vapour deposition (PA-CVD) of amorphous hydrogenerated silicon. The study involves correlating the amorphous film quality with microscopic rather than macroscopic plasma parameters while continuously developing the deposition process. Results so far have shown that poor photon absorption in very thin amorphous silicon enhances photostability but decreases conversation efficiency. This problem was solved by using multijunction cells to absorb a larger spectrum.
The idea that stands behind our approach is to correlate the amorphous film quality with microscopic, rather than macroscopic, plasma parameters while continuously developing the deposition process. Our approach is outlined in the following table:
1) Improvement required:
1.1 Enhancement of the deposition rate
1.2 Enhancement of film characteristics
- Film uniformity
- Film quality
2) Use of extensive diagnostics for the:
2.1 Elucidation of mechanism
2.2 Modelling
2.3 Effective process control
3) Modification of the process
3.1 Modification of plasma characteristics
- Geometrical effects
- Frequency effects
3.2 Modification of the feed gas
- Dilution effects
- Use of Disilane
3.3 Alternative and similar materials
- Application to a-Si:Ge
- Application to a-Si:C
- Application to a-Si:F:H
Fields of science
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques.
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques.
Topic(s)
Data not availableCall for proposal
Data not availableFunding Scheme
CSC - Cost-sharing contractsCoordinator
26500 PATRAS
Greece