OXYGEN IN SEMICONDUCTOR SILICON

Objective

The oxygen content of silicon is an important parameter for the manufacturing of integrated circuits and other electronic devices. The measurements are based on infrared absorption spectrometry. Results of infrared absorption measurement often differ by several percent between different laboratories. Industry has therefore requested the BCR programme to produce silicon reference materials (zero specimens needed in the measurements as well as samples to check infrared spectrometers).

RESULTS

Intercomparisons have been organized to improve the measurements of the actual oxygen content and of the infrared absorption.
Two reference materials have been certified.
CRM 368: silicon with very low 0 content, to be used as "zero"
specimens: 69 +/- 19 ng/g
Certification report: EUR 12927 (1990)
CRM 369: silicon with 0 contents in the range of industrial interest, for testing the accuracy (photometry + software) or the IR Instruments:
absorption coefficients in the range 2.2 - 3.8 cm{-1}
oxygen contents in the range 8 - 13 ug/g
Certification report : EUR 12928 (1991)

Programme(s)

• FP2-BCR 4 - Research and development programme (EEC) in the field of applied metrology and chemical analysis (Community Bureau of Reference - BCR), 1988-1992

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

United Kingdom Atomic Energy Authority (UKAEA)

Address

Harwell Laboratory
OX11 0RA Didcot
United Kingdom

Participants (16)

Centre d'Etudes et de Recherches par Irradiation

France

Address

Orleans

Dynamit Nobel Silicon

Italy

Address

28100 Novara

ECOLE NORMALE SUPÉRIEURE

France

Address

Paris

FEDERAL INSTITUTE FOR MATERIAL RESEARCH AND TESTING

Germany

Address

87,Unter Der Eichen 87
12205 Berlin

Imperial College of Science, Technology and Medicine

United Kingdom

Address

SW7 2AZ London

Instituut voor Nucleaire Wetenschappen (RUG)

Belgium

Address

Gent

Johann-Wolfgang-Goethe-Universität Frankfurt

Germany

Address

August Euler Straße 6
60486 Frankfurt Am Main

Joint Research Centre

Belgium

Address

Geel

Laboratorium voor Kristallografie en Studie van de Vaste Stof (RUG)

Belgium

Address

Gent

Max-Planck-Gesellschaft zur Förderung der Wissenschaften eV

Germany

Address

Bunsen-kirchhoff-straße 13
44139 Dortmund

Philips Components

United Kingdom

Address

SO Southampton

Royal Signals and Radar Establishment

United Kingdom

Address

Great Malvern

Siemens AG

Germany

Address

Otto-hahn-ring 6
81739 München

Telefunken Microelectronic GmbH

Germany

Address

Theresienstraße 2
74072 Heilbronn

UNIVERSITY OF READING

United Kingdom

Address

Whiteknigts
RG6 6AF Reading / Silchester

Wacker Chemitronic

Germany

Address

Johannes-hess-straße 24
84489 Burghausen