Obiettivo - Provision of concepts for a 193 nm lithography tool.- Development of a 193 nm excimer laser.- Selection of optical materials for use in and predevelopment of a 193 nm projection system.- Definition of user requirements for a production exposure tool.- Resists predevelopment and evaluation.The project links leading European materials and equipment suppliers and research institutes in the area of advanced lithography, being the first phase of a combined European effort to provide 193 nm lithography tools and resists for the Gigabit DRAM technology generations, i.e. for 0.18 and 0.12 micron feature sizes. The two main workpackages will focus on production exposure tool design and predevelopment and on a litho cell for 193 nm process development. The ultimate goal is to make available a European optical exposure tool and resist processes compatible with 0.18/0.12 micron manufacturing requirements by the year 2000. Campo scientifico natural sciencesphysical sciencesopticslaser physics Programma(i) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Argomento(i) 2.8 - Semiconductors - Building blocks, methods & tools Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore Grenoble Submicron Silicon Contributo UE Nessun dato Indirizzo Avenue Des Martyrs 17 38054 Grenoble 9 Francia Mostra sulla mappa Costo totale Nessun dato Partecipanti (8) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto Asm Lithography B.V. Paesi Bassi Contributo UE Nessun dato Indirizzo De Run, 110 5503 LA Veldhoven Mostra sulla mappa Costo totale Nessun dato CCLRC Rutherford Appleton Laboratory (RAL) Regno Unito Contributo UE Nessun dato Indirizzo Chilton OX11 0QX Didcot Mostra sulla mappa Collegamenti Sito web Opens in new window Costo totale Nessun dato Carl Zeiss Germania Contributo UE Nessun dato Indirizzo Carl Zeiss-Str. 4-54 4-54 73446 Oberkochen Mostra sulla mappa Costo totale Nessun dato Exitech Ltd Regno Unito Contributo UE Nessun dato Indirizzo Hanborough Park OX7 2LH Long Hanborough Mostra sulla mappa Costo totale Nessun dato HERAEUS QUARZSCHMELZE Germania Contributo UE Nessun dato Indirizzo QUARZSTRAßE 8 63450 HANAU Mostra sulla mappa Costo totale Nessun dato Interuniversity Microelectronics Centre Belgio Contributo UE Nessun dato Indirizzo Kapeldreef 75 3001 Leuven Mostra sulla mappa Costo totale Nessun dato Korth Kristalle Gmbh Germania Contributo UE Nessun dato Indirizzo Am Jaegersberg 3 24161 Altenholz Mostra sulla mappa Costo totale Nessun dato Lambda Physic Gesellschaft Zur Herstellung Von Lasern Mbh Germania Contributo UE Nessun dato Indirizzo Hans-Boeckler-Strasse 12 37079 Goettingen Mostra sulla mappa Costo totale Nessun dato