A nanometre scale machine shop
Science has managed to shrink memory chips while at the same time increasing their storage capacity. But memory chips are not the only things getting smaller. Man is now attempting to build devices on the order of the size of atoms. The application areas are numerous and include computing, medicine, military, biotechnology and others. Yet building components in the sub-micron, or nanometre, realm requires extremely precise equipment and is in general very costly. New, less expensive nanofabrication techniques are constantly being sought. The Information Society Technologies Programme helps bring together researchers from across Europe and funds their efforts to discover new techniques that meet these high demands. The CHANIL project targeted the specific technique of NanoImprint Lithography (NIL). In order to avoid the drawbacks associated with traditional materials like polymethylmethacrylate, CHANIL researchers introduced cross-linked polymers. This innovation safeguards excellent thermal stability and dry etching characteristics, but avoids high imprinting temperatures and the problems associated with them. New structures were created with resolution down to 50 nanometres using both thermally and photochemically cross-linked polymers. The new NIL resists have enjoyed good publicity at various international conferences. German SME micro resist technology GmbH is aggressively marketing the new products. This work will help Europe maintain a competitive position in this emerging market. The image shows 100nm lines and spaces in photochemically cross-linked polymer.
