Project description
Novel metrology techniques support advanced chip manufacture
Since the first integrated circuit (IC) was produced more than 60 years ago, ICs have revolutionised our lives. They are ubiquitous, found in smartphones, televisions, laptops, cameras, computers, and so much more. Manufacturing technologies are now hitting a roadblock. Extreme ultraviolet (EUV) lithography is a promising printing process for high-volume manufacturing of ICs, yet the exact mechanism of the lithographic process is not well understood due to a lack of metrology techniques that can capture the complex chemistries that occur in EUV lithography. The EU-funded ATTO-SPIE project will develop innovative metrology techniques that will aid in the understanding of the EUV lithographic process while also providing fundamental insights that will enable enhanced control of outcomes in EUV lithographic printing.
Objective
After more than 40 years of development, the semiconductor industry is currently experiencing a paradigm shift as it transitions from deep ultraviolet (UV) to extreme UV (EUV) lithography for high-volume manufacturing (HVM) of integrated circuits (ICs) to ensure further device scaling to the future technology nodes. However, integration of EUV lithographic scanners in HVM pipelines has been stymied by an incomplete knowledge of the in-situ photoresist radiochemistry that occurs during EUV exposure, which has prevented engineering of photoresists to reduce stochastic print failures and subsequent device failure rates. The proposed action, ATTOsecond Spectromicroscopies for Photoresist Improvement and Efficacy (ATTO-SPIE) will bridge this knowledge gap by developing and deploying spatiotemporal metrologies that can track the in-situ electro-chemical dynamics occurring during EUV exposure.
ATTO-SPIE will capitalise on the Experienced Researcher’s (ER) expertise on the generation and use of attosecond EUV light for time-resolved spectroscopies, as well as the knowhow of an experienced team of complementary supervisors and a state-of-the-art attosecond metrology lab (AttoLab) located in a world-leading semiconductor R&D hub (IMEC) to develop new metrology techniques that will enable resolution of the EUV exposure mechanism. This ambitious aim will be accomplished via three thrusts: i) quantification of EUV exposure kinetics in photoresists, ii) ultrafast spectroscopies to track transient chemical dynamics of EUV exposure, and iii) in-situ spatiotemporal photoelectron microscopies, all of which will be key for unraveling the complexities of the EUV exposure mechanism. The results of ATTO-SPIE will not only provide new metrology tools for photoresist research, but also stimulate new avenues in ultrafast metrologies for the semiconductor industry, while also enhancing the career potential of the ER and increasing the current knowledge base of resist radiation chemistry.
Fields of science (EuroSciVoc)
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques. See: The European Science Vocabulary.
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques. See: The European Science Vocabulary.
- natural sciences chemical sciences nuclear chemistry radiochemistry
- natural sciences physical sciences optics microscopy
- natural sciences physical sciences electromagnetism and electronics semiconductivity
- natural sciences chemical sciences nuclear chemistry radiation chemistry
- natural sciences physical sciences optics spectroscopy
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Keywords
Project’s keywords as indicated by the project coordinator. Not to be confused with the EuroSciVoc taxonomy (Fields of science)
Project’s keywords as indicated by the project coordinator. Not to be confused with the EuroSciVoc taxonomy (Fields of science)
Programme(s)
Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Multi-annual funding programmes that define the EU’s priorities for research and innovation.
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H2020-EU.1.3. - EXCELLENT SCIENCE - Marie Skłodowska-Curie Actions
MAIN PROGRAMME
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H2020-EU.1.3.2. - Nurturing excellence by means of cross-border and cross-sector mobility
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Topic(s)
Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
Funding Scheme
Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
MSCA-IF - Marie Skłodowska-Curie Individual Fellowships (IF)
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Call for proposal
Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.
Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.
(opens in new window) H2020-MSCA-IF-2020
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Net EU financial contribution. The sum of money that the participant receives, deducted by the EU contribution to its linked third party. It considers the distribution of the EU financial contribution between direct beneficiaries of the project and other types of participants, like third-party participants.
3001 Leuven
Belgium
The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.