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ATTOsecond Spectro-microscopies for Photoresist Improvement and Efficacy

Project description

Novel metrology techniques support advanced chip manufacture

Since the first integrated circuit (IC) was produced more than 60 years ago, ICs have revolutionised our lives. They are ubiquitous, found in smartphones, televisions, laptops, cameras, computers, and so much more. Manufacturing technologies are now hitting a roadblock. Extreme ultraviolet (EUV) lithography is a promising printing process for high-volume manufacturing of ICs, yet the exact mechanism of the lithographic process is not well understood due to a lack of metrology techniques that can capture the complex chemistries that occur in EUV lithography. The EU-funded ATTO-SPIE project will develop innovative metrology techniques that will aid in the understanding of the EUV lithographic process while also providing fundamental insights that will enable enhanced control of outcomes in EUV lithographic printing.

Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
Net EU contribution
€ 166 320,00
Address
Kapeldreef 75
3001 Leuven
Belgium

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Region
Vlaams Gewest Prov. Vlaams-Brabant Arr. Leuven
Activity type
Research Organisations
Non-EU contribution
€ 0,00