Description du projet
Les lasers pour une fabrication industrielle plus durable
Les technologies basées sur le laser qui fabriquent des structures dont la taille va du nanomètre au millimètre ont des applications variées, notamment la photonique, les surfaces multifonctionnelles et les laboratoires sur puce. La lithographie laser est utilisée pour produire ces structures très fines, mais ses procédés présentent plusieurs limites. Le projet OPTIMAL, financé par l’UE, combinera pour la première fois différentes technologies de lithographie laser et des systèmes de contrôle de la qualité en une seule plateforme pour développer certaines structures. Elle vise à accélérer et à améliorer la procédure de structuration. Cela devrait permettre d’améliorer l’efficacité et le rendement du processus, et donc de limiter la consommation d’énergie, d’éviter le gaspillage de matériaux et de réduire les coûts et les délais dans de nombreuses applications.
Objectif
Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros. The original structures know as masters are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting. Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level.
The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with (i) high depth (150 micrometer), ii) dimensions in the range from 100 nm to sub-mm in XYZ, iii) 2D&3D shape on flat surface, (iv) combining parallel & serial patterning, (v) no need for external treatments on samples; vi) increased speed (1 cm2/min) and large area (up to 2000 cm2), vii) > 40% of reduction in the consumption of resources for the whole manufacturing process. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will reduce the energy consumption, avoid material waste, decrease costs, and lead time in many applications. The platform will potentiate the possibilities in the sustainable making of high quality, versatile, less costly masters for industrial manufacturing, as demonstrated in 4 use cases (optical lenses, multifunctional riblet structures, virtual reality lens, microfluidic chips).
Champ scientifique
- engineering and technologymechanical engineeringmanufacturing engineering
- engineering and technologyother engineering and technologiesmicrotechnologylab on a chip
- natural sciencescomputer and information sciencessoftwaresoftware applicationsvirtual reality
- natural sciencesphysical sciencesopticslaser physics
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HORIZON-RIA - HORIZON Research and Innovation ActionsCoordinateur
8010 Graz
Autriche