Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

Informations projet

OPTIMAL

N° de convention de subvention: 101057029

DOI

10.3030/101057029

Date de signature de la CE 24 Mai 2022

Date de début 1 Octobre 2022

Date de fin 31 Mars 2027

Financé au titre de

• Digital, Industry and Space

Coût total

€ 5 616 876,00

Contribution de l’UE

€ 5 616 875,00

Coordonné par

JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
Austria

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Les liens vers les livrables et les publications des projets du 7e PC, ainsi que les liens vers certains types de résultats spécifiques tels que les jeux de données et les logiciels, sont récupérés dynamiquement sur OpenAIRE .

Livrables

Documents, reports (4)

Lithographic patterning properties

Properties of lithographic patterning for a positive & a negative tone resist series to generate binary (2D), grayscale 2.5D and 3D patterns by using 1) a mask aligner process, 2) one photon laser & a two/ multi photon process and 3) interference lithography process, Summary of chemical, optical, mechanical, and thermal properties of resist patterns.

Updated plan for Dissemination and Communication

The updated Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Plan for Dissemination and Communication

The Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Environmental impacts of photoresist material

Report describing the environmental impacts of the photoresist materials using the methodology LCA.

Publications

Conference proceedings (3)

Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

Auteurs: Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Publié dans: Proceedings Volume 12497, Novel Patterning Technologies, Numéro Volume 12497, 2023
Éditeur: SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)
DOI: 10.1117/12.2661526

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Auteurs: Christine Schuster, Marina Heinrich, Anja Voigt, Andy Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Gruetzner
Publié dans: Novel Patterning Technologies 2024, 2024
Éditeur: SPIE
DOI: 10.1117/12.3010852

Design and fabrication of hierarchical microstructures for advanced optical applications

Auteurs: Daniel Mrena, Daniel Jandura, Matej Goraus, Dušan Pudiš, Christine Schuster, Anja Voigt, David Kuhness, Christine Prietl, Ladislav Kuna, Markus Postl
Publié dans: Holography: Advances and Modern Trends IX, 2025
Éditeur: SPIE
DOI: 10.1117/12.3056720

Peer reviewed articles (2)

Data-driven optimization of maskless grayscale laser lithography

Auteurs: Adrian H. A. Lutey, David Kuhness, Seyyedhossein Mckee, Vincenzo Ferraro, Marco Negozio, Walter Belardi, Luca Romoli, Markus Postl, Barbara Stadlober
Publié dans: Scientific Reports, Numéro 15, 2025, ISSN 2045-2322
Éditeur: Springer Science and Business Media LLC
DOI: 10.1038/S41598-025-24652-X

Combining laser interference lithography and direct write lithography for hierarchical structures fabrication

Auteurs: D. Mrena, D. Pudis, M. Goraus, Ch. Schuster, A. Voigt, D. Kuhness, Ch. Prietl, L. Kuna, M. Postl
Publié dans: 2024 15th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM), 2025, ISSN 2474-9737
Éditeur: IEEE
DOI: 10.1109/ASDAM63148.2024.10844637