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Combined SIMS-SFM Instrument for the 3-Dimensional Chemical Analysis of Nanostructures

Ziel

The objective of this project is to develop an innovative and novel combination of a new TOF-SIMS with substantially improved lateral resolution and sensitivity, combined with a new metrological high resolution SFM. The two techniques provide complementary information on nanoscale surface chemistry and surface morphology. In combination with a layer by layer removal of material using low energy sputtering, quantitatively measured by SFM, this combined ultra-high vacuum (UHV) instrument will be unique for the 3-dimensional chemical characterisation of nanostructured inorganic as well as organic materials with down to at least 10 nm lateral resolution and down to 1 nm depth resolution. Joint by a novel software for the calculation and display of 3-dimensional distributions of all chemical species, this leads to a totally new “3D NanoChemiscope”.

Aufforderung zur Vorschlagseinreichung

FP7-NMP-2007-SME-1
Andere Projekte für diesen Aufruf anzeigen

Koordinator

IONTOF TECHNOLOGIES GMBH
EU-Beitrag
€ 1 769 148,00
Adresse
HEISENBERGSTRASSE 15
48149 Munster
Deutschland

Auf der Karte ansehen

Region
Nordrhein-Westfalen Münster Münster, Kreisfreie Stadt
Aktivitätstyp
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Kontakt Verwaltung
Ewald Niehuis (Dr.)
Links
Gesamtkosten
Keine Daten

Beteiligte (7)