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Content archived on 2024-06-18

Nanoengineering of self-forming diffusion barriers for interconnect technologies

Objective

At present, copper is the material of choice in the current processing technology for advanced semiconductor devices interconnects. However, the high diffusion rate between copper and silicon or silicon oxides requires the development of physical barriers to prevent interdiffusion across the interfaces. The thickness of the currently used barriers makes them an unviable option as the semiconductor industry moves from the 45 nm node to 32 nm and beyond, and alternative approaches are required. Some groups have proposed the use of the so called self-forming barriers, which have the potential to overcome the shortcomings of the current approaches. The aim of this project is to characterize and understand the formation of self-forming diffusion barriers layers for transistor interconnects and to optimize the creation process for future generations of device technology, in the framework of a network of European collaborations involving leading laboratories. With this purpose, the candidate will develop and apply a methodology of analysis based on electron beam related techniques in order to study these structures and interfaces at the atomic scale. Among others, aberration-corrected scanning transmission electron microscopy and three dimensional characterization techniques will allow the structure; composition and homogeneity of the barrier layers to be investigated while still remain sandwiched. A promising new technique that will be applied to this system will be scanning confocal electron microscopy (SCEM), which in theory is ideally suited to analytical work on systems with extended planar geometries. Indeed, the researcher in charge at the University of Oxford, is a world reference of leadership in the use of high resolution scanning transmission electron microscopy and in the development of SCEM. This stay abroad will provide the candidate a maturity and an expertise level in this scientific field, essential to develop an independent research career.

Fields of science (EuroSciVoc)

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Topic(s)

Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.

Call for proposal

Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.

FP7-PEOPLE-2009-IEF
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Funding Scheme

Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.

MC-IEF - Intra-European Fellowships (IEF)

Coordinator

THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF OXFORD
EU contribution
€ 173 240,80
Address
WELLINGTON SQUARE UNIVERSITY OFFICES
OX1 2JD Oxford
United Kingdom

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Region
South East (England) Berkshire, Buckinghamshire and Oxfordshire Oxfordshire
Activity type
Higher or Secondary Education Establishments
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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

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