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Real time nano CHAracterization reLatEd techNloGiEeS

Project description

Real-time characterisation of nanoelectronic devices

The reliable production of innovative nanoelectronic devices requires continuous, real-time in-line control. The metrology tools required to accurately characterise products at the relevant scales of one to hundreds of nanometres have yet to be developed. State-of-the-art spectroscopy techniques (such as Raman, infrared and photoluminescence spectroscopy) that map physical observables at the nanoscale lack sufficient resolution for a detailed characterisation of nanodevices. The EU-funded CHALLENGES project will improve both the spatial resolution and the signal-to-noise ratio of these techniques by exploiting the optical phenomenon of localised surface plasmon resonance. Plasmon-enhanced spectroscopic techniques will ensure the reliable manufacturing and performance of nanoelectronic devices. The project will demonstrate the new techniques in three areas: semiconductors, silicon photovoltaics and 2D materials.

Objective

A cost-efficient production of reliable, innovative materials and devices like advanced electronics products (<65 nm strained channel transistors, CMOS image sensors) requires nanoscale real-time in-line control, nowadays not available, during manufacturing. State-of-the-art techniques capable to map physical observables at the nanoscale compatible with in-line operations, like Raman, InfraRed (IR), Photoluminescence (PL) spectroscopy, do not have typically enough resolution for the detailed characterization of nano-scaled devices. Signal amplification by localized plasmon resonance at a sharp tip can give the opportunity of improving both the spatial resolution and the signal/noise ratio. CHALLENGES main objective is to develop multipurpose nano-optical techniques and metrological protocols for real-time characterization, using plasmonic enhanced Raman, IR and PL signals, capable to enable an increase of speed, sensitivity, spectral range with full cleanroom compatibility within different production environments, to improve devices performance, quality and reliability. CHALLENGES will focus on development and demonstration of such technology on three relevant application contexts: Semiconductor Industry, Si Photovoltaics and 2D Materials. Overall, the envisaged results are expected to be applicable to many other industrial fields in which the materials control at the nanoscale is required, spanning from those others electronics-related (DRAM, non-volatile memory, MEMS) to those one materials science (additive manufacturing, nanocoatings) and life sciences (implants, softmatter apps) related. CHALLENGES is coordinated by a large silicon foundry company and it is strongly driven by industrial and applicative needs. The Consortium includes renowned EU research labs with top-class facilities and capacities, industry leading enterprises and innovative SMEs with a worldwide collaboration network that will boost the international dimension and impact of the project.

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Programme(s)

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Topic(s)

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Funding Scheme

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RIA - Research and Innovation action

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Call for proposal

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(opens in new window) H2020-NMBP-TO-IND-2018-2020

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Coordinator

UNIVERSITA DEGLI STUDI DI ROMA LA SAPIENZA
Net EU contribution

Net EU financial contribution. The sum of money that the participant receives, deducted by the EU contribution to its linked third party. It considers the distribution of the EU financial contribution between direct beneficiaries of the project and other types of participants, like third-party participants.

€ 561 557,78
Address
Piazzale Aldo Moro 5
00185 Roma
Italy

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Region
Centro (IT) Lazio Roma
Activity type
Higher or Secondary Education Establishments
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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

€ 561 557,78

Participants (16)

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