Project description
Real-time characterisation of nanoelectronic devices
The reliable production of innovative nanoelectronic devices requires continuous, real-time in-line control. The metrology tools required to accurately characterise products at the relevant scales of one to hundreds of nanometres have yet to be developed. State-of-the-art spectroscopy techniques (such as Raman, infrared and photoluminescence spectroscopy) that map physical observables at the nanoscale lack sufficient resolution for a detailed characterisation of nanodevices. The EU-funded CHALLENGES project will improve both the spatial resolution and the signal-to-noise ratio of these techniques by exploiting the optical phenomenon of localised surface plasmon resonance. Plasmon-enhanced spectroscopic techniques will ensure the reliable manufacturing and performance of nanoelectronic devices. The project will demonstrate the new techniques in three areas: semiconductors, silicon photovoltaics and 2D materials.
Objective
A cost-efficient production of reliable, innovative materials and devices like advanced electronics products (<65 nm strained channel transistors, CMOS image sensors) requires nanoscale real-time in-line control, nowadays not available, during manufacturing. State-of-the-art techniques capable to map physical observables at the nanoscale compatible with in-line operations, like Raman, InfraRed (IR), Photoluminescence (PL) spectroscopy, do not have typically enough resolution for the detailed characterization of nano-scaled devices. Signal amplification by localized plasmon resonance at a sharp tip can give the opportunity of improving both the spatial resolution and the signal/noise ratio. CHALLENGES main objective is to develop multipurpose nano-optical techniques and metrological protocols for real-time characterization, using plasmonic enhanced Raman, IR and PL signals, capable to enable an increase of speed, sensitivity, spectral range with full cleanroom compatibility within different production environments, to improve devices performance, quality and reliability. CHALLENGES will focus on development and demonstration of such technology on three relevant application contexts: Semiconductor Industry, Si Photovoltaics and 2D Materials. Overall, the envisaged results are expected to be applicable to many other industrial fields in which the materials control at the nanoscale is required, spanning from those others electronics-related (DRAM, non-volatile memory, MEMS) to those one materials science (additive manufacturing, nanocoatings) and life sciences (implants, softmatter apps) related. CHALLENGES is coordinated by a large silicon foundry company and it is strongly driven by industrial and applicative needs. The Consortium includes renowned EU research labs with top-class facilities and capacities, industry leading enterprises and innovative SMEs with a worldwide collaboration network that will boost the international dimension and impact of the project.
Fields of science
- engineering and technologynanotechnologynano-materialstwo-dimensional nanostructures
- engineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringsensors
- engineering and technologymechanical engineeringmanufacturing engineeringadditive manufacturing
- medical and health sciencesmedical biotechnologyimplants
- engineering and technologyenvironmental engineeringenergy and fuelsrenewable energysolar energyphotovoltaic
Keywords
Programme(s)
Funding Scheme
RIA - Research and Innovation actionCoordinator
00185 Roma
Italy