Descrizione del progetto
Caratterizzazione in tempo reale di dispositivi nanoelettronici
La produzione affidabile di dispositivi nanoelettronici innovativi richiede un controllo in linea continuo e in tempo reale. Gli strumenti metrologici richiesti per caratterizzare accuratamente i prodotti alle scale pertinenti da uno a centinaia di nanometri non sono ancora stati sviluppati. Le tecniche di spettroscopia all’avanguardia (quali Raman, spettroscopia infrarossa e di fotoluminescenza) che mappano gli osservabili fisici su scala nanometrica mancano di una risoluzione sufficiente per una caratterizzazione dettagliata dei nanodispositivi. Il progetto CHALLENGES, finanziato dall’UE, migliorerà sia la risoluzione spaziale sia il rapporto segnale-rumore di queste tecniche sfruttando il fenomeno ottico della risonanza plasmonica di superficie localizzata. Le tecniche spettroscopiche potenziate dal plasma garantiranno la produzione e le prestazioni affidabili dei dispositivi nanoelettronici. Il progetto dimostrerà le nuove tecniche in tre settori: semiconduttori, fotovoltaico al silicio e materiali 2D.
Obiettivo
A cost-efficient production of reliable, innovative materials and devices like advanced electronics products (<65 nm strained channel transistors, CMOS image sensors) requires nanoscale real-time in-line control, nowadays not available, during manufacturing. State-of-the-art techniques capable to map physical observables at the nanoscale compatible with in-line operations, like Raman, InfraRed (IR), Photoluminescence (PL) spectroscopy, do not have typically enough resolution for the detailed characterization of nano-scaled devices. Signal amplification by localized plasmon resonance at a sharp tip can give the opportunity of improving both the spatial resolution and the signal/noise ratio. CHALLENGES main objective is to develop multipurpose nano-optical techniques and metrological protocols for real-time characterization, using plasmonic enhanced Raman, IR and PL signals, capable to enable an increase of speed, sensitivity, spectral range with full cleanroom compatibility within different production environments, to improve devices performance, quality and reliability. CHALLENGES will focus on development and demonstration of such technology on three relevant application contexts: Semiconductor Industry, Si Photovoltaics and 2D Materials. Overall, the envisaged results are expected to be applicable to many other industrial fields in which the materials control at the nanoscale is required, spanning from those others electronics-related (DRAM, non-volatile memory, MEMS) to those one materials science (additive manufacturing, nanocoatings) and life sciences (implants, softmatter apps) related. CHALLENGES is coordinated by a large silicon foundry company and it is strongly driven by industrial and applicative needs. The Consortium includes renowned EU research labs with top-class facilities and capacities, industry leading enterprises and innovative SMEs with a worldwide collaboration network that will boost the international dimension and impact of the project.
Campo scientifico
- engineering and technologynanotechnologynano-materialstwo-dimensional nanostructures
- engineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringsensors
- engineering and technologymechanical engineeringmanufacturing engineeringadditive manufacturing
- medical and health sciencesmedical biotechnologyimplants
- engineering and technologyenvironmental engineeringenergy and fuelsrenewable energysolar energyphotovoltaic
Parole chiave
Programma(i)
Invito a presentare proposte
Vedi altri progetti per questo bandoBando secondario
H2020-NMBP-TO-IND-2019
Meccanismo di finanziamento
RIA - Research and Innovation actionCoordinatore
00185 Roma
Italia