Description du projet
Une technologie radicalement nouvelle de contrôle des processus permettra d’optimiser le dépôt de couches minces
Les films minces et ultra-minces sont des couches de matériau(x) déposées sur un substrat massif afin d’en modifier ou d’en améliorer les propriétés. Leur épaisseur varie d’un micromètre à des fractions de nanomètre, et leur marché se développe dans les applications de haute technologie telles que les dispositifs à semi-conducteurs, les nanotechnologies, l’optoélectronique et les dispositifs médicaux et environnementaux. Le dépôt de ces couches très fines est un processus délicat réalisé à l’aide de diverses techniques, dont beaucoup sont employées dans une chambre à vide. Le projet INTELEG S HF, financé par l’UE, met actuellement au point un système novateur d’analyse des gaz qui aidera à contrôler ces processus dans tous les environnements concernés et qui contribuera à propulser le marché en plein essor des couches minces vers de nouveaux sommets.
Objectif
The fast growing thin and ultra-thin film industries largely rely on modern vacuum-based processes, which often exhibit fast and slow process gas composition changes and drifts. Such changes are undesirable and can result in reproducibility and product quality issues. Various control strategies, relying on proper monitoring systems (such as Gas Analysis Systems [GAS]), can be employed to stabilise production processes at the desired working point by regulating gas flow and thus adjusting gas composition. However, currently existing GAS are rather limited and there is no solution available on the market that provides gas composition information reliably in the process pressure range between 0.1 and 10,000 mTorr as well as provide 24/7 non-stop operation. Furthermore, ultra-thin film market has been exponentially growing: by 2024 it is expected to grow at CAGR of 15.1%; up to €99.78 bn. Due to the growing demand for reliable wide-range GAS solving the existing shortcomings, Nova Fabrica has developed a miniature high-frequency plasma-OES-based gas analysis system INTELEG® S HF. It enables to measure the gas composition of vacuum-based processes in the pressure range from 0.1 up to 10,000 mTorr. It is expected that INTELEG® S HF will be the first single GAS instrument in the world capable to provide process gas analysis for PVD, CVD, ALD, IAD, etc., as well as for processes taking place in even lower vacuum at pressures up to 10,000 mTorr. Comparing to competing solutions, a breakthrough INTELEG® S HF solution offers a true global “down-stream” process gas analysis, 24/7 operation, 100,000 hours of mean time before failure, fulfilment of industry 4.0 requirements, competitive price, has no production downtime and is maintenance-free. The main objectives of Phase 1 of SME Instrument are to develop an elaborate feasibility study including technical feasibility testing, IPR strategy and business plan – crucial steps towards successful commercialisation of the solution.
Champ scientifique
Programme(s)
Régime de financement
SME-1 - SME instrument phase 1Coordinateur
30106 IGNALINA
Lituanie
L’entreprise s’est définie comme une PME (petite et moyenne entreprise) au moment de la signature de la convention de subvention.