Descrizione del progetto
Una tecnologia radicalmente nuova per il controllo di processi aiuterà a ottimizzare la deposizione di film sottili
I film sottili e ultrasottili sono strati di materiale/i depositati su un substrato sfuso per modificarne o migliorarne le proprietà. Il loro spessore è compreso tra un micrometro e frazioni di nanometro, e il loro mercato sta crescendo in applicazioni ad alta tecnologia come i dispositivi semiconduttori, le nanotecnologie, l’optoelettronica e i dispositivi medici e ambientali. La deposizione di questi strati molto sottili è complessa e viene eseguita usando svariate tecniche, molte delle quali sono impiegate in una camera a vuoto. Il progetto INTELEG S HF, finanziato dall’UE, sta sviluppando un sistema pionieristico di analisi dei gas per il controllo di processi in tutti gli ambienti pertinenti, che porterà verso nuove vette il fiorente mercato dei film sottili.
Obiettivo
The fast growing thin and ultra-thin film industries largely rely on modern vacuum-based processes, which often exhibit fast and slow process gas composition changes and drifts. Such changes are undesirable and can result in reproducibility and product quality issues. Various control strategies, relying on proper monitoring systems (such as Gas Analysis Systems [GAS]), can be employed to stabilise production processes at the desired working point by regulating gas flow and thus adjusting gas composition. However, currently existing GAS are rather limited and there is no solution available on the market that provides gas composition information reliably in the process pressure range between 0.1 and 10,000 mTorr as well as provide 24/7 non-stop operation. Furthermore, ultra-thin film market has been exponentially growing: by 2024 it is expected to grow at CAGR of 15.1%; up to €99.78 bn. Due to the growing demand for reliable wide-range GAS solving the existing shortcomings, Nova Fabrica has developed a miniature high-frequency plasma-OES-based gas analysis system INTELEG® S HF. It enables to measure the gas composition of vacuum-based processes in the pressure range from 0.1 up to 10,000 mTorr. It is expected that INTELEG® S HF will be the first single GAS instrument in the world capable to provide process gas analysis for PVD, CVD, ALD, IAD, etc., as well as for processes taking place in even lower vacuum at pressures up to 10,000 mTorr. Comparing to competing solutions, a breakthrough INTELEG® S HF solution offers a true global “down-stream” process gas analysis, 24/7 operation, 100,000 hours of mean time before failure, fulfilment of industry 4.0 requirements, competitive price, has no production downtime and is maintenance-free. The main objectives of Phase 1 of SME Instrument are to develop an elaborate feasibility study including technical feasibility testing, IPR strategy and business plan – crucial steps towards successful commercialisation of the solution.
Campo scientifico
Programma(i)
Argomento(i)
Invito a presentare proposte
Vedi altri progetti per questo bandoBando secondario
H2020-SMEInst-2018-2020-1
Meccanismo di finanziamento
SME-1 - SME instrument phase 1Coordinatore
30106 IGNALINA
Lituania
L’organizzazione si è definita una PMI (piccola e media impresa) al momento della firma dell’accordo di sovvenzione.