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Feasibility Study for INTELEG® S HF – a Wide Pressure Range Process Gas Analysis System

Project description

Radical new process control technology will support optimised thin film deposition

Thin and ultra-thin films are layers of material(s) deposited on a bulk substrate to change or enhance its properties. They range in thickness from one micrometre to fractions of a nanometre, and the market for them is growing in high-tech applications such as semiconductor devices, nanotechnology, optoelectronics and medical and environmental devices. Deposition of these very thin layers is tricky, and it is done with a variety or techniques, many of which are employed in a vacuum chamber. The EU-funded INTELEG S HF project is developing a pioneering gas analysis system for process control in all relevant environments that will take the booming thin film market to new heights.


The fast growing thin and ultra-thin film industries largely rely on modern vacuum-based processes, which often exhibit fast and slow process gas composition changes and drifts. Such changes are undesirable and can result in reproducibility and product quality issues. Various control strategies, relying on proper monitoring systems (such as Gas Analysis Systems [GAS]), can be employed to stabilise production processes at the desired working point by regulating gas flow and thus adjusting gas composition. However, currently existing GAS are rather limited and there is no solution available on the market that provides gas composition information reliably in the process pressure range between 0.1 and 10,000 mTorr as well as provide 24/7 non-stop operation. Furthermore, ultra-thin film market has been exponentially growing: by 2024 it is expected to grow at CAGR of 15.1%; up to €99.78 bn. Due to the growing demand for reliable wide-range GAS solving the existing shortcomings, Nova Fabrica has developed a miniature high-frequency plasma-OES-based gas analysis system INTELEG® S HF. It enables to measure the gas composition of vacuum-based processes in the pressure range from 0.1 up to 10,000 mTorr. It is expected that INTELEG® S HF will be the first single GAS instrument in the world capable to provide process gas analysis for PVD, CVD, ALD, IAD, etc., as well as for processes taking place in even lower vacuum at pressures up to 10,000 mTorr. Comparing to competing solutions, a breakthrough INTELEG® S HF solution offers a true global “down-stream” process gas analysis, 24/7 operation, 100,000 hours of mean time before failure, fulfilment of industry 4.0 requirements, competitive price, has no production downtime and is maintenance-free. The main objectives of Phase 1 of SME Instrument are to develop an elaborate feasibility study including technical feasibility testing, IPR strategy and business plan – crucial steps towards successful commercialisation of the solution.

Call for proposal


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Net EU contribution
€ 50 000,00
Laisves g 44
30106 Ignalina

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The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.

Lietuva Vidurio ir vakarų Lietuvos regionas Utenos apskritis
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Other funding
€ 21 429,00