Objective
Rapid progress of the physics research on Extreme Ultraviolet Lithography, the high-resolution imaging technique operating at 13 nm wavelength, has enabled several successful proof-of-principle demonstrations in the past years. Major results achieved by the proposers through national and former INTAS projects (i.e. INTAS 94-4341) include a record source power of 0.25 W (1% BW at 13 nm), novel debris mitigation schemes allowing long (108 shots) service intervals of the source, optics reflectivities of 64 %, and fabrication of repairable EUV reflection masks. EUVL is now seriously being evaluated by industrial parties as the lithographic technique to be used after the Deep UV technology used for chip manufacture. Especially in Europe great prospects exist due to the infrastructure of relevant hi-tech industries such as stepper - (ASM Lithography) and optics (Carl Zeiss) manufacturers, and a network of institutions carrying out supportive scientific research. A direct linkage exists of the proposers to the industry involved. Despite of this industrial interest, a number of unanswered research questions jeopardizes the further step of EUVL from the physics research into the engineering phase.
This project addresses the following research issues:
Advanced EUV source concepts, involving fast rotating and gas jet targets Analysis and design of optimal mask illumination schemes Study of EUV source and MLM optics for the 11 nm spectral range Advanced multilayer-strate interplay phenomena Investigation of alternative EUV resist formulae Development of EUV mask repair methods The project proposed is expected to link highly relevant Russian expertise to the pre-competitive European development of strategic semiconductor equipment.
Programme(s)
Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Topic(s)
Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
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Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
Call for proposal
Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.
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Procedure for inviting applicants to submit project proposals, with the aim of receiving EU funding.
Funding Scheme
Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
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Coordinator
3430 BE Nieuwegein
Netherlands
The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.