Project description
Improving power, performance, area and cost of 2 nm chip technology
It is estimated that in a few years, there will likely be over 100 billion connected devices globally. To accommodate the demand for increased chip performance and energy efficiency, the semiconductor industry must develop new breakthrough nanosheet technologies that keep Moore’s law going. With 5 nm node chips already in production and 3 nm node chips announced, these breakthroughs are needed for the subsequent 2 nm node. Building on the work of the IT2 project that explored advanced EUV lithography, novel 3D structures and new materials, the EU-funded ID2PPAC project will show how to achieve the expected performance, power, area and cost when migrating to the 2 nm node.
Objective
In the ID2PPAC project the technology solutions for the 2nm node identified in the preceding project IT2 will be consolidated and integrated with the objective to demonstrate that Performance Power Area and Cost (PPAC) requirements for this generation of leading edge logic technology can be achieved.
To continue the Moore’s law trajectory to the 2nm node, while meeting PPAC requirements, the combination of further advancements in EUV lithography & masks, 3D device structures, materials and metrology is required. The strength of the project pivots on the focused engagement of leading expert partners in these key interlocking areas and a shared pilot line.
The ID2PPAC project, is expected to enable IC-fabs to do EUV-based, single-print, High Volume Manufacturing for the 2nm node by 2025.
This technology evolution is driven by the growing demand for compute power which increases more than exponentially with time and has made the world migrate from 1 billion interconnected devices in the “PC era” to 10 billion in the “Mobile + cloud era” to the future “Intelligence era” in which there will be over 100 billion intelligent connected devices. To enable this growth, the semiconductor industry is continuously pursuing technology innovations to realize this progress as has been predicted by Moore’s Law and will continue to do so.
The project will also help to expand Europe's technological capacity to act in this field, which is crucial for digitization, (edge) AI and for solving national, European and global societal challenges and will strengthen the consortium of leading European companies and institutes active in this sector.
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IA - Innovation actionCoordinator
5504DR Veldhoven
Netherlands
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Participants (26)
1109 Dresden
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76705 Rehovot
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92230 Gennevilliers
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91300 MASSY
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511 01 Turnov
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The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.
4782 St Florian Am Inn
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5651 GG Eindhoven
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80686 Munchen
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182 21 Praha 8
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08860 Castelldefels
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3001 Leuven
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70569 Stuttgart
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3001 Leuven
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3001 Heverlee
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23100 Migdal Haemek
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20692 Yokneam
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76100 REHOVOT
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07745 Jena
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The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.
6600 Reutte
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31700 Blagnac
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The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.
7521 PE Enschede
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The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.
73463 Westhausen
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2595 DA Den Haag
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5651 GH Eindhoven
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2015600 BAR LEV
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73447 Oberkochen
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