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14 Angstroms Module Integration

Project description

Advancing next-generation semiconductor technology

The semiconductor industry faces challenges as it strives to maintain the rapid pace of technological progress dictated by Moore’s Law. Advancing to smaller nodes requires breakthroughs in lithography, metrology, and transistor design to ensure performance, efficiency, and manufacturability. At the 14-angstrom scale, maintaining precision in fabrication, inspection, and quality control is crucial for next-generation computing, AI, and communication technologies. Moreover, sustainability concerns demand greener alternatives to traditional materials and processes. In this context, the EU-funded 14AMI project will develop cutting-edge solutions for the 14Å CMOS node. It focuses on refining extreme ultraviolet (EUV) lithography, pioneering holistic metrology methods, and integrating Complementary Field Effect Transistors (CFETs). The project also champions sustainability with PFAS-free photoresists and AI-driven efficiency enhancements.

Objective

The 14AMI project is about creating technological solutions for the 14 Angstrom CMOS technology node, including a fully integrated functional CFET (Complementary Field Effect Transistor) as new active CMOS device, and state-of-the-art holistic metrology techniques for both wafer and mask inspection and review. All is aimed to keep the pace in the industry to follow Moores law.
The project addresses the following 3 main pillars that are relevant in enabling manufacture of 14A technology, 1) lithography, 2) metrology and 3) process module integration.

In lithography the aim is to realize solutions for the 0.55NA EUV scanner platform to secure 14Angstrom node compliance in performance, that is, resolution, alignment, throughput and optics lifetime. In Metrology the objective is to cover wafer and mask metrology and quality control. The aim is to develop holistic metrology, tools & methods and data analytics to improve overlay, CD and focus measurement and quality control with a Precision to Tolerance, P/T, ratio between 0.1 and 0.3. In process module integration work covers the realization and demonstration of a CFET Complementary Field Effect Transistor - CMOS device. Three options will be investigated for integration; a monolithic, sequential and a hybrid solution. In addition, the partners will develop a PFAS-free photo resist to reduce the ecological footprint of photolithography processes, and a smart AI based sensor technology to improve vacuum chambers' efficiency and reduce waste.

At societal level the expected impact of the 14AMI project will support the partners and their supplier network to stay at the leading edge of high-tech developments, crucial to meet the digitization challenges of the European society. Moreover, 14AMI will boost industrial competitiveness, and attract talent in Europe, while enabling new application in areas such as security, communication and enabling of further automation in mobility, health and research.

Fields of science (EuroSciVoc)

CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques. See: https://op.europa.eu/en/web/eu-vocabularies/euroscivoc.

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Coordinator

ASML NETHERLANDS B.V.
Net EU contribution
€ 3 917 654,98
Address
DE RUN 6501
5504DR Veldhoven
Netherlands

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Region
Zuid-Nederland Noord-Brabant Zuidoost-Noord-Brabant
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
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Total cost
€ 25 000 000,00

Participants (36)

Partners (2)

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