Atomic layer deposition applied to synthetic carburant production and low temperature microthermal imaging. New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films

Project Information

ALD-SPUTTERING-OXIDE

Grant agreement ID: 249243

Project closed

Start date 1 October 2009

End date 30 September 2012

Funded under

• Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)

Total cost € 45 000,00

EU contribution € 45 000,00

Coordinated by

UNIVERSITETET I OSLO
Norway