Atomic layer deposition applied to synthetic carburant production and low temperature microthermal imaging. New sputtering process applied to control oxygen stoechiometry and diffusion in oxide films

Projektinformationen

ALD-SPUTTERING-OXIDE

ID Finanzhilfevereinbarung: 249243

Projekt abgeschlossen

Startdatum 1 Oktober 2009

Enddatum 30 September 2012

Finanziert unter

• Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)

Gesamtkosten € 45 000,00

EU-Beitrag € 45 000,00

Koordiniert durch

UNIVERSITETET I OSLO
Norway