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DEVELOPMENT OF ADVANCED GAN TECHNOLOGIES

Ziel

According to the High-Level Experts Group (HLG) micro and nanoelectronics are essential for all goods and services which need intelligent control in all innovative sectors and are therefore identified as Key Enabling Technologies (KET). Gallium Nitride is an advanced semiconductor material at the heart of three strategic issues, advanced materials, photonics and micro/nanoelectronics. The deployment of these technologies is key for Europe to strengthen its manufacturing capacities while addressing societal challenges on energy and transportation.
The main goal of the AGATE project is to implement an industrial European source of engineered substrates and epitaxial structures for GaN electronic devices, and to validate the substrate performances on high performance GaN devices.

Aufforderung zur Vorschlagseinreichung

ENIAC-2012-2
Andere Projekte für diesen Aufruf anzeigen

Koordinator

SOITEC SA
EU-Beitrag
€ 5 602 480,00
Adresse
PARC TEC NO DES FONTAINES CHEMIN DE FRANQUES
38190 Bernin
Frankreich

Auf der Karte ansehen

Region
Auvergne-Rhône-Alpes Rhône-Alpes Isère
Aktivitätstyp
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Kontakt Verwaltung
Links
Gesamtkosten
Keine Daten

Beteiligte (9)