Objective
The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure.
A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7’s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues.
The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing.
The SeNaTe project relates to the ECSEL work program topic Process technologies – More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.
Programme(s)
Call for proposal
ECSEL-2014-2
See other projects for this call
Funding Scheme
ECSEL-IA - ECSEL Innovation ActionCoordinator
5504DR Veldhoven
Netherlands
Participants (40)
74000 Annecy
3001 Leuven
76705 Rehovot
1109 Dresden
38000 Grenoble
3001 Heverlee
Participation ended
1322 AP Almere
73614 Schorndorf
51429 Bergisch Gladbach
Participation ended
78315 Radolfzell
91140 Villebon Sur Yvette
7521 PH Enschede
34000 Montpellier
627 00 Brno
5651 GG Eindhoven
80686 Munchen
01109 Dresden
Participation ended
63450 Hanau
85551 Heimstetten
3001 Leuven
70569 Stuttgart
Participation ended
82109 Kiryat Gat
07745 Jena
2306990 Migdal Haemek
35781 Weilburg
23100 Migdal Haemek
9500 Villach
3001 Leuven
20692 Yokneam
76100 Rehovot
38116 Braunschweig
31700 Blagnac
1117 Budapest
38190 Bernin
75447 Sternenfels
2595 DA Den Haag
7522 NB Enschede
5652 AW Eindhoven
73447 Oberkochen
1322 AP Almere
