Publications
Author(s):
A. Erdmann, P. Evanschitzky, H. Mezilhy, V. Philipsen, E. Hendrickx, M. Bauer
Published in:
Journal of Micro/Nanolithography, MEMS, and MOEMS, Issue 18/01, 2019, Page(s) 1, ISSN 1932-5150
Publisher:
S P I E - International Society for Optical Engineering
DOI:
10.1117/1.jmm.18.1.011005
Author(s):
Peter Evanschitzky, Andreas Erdmann
Published in:
Journal of Micro/Nanolithography, MEMS, and MOEMS, Issue 16/04, 2017, Page(s) 1, ISSN 1932-5150
Publisher:
S P I E - International Society for Optical Engineering
DOI:
10.1117/1.jmm.16.4.041005
Author(s):
Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Vicky Philipsen, Vu Luong, Eric Hendrickx
Published in:
Advanced Optical Technologies, Issue 6/3-4, 2017, ISSN 2192-8584
Publisher:
De Gruyter
DOI:
10.1515/aot-2017-0019
Author(s):
V. Soltwisch, A. Haase, J. Wernecke, J. Probst, M. Schoengen, S. Burger, M. Krumrey, F. Scholze
Published in:
Physical Review B, Issue 94/3, 2016, ISSN 2469-9950
Publisher:
The American Physical Society
DOI:
10.1103/PhysRevB.94.035419
Author(s):
W. Schwarzenbach, C. Figuet, D. Delprat, C. Veytizou, I. Huyet, C. Tempesta, L. Ecarnot, J. Widiez, V. Loup, J.-M. Hartmann, P. Besson, C. Deguet, F. Mazen, B.-Y. Nguyen, C. Maleville
Published in:
ECS Transactions, Issue 66/4, 2015, Page(s) 31-37, ISSN 1938-5862
Publisher:
Electrochemical Society, Inc.
DOI:
10.1149/06604.0031ecst
Author(s):
Violeta Navarro, Hamed Sadeghian, Abbas Mohtashami, Ilan Englard, Dror Shemesh, Nitin Singh Malik
Published in:
33rd European Mask and Lithography Conference, 2017, Page(s) 17, ISBN 9781-510613577
Publisher:
SPIE
DOI:
10.1117/12.2279707
Author(s):
Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, 2017, Page(s) 101430D
Publisher:
SPIE
DOI:
10.1117/12.2258025
Author(s):
Mark A. van de Kerkhof, Uwe Zeitner, Torsten Feigl, Stefan Bäumer, Robbert Jan Voogd, Ad Schasfoort, Evert Westerhuis, Wouter Engelen, Manfred Dikkers, Yassin Chowdhury, Michael D. Kriese
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 24, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2297433
Author(s):
Roderik van Es, Mark van de Kerkhof, Leon Levasier, Rudy Peeters, Hans Jasper
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, 2017, Page(s) 2, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2281184
Author(s):
Mark A. van de Kerkhof, Arthur W. E. Minnaert, Marco Pieters, Hans Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 13, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2299503
Author(s):
Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis
Published in:
Extreme Ultraviolet (EUV) Lithography VII, 2016, Page(s) 97760A
Publisher:
SPIE
DOI:
10.1117/12.2220423
Author(s):
Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol
Published in:
Extreme Ultraviolet (EUV) Lithography VII, 2016, Page(s) 97761Y
Publisher:
SPIE
DOI:
10.1117/12.2221909
Author(s):
Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, 2017, Page(s) 101430G
Publisher:
SPIE
DOI:
10.1117/12.2261079
Author(s):
Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 23, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2295800
Author(s):
Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood
Published in:
Extreme Ultraviolet (EUV) Lithography VII, 2016, Page(s) 97761P
Publisher:
SPIE
DOI:
10.1117/12.2220036
Author(s):
Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser
Published in:
Photomask Technology 2015, 2015, Page(s) 963503
Publisher:
SPIE
DOI:
10.1117/12.2202258
Author(s):
Norbert Koster, Edwin te Sligte, Freek Molkenboer, Alex Deutz, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, Jeroen Westerhout
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, 2017, Page(s) 101431N
Publisher:
SPIE
DOI:
10.1117/12.2257997
Author(s):
Chien-Ching Wu, Maurice P.M. A. Limpens, Jacqueline van Veldhoven, Herman Bekman, Alex Deutz, Edwin te Sligte, Arnold J. Storm, Michel van Putten
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 33, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2297369
Author(s):
F.T. Molkenboer, N.B. Koster, A.F. Deutz, B.A.H. Nijland, P.J. Kerkhof, P.M. Muilwijk, B.W. Oostdijck, J. Westerhout, C.L. Hollemans, W.F.W. Mulckhuyse, M. van Putten, P. van der Walle, A.M. Hoogstrate, J.R.H. Diesveld, A. Abutan
Published in:
AVS Proceedings, Issue 64, 2017, Page(s) VT-WeM3
Publisher:
AVS
Author(s):
Michel van Putten, N.B. Koster, A.F. Deutz, B.A.H. Nijland, P.J. Kerkhof, P.M. Muilwijk, B.W. Oostdijck, J. Westerhout, C.L. Hollemans, E. te Sligte, W.F.W. Mulckhuyse, F.T. Molkenboer, A.M. Hoogstrate, P. van der Walle, J.R.H. Diesveld, A. Abutan
Published in:
AVS Proceedings, Issue 64, 2017, Page(s) VT-TuM11
Publisher:
AVS
Author(s):
Edwin te Sligte, Michel van Putten, Freek T. Molkenboer, Peter van der Walle, Pim M. Muilwijk, Norbert B. Koster, Jeroen Westerhout, Peter J. Kerkhof, Bastiaan W. Oostdijck, Alex F. Deutz, Wouter Mulckhuyse
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, 2017, Page(s) 78, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2280356
Author(s):
Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, Michel van Putten
Published in:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 2017, Page(s) 104540O
Publisher:
SPIE
DOI:
10.1117/12.2279025
Author(s):
Rogier Verberk, Norbert Koster, Wilbert Staring, Edwin te Sligte
Published in:
33rd European Mask and Lithography Conference, 2017, Page(s) 10, ISBN 9781-510613577
Publisher:
SPIE
DOI:
10.1117/12.2279672
Author(s):
Sascha Brose, Serhiy Danylyuk, Lukas Bahrenberg, Peter Loosen, Larissa Juschkin, Rainer Lebert
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, 2017, Page(s) 81, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2280582
Author(s):
Lukas Bahrenberg, Stefan Herbert, Jenny Tempeler, Aleksey Maryasov, Oskar Hofmann, Serhiy Danylyuk, Rainer Lebert, Peter Loosen, Larissa Juschkin
Published in:
Extreme Ultraviolet (EUV) Lithography VI, 2015, Page(s) 942229
Publisher:
SPIE
DOI:
10.1117/12.2085929
Author(s):
Mertens, H.; Ritzenthaler, R.; Pena, V.; Santoro, G.; Kenis, K.; Schulze, A.; Dentoni Litta, E.; Chew, S.; Devriendt, K.; Chiarella, T.; Demuynck, S.; Yakimets, D.; Jang, D.; Spessot, A.; Eneman, G.; Dangol, A.; Lagrain, P.; Bender, H.; Sun, S.; Korolik, M.; Kioussis, D.; Kim, M.; Bu, K.; Chen, S.; Cogorno, M.; Devrajan, J.; Machillot, J.; Yoshida, N.; Kim, N.; Barla, K.; Mocuta, D. and Horiguchi,
Published in:
2017
Publisher:
IEEE International Electron Devices Meeting - IEDM
Author(s):
Andreas Erdmann, Peter Evanschitzky, Vicky Philipsen, Markus Bauer, Eric Hendrickx, Hazem Mesilhy
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 35, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2299648
Author(s):
Peter Evanschitzky, A. Erdmann
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, 2017, Page(s) 11, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2280535
Author(s):
Victor Soltwisch, Andreas Fischer, Christian Laubis, Christian Stadelhoff, Frank Scholze, Albrecht Ullrich
Published in:
Extreme Ultraviolet (EUV) Lithography VI, 2015, Page(s) 942213
Publisher:
SPIE
DOI:
10.1117/12.2085798
Author(s):
Christian Laubis, Anton Haase, Victor Soltwisch, Frank Scholze
Published in:
31st European Mask and Lithography Conference, 2015, Page(s) 96610W
Publisher:
SPIE
DOI:
10.1117/12.2195009
Author(s):
Anil Gunay Demirkol, Efrain Altamirano-Sánchez, IMEC (Belgium); Stephane Heraud, Nova Measuring Instruments GmbH (Germany); Stephane Godny, Anne-Laure Charley, Philippe Leray, IMEC (Belgium); Ronen Urenski, Oded Cohen, Igor Turovets, Shay Wolfling, Nova Measuring Instruments Ltd. (Israel)
Published in:
SPIE Advanced Lithography 2016, Issue 2016, 2016, Page(s) 60,61
Publisher:
SPIE
Author(s):
P. Muilwijk
Published in:
AVS Proceedings, Issue 63, 2016, Page(s) "Paper #4224"
Publisher:
AVS
Author(s):
Edwin te Sligte, Norbert Koster, Freek Molkenboer, Alex Deutz
Published in:
Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2016, Page(s) 99840R
Publisher:
SPIE
DOI:
10.1117/12.2240302
Author(s):
Edwin te Sligte, Norbert Koster, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, André Hoogstrate, Alex Deutz
Published in:
Photomask Technology 2016, 2016, Page(s) 998520
Publisher:
SPIE
DOI:
10.1117/12.2240921
Author(s):
F. Molkenboer
Published in:
AVS Proceedings, Issue 63, 2016, Page(s) "Paper #3725"
Publisher:
AVS
Author(s):
W. F. Clark, A. Juncker, E. Paladugu, D. Fried, C. J. Wilson, G. Pourtois, M. Gallagher, A. De Jamblinne, D. Piumi, J. Boemmels, Z. S. Tokei, D. Mocuta
Published in:
2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2016, Page(s) 43-46, ISBN 978-1-5090-0818-6
Publisher:
IEEE
DOI:
10.1109/SISPAD.2016.7605144
Author(s):
S. Guissi, W. F. Clark, A. Junker, J. Ervin, K. Greiner, D. Fried, B. Briggs, K. Devriendt, F. Sebaai, A. Charley, C. J. Wilson, J. Boemmels, Z. Tőkei
Published in:
INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, Issue 2017, 2017
Publisher:
IEEE
Author(s):
Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Marina Timmermans, Michael De Volder, Emily Gallagher
Published in:
Photomask Technology 2016, Issue 99850C (25 October 2016), 2016, Page(s) 99850C
Publisher:
SPIE
DOI:
10.1117/12.2243019
Author(s):
Ivan Pollentier, Jae Uk Lee, Marina Timmermans, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily E. Gallagher
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, Issue 01430L (24 March 2017), 2017, Page(s) 101430L
Publisher:
SPIE
DOI:
10.1117/12.2257891
Author(s):
Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Eric Hendrickx, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W. E. van de Kruijs, Arash Edrisi, Frank Scholze, Christian Laubis, Mathias Irmscher, Sandra Naasz, Christian Reuter
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, 2017, Page(s) 1014310
Publisher:
SPIE
DOI:
10.1117/12.2257929
Author(s):
Philipsen, V.; Luong, V.; Hendrickx, E.; Erdmann, A.; Dongbo, X.; Evanschitzky, P.; van de Kruijs, R.; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M. and Naasz, S.
Published in:
2016
Publisher:
International Symposium on Extreme Ultraviolet Lithography
Author(s):
Luong, V.; Philipsen, V.; Hendrickx, E.; Scholze, F.; van de Kruijs, R.; Edrisi, A.; Wood, O. and Heyns, M.
Published in:
2016
Publisher:
International Symposium on Extreme Ultraviolet Lithography
Author(s):
L.-A. Ragnarsson, H. Dekkers, T. Schram, S. A. Chew, B. Parvais, M. Dehan, K. Devriendt, Z. Tao, F. Sebaai, C. Baerts, S. Van Elshocht, N. Yoshida, A. Phatak, C. Lazik, A. Brand, W. Clark, D. Fried, D. Mocuta, K. Barla, N. Horiguchi, A. V.-Y. Thean
Published in:
2015 Symposium on VLSI Technology (VLSI Technology), 2015, Page(s) T148-T149, ISBN 978-4-86348-501-3
Publisher:
IEEE
DOI:
10.1109/VLSIT.2015.7223656
Author(s):
Sushil Sakhare, Darko Trivkovic, Tom Mountsier, Min-Soo Kim, Dan Mocuta, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa
Published in:
Design-Process-Technology Co-optimization for Manufacturability IX, 2015, Page(s) 94270O
Publisher:
SPIE
DOI:
10.1117/12.2086100
Author(s):
Efrain Altamirano-Sánchez, Tao S. Zheng, Anil Gunay Demirkol, Gian F. Lorusso, Toby Hopf, Jean-Christophe Everat IMEC (Belgium), William Clark, Coventor (France); Daniel Sobieski, Fung-Suong
Ou, Lam Research Corp. (United States); David Hellin, Lam Research (Belgium)
Published in:
SPIE Advanced Lithigraphy 2016, 2016
Publisher:
SPIE
Author(s):
Jiangjiang (Jimmy) Gu, Dalong Zhao, Vasanth Allampalli, Daniel Faken, Ken Greiner, David M. Fried
Published in:
Advanced Etch Technology for Nanopatterning V, 2016, Page(s) 97820N
Publisher:
SPIE
DOI:
10.1117/12.2218929
Author(s):
E. te Sligte
Published in:
EUVL Symposium, Issue 2015, 2015
Publisher:
EUVL Symposium
Author(s):
P. Bussink
Published in:
SPIE Advanced Lithography Proceedings, Issue 2016, 2016, Page(s) 9778-115
Publisher:
SPIE
Author(s):
H. Sadeghian
Published in:
SPIE Advanced Lithography Proceedings, Issue 2016, 2016
Publisher:
SPIE
Author(s):
E. te Sligte
Published in:
PTB Workshop, Issue 2015, 2015
Publisher:
PTB Workshop
Author(s):
F. Molkenboer
Published in:
AVS Proceedings, Issue 62, 2015, Page(s) Paper VT-WeM11
Publisher:
AVS-62
Author(s):
Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily E. Gallagher
Published in:
Extreme Ultraviolet (EUV) Lithography VII, 2016, Page(s) 977620
Publisher:
SPIE
DOI:
10.1117/12.2220031
Author(s):
Emily E. Gallagher, Johannes Vanpaemel, Ivan Pollentier, Houman Zahedmanesh, Christoph Adelmann, Cedric Huyghebaert, Rik Jonckheere, Jae Uk Lee
Published in:
Photomask Technology 2015, 2015, Page(s) 96350X
Publisher:
SPIE
DOI:
10.1117/12.2199076
Author(s):
Christian Laubis, Annett Barboutis, Christian Buchholz, Andreas Fischer, Anton Haase, Florian Knorr, Heiko Mentzel, Jana Puls, Anja Schönstedt, Michael Sintschuk, Victor Soltwisch, Christian Stadelhoff, Frank Scholze
Published in:
Extreme Ultraviolet (EUV) Lithography VII, 2016, Page(s) 977627
Publisher:
SPIE
DOI:
10.1117/12.2218902
Author(s):
Anton Haase, Victor Soltwisch, Frank Scholze, Stefan Braun
Published in:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 2015, Page(s) 962804
Publisher:
SPIE
DOI:
10.1117/12.2191265
Author(s):
Freek Molkenboer, Norbert Koster, Alfred Abutan, Alex Deutz, Hans Diesveld, Christiaan Hollemans, Andre Hoogstrate, Peter Kerkhof, Pim Muilwijk, Wouter Mulckhuyse, Bjorn Nijland, Bastiaan Oostdijck, Michel van Putten, Edwin te Sligte, Peter van der Walle, Jeroen Westerhout
Published in:
NEVAC Blad, Issue 55 (3), 2017, Page(s) p 18-23, ISSN 0169-9431
Publisher:
NEVAC
Intellectual Property Rights
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2017-12-18
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2016-12-02
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