Low energy ELEctron driven chemistry for the advantage of emerging NAno-fabrication methods

Risultati finali

Two network-wide Personal Skills Training Schools

Two network-wide Personal Skills Training Schools (nw-PSTS) have taken place (the first one in M12 and the second one in M24) and reports have been compiled. Both reports will be submitted together in M24.

Three network-wide Technical Training Schools

Three network-wide Technical Training Schools (nw-TTS) have taken place (in M9, M20 and M26) and reports have been compiled. All three reports will be submitted together in M26.

WP6 Secondments I

All secondments planned for ESR6, ESR10, ESR12, ESR13, ESR14 and ESR15 before M18 have been completed.

WP4 Secondments II

All secondments planned for ESR5 ESR7 and ESR11 before M30 are completed

ELENA's Trans-European Educational Roadmap

ELENA s education and training experience will be translated into ELENA s TransEuropean Educational Roadmap ERM and the appropriate execution will be initiated The first version will be ready in M18 This will be revised in M32 and M40 and in M482

WP4 PhD degrees

Within WP4 ESR5 ESR7 are expected to complete their PhD before M48 Their thesis will be made available on ELENAs website and at the respective institutes or national libraries as appropriate and in line with IP policies of the respective beneficiaries ESR11 will complete herhis PhD in M48 6 the Netherlands

Equal Opportunity Declaration

The Equal Opportunity Declaration has been formulated and published on ELENA´s web site.

WP6 Secondments III

All secondments planned for ESR6 ESR10 ESR12 ESR13 ESR14 and ESR15 before M42 have been completed

WP5 Secondments III

All secondments planned for ESR1 ESR2 ESR3 ESR4 ESR8 and ESR9 before M42 have been completed

WP5 PhD degrees

Within WP5 ESR1 ESR2 ESR3 ESR4 ESR8 and ESR9 are expected to complete their PhD before M48 Their thesis will be made available on ELENAs web site and at the respective institutes or national libraries as appropriate and in line with the IP policies of the respective beneficiaries

WP6 PhD degrees

Within WP6 ESR6 ESR10 ESR12 ESR13 ESR14 and ESR15 are expected to complete their PhD before M48 Their thesis will be made available on ELENAs web site and at the respective institutes or national libraries as appropriate

Outreach and Dissemination activity plan - Revision I

The first revision of the Outreach and Dissemination Plan has been performed and a report on Outreach and Dissemination activities in M01 - M12 has been compiled.

WP4 Secondments I

All secondments planned for ESR5, ESR7 and ESR11 before M18 have been completed.

Outreach and Dissemination Board

The Outreach and Dissemination Board (ODB) has been established and is operational. An initial Outreach and Dissemination plan is in place.

WP4 Secondments III

All secondments planned for ESR5 ESR7 and ESR11 before M42 are completed

WP5 Publications and Dissemination

We estimate that the output of scientific publications from ELENAs participants will not be less than 80 peerreviewed papers We also anticipate a number of technical reports and 23 conference contributions annually from each ESRs projectIn WP5 publication technical reports and conference contributions will mainly be oni LEE interaction FEBID precursors in the gas phaseii LEE interaction EUVL compounds in the gas phaseiii ND detection through post ionizationiv ND detection through fluorescence measurementsv LEE interaction with FEBID precursors at surfacesvi LEE interaction with EUVL compounds at surfacesvii Linking SAMs through low energy electron interaction All scientific publications and conference contributions will be made public on ELENAs web site in accordance with copyright law This is an ongoing progress but a final report will be submitted in M48

ELENA's career fair

A report on the career fair organized by OU and Minerva where ELENAs ESRs meet with industrial and other potential employers and have the opportunity to present their individual projects and carrier development logs

WP5 Secondments I

All secondments planned for ESR1, ESR2, ESR3, ESR4, ESR8 and ESR9 before M18 have been completed.

Documentation of recruitment

Documentation of the ESR recruitment process. This includes statistics on the distribution of applicants, conduct of the selection process, interview forms and selection criteria.

Kick-off meeting and meeting report

The kick-off meeting is intended to be early November which places it in M2. The intention is to co-locate the kick-off meeting with the workshop on Low Energy Electrons: Lithography, Imaging and Soft Matter (LEELIS-II) hosted by ARCNL in Amsterdam 10-11 November 2016. Deliverable: A report with an overview of the kick-off meeting, its agenda, participants, main decisions made.

WP6 Secondments II

All secondments planned for ESR6 ESR10 ESR12 ESR13 ESR14 and ESR15 before M30 have been completed

WP6 Publications and Dissemination

We estimate that the output of scientific publications from ELENAs participants will not be less than 80 peerreviewed papers We also anticipate a number of technical reports and 23 conference contributions annually from each ESRs projectIn WP5 publication technical reports and conference contributions will mainly be oni Novel platform photoresistsii LEE interaction EUVL compounds in the gas phaseiii Multi dimensional parameter optimizationiv Composition control through multiple gas inletsv Computer simulations of nanostructure growth All scientific publications and conference contributions will be made public on ELENAs web site in accordance with copyright law This is an ongoing process but intermediary summary reports on ELENAs scientific output for individual WPs will be delivered M18 and M36

Final Outreach and Dissemination Board activity report

The final Outreach and Dissemination Plan is formulated to prepare outreach and dissemination activities and to publicize results after the end of ELENA along with a final report on Outreach and Dissemination activities within the duration of ELENA

Outreach and Dissemination activity plan - Revision II

The second revision of the Outreach and Dissemination Plan has been performed and a report on Outreach and Dissemination activities in M13 - M24 has been compiled.

Management meetings and meeting reports

Four management meetings will be held in M4 M16 M24 and M36 Reports from these meetings will be compiled with an overview of the meetings and their agenda participants and main decisions made

WP5 Secondments II

All secondments planned for ESR1 ESR2 ESR3 ESR4 ESR8 and ESR9 before M30 have been completed

Supervisory Board

The Supervisory Board has been established and is operational.

WP4 Publications and Dissemination

We estimate that the output of scientific publications from ELENAs participants will not be less than 80 peerreviewed papers We also anticipate a number of technical reports and 23 conference contributions annually from each ESRs projectIn WP4 publication technical reports and conference contributions will mainly be oni Synthesis of new molecular entities for FEBIDii Synthesis of new molecular entities for EUVLiii Enhanced electron induced chemistry using processing gasesiv Photoresist studies through timeresolved spectroscopy All scientific publications and conference contributions will be made public on ELENAs web site in accordance with copyright law This is an ongoing process but a final report will be submitted in M48

ELENA exhibition

ELENA will draw upon partner material to create a touring exhibition explaining the new opportunities the research of ELENA delivers to current and emerging nanotechnologiesThe first version will be ready at the specified due date M30 with ongoing refining

Establish ELENA website

Establish a website for public view and internal usage for the ELENA project. This website will, among other things, be used to develop an international community of participants with the exchange of ideas, experiences and perspectives between ESRs.

ESOF participation

ELENA plans to display its exhibition at the ESOF European Scientific Open Forum meeting in 2018 to be held in Toulouse This forum will be used to develop ELENAs exhibition and the due date is set for a report at the end of 2018

Data Review for WP6

As an integral part of the research and training part all ESRs participate actively in the construction of ELENA's database. This activity begins on day one after recruitment and constitutes, through a critical literature review, the extraction of data and organisation of that data into the ELENA database throughout. In this context ESRs allocated to WP6 initially review existing electron molecule interaction data for entries into ELENA data-base (FEBID and EUV). A complete compilation of data existing before the start date of ELANA is expected to be completed at the due date in M12.

Data Management Plan

A Data Management Plan has been formulated.

Data Review for WP4

As an integral part of the research and training part all ESRs participate actively in the construction of ELENA's database. This activity begins on day one after recruitment and constitutes, through a critical literature review, the extraction of data and organisation of that data into the ELENA database throughout. In this context ESRs allocated to WP4 initially review data for existing and potential FEBID precursor and EUVL resist material for entrance in to ELENAs database. A complete compilation of data existing before the start date of ELENA is expected to be completed at the due date in M12.

Data Review for WP5

As an integral part of the research and training part all ESRs participate actively in the construction of ELENA's database. This activity begins on day one after recruitment and constitutes, through a critical literature review, the extraction of data and organisation of that data into the ELENA database throughout. In this context ESRs allocated to WP5 initially review data for existing electron molecule interaction data for entries into ELENAs data-base (FEBID and EUV). A complete compilation of data existing before the start date of ELANA is expected to be completed at the due date in M12.

Pubblicazioni

Fragmentation of Nickel(II) and Cobalt(II) Bis(acetylacetonate) Complexes Induced by Slow (<10 eV) Electrons

Autori: Franck Rabilloud, Janina Kopyra, and Hassan Abdoul-Carime*
Pubblicato in: Inorganic Chemistry, Numero 60, 11,, 2021, Pagina/e 8154–8163, ISSN 1089-5639
Editore: American Chemical Society
DOI: 10.1021/acs.inorgchem.1c00795

Controlled Electron‐Induced Fabrication of Metallic Nanostructures on 1 nm Thick Membranes

Autori: Christian Preischl, Linh Hoang Le, Elif Bilgilisoy, Florian Vollnhals, Armin Gölzhäuser, Hubertus Marbach
Pubblicato in: Small, Numero 16/45, 2020, Pagina/e 2003947, ISSN 1613-6810
Editore: Wiley - V C H Verlag GmbbH & Co.
DOI: 10.1002/smll.202003947

Indirect mechanism of Au adatom diffusion on the Si(100) surface

Autori: Alejandro Peña-Torres, Abid Ali, Michail Stamatakis, and Hannes Jónsson
Pubblicato in: Physical Review B, Numero 105, 2022, Pagina/e 205411, ISSN 2469-9950
Editore: American Physical Society
DOI: 10.1103/physrevb.105.205411

Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate

Autori: Luisa Berger, Jakub Jurczyk, Katarzyna Madajska, Iwona B. Szymanska , Patrik Hoffmann and Ivo Utke
Pubblicato in: Micromachines, Numero 12(5), 2021, Pagina/e 580, ISSN 2072-666X
Editore: Multidisciplinary Digital Publishing Institute (MDPI)
DOI: 10.3390/mi12050580

XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy

Autori: Najmeh Sadegh, Maarten van der Geest, Jarich Haitjema, Filippo Campi, Sonia Castellanos, Peter M. Kraus, Albert M. Brouwer
Pubblicato in: Journal of Photopolymer Science and Technology, Numero 33/2, 2020, Pagina/e 145-151, ISSN 0914-9244
Editore: Technical Association of Photopolymers
DOI: 10.2494/photopolymer.33.145

Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography

Autori: Ashish Rathore, Ivan Pollentier, Sunkuru S. Kumar, Danilo De Simone, Stefan De Gendt
Pubblicato in: Journal of Micro/Nanopatterning, Materials, and Metrology, Numero 20(3), 2021, Pagina/e 034602, ISSN 1932-5150
Editore: S P I E - International Society for Optical Engineering
DOI: 10.1117/1.jmm.20.3.034602

High-Purity Copper Structures from a Perfluorinated Copper Carboxylate Using Focused Electron Beam Induced Deposition and Post-Purification

Autori: Luisa Berger, Jakub Jurczyk, Katarzyna Madajska, Thomas Edward James Edwards, Iwona Szymańska, Patrik Hoffmann, Ivo Utke
Pubblicato in: ACS Applied Electronic Materials, Numero 2/7, 2020, Pagina/e 1989-1996, ISSN 2637-6113
Editore: American Chemical Society
DOI: 10.1021/acsaelm.0c00282

Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)6)

Autori: Po-Yuan Shih‡,Maicol Cipriani‡, Christian Felix Hermanns, Jens Oster, Klaus Edinger, Armin Gölzhäuser and Oddur Ingólfsson
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 13, 2022, Pagina/e 182–191., ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.13.13

The Role of Low-Energy Electron Interactions in cis-Pt(CO)(2)Br-2 Fragmentation

Autori: Maicol Cipriani, Styrmir Svavarsson, Filipe Ferreira da Silva, Hang Lu, Lisa McElwee-White and Oddur Ingólfsson
Pubblicato in: INTERNATIONAL JOURNAL OF MOLECULAR SCIENCES, Numero 22(16), 2021, Pagina/e 8984, ISSN 1422-0067
Editore: Multidisciplinary Digital Publishing Institute (MDPI)
DOI: 10.3390/ijms22168984

Surface Reactions of Low-Energy Argon Ions with Organometallic Precursors

Autori: Elif Bilgilisoy, Rachel M. Thorman, Jo-Chi Yu, Timothy B. Dunn, Hubertus Marbach, Lisa McElwee-White, D. Howard Fairbrother
Pubblicato in: The Journal of Physical Chemistry C, Numero 124/45, 2020, Pagina/e 24795-24808, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.0c07269

Extreme ultraviolet photoemission of a tin-based photoresist

Autori: Zhang, Y.; Haitjema, J.; Castellanos, S.; Lugier, O.; Sadegh, N.; Ovsyannikov, R.; Giangrisostomi, E.; Johansson, F.O.L.; Berggren, E.; Lindblad, A.; Brouwer, A.M
Pubblicato in: Applied Physics Letters, Numero 118, 2021, Pagina/e 171903, ISSN 0003-6951
Editore: American Institute of Physics
DOI: 10.1063/5.0047269

Ultrathin Carbon Nanomembranes from 5,10,15,20-Tetraphenylporphyrin: Electron Beam Induced Fabrication and Functionalization via Focused Electron Beam Induced Processing

Autori: Christian Preischl, Markus Rohdenburg, Elif Bilgilisoy, René Cartaya, Petra Swiderek, Hubertus Marbach
Pubblicato in: The Journal of Physical Chemistry C, Numero 124/51, 2020, Pagina/e 28335-28344, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.0c09694

Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography

Autori: Markus Rohdenburg, Neha Thakur, René Cartaya, Sonia Castellanos and Petra Swiderek
Pubblicato in: Physical Chemistry Chemical Physics, Numero 23, 2021, Pagina/e 16646-16657, ISSN 1463-9084
Editore: Royal Chemical Society
DOI: 10.1039/d1cp02334a

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

Autori: Ashish Rathore, Ivan Pollentier, Maicol Cipriani, Harpreet Singh, Danilo De Simone, Oddur Ingólfsson, Stefan De Gendt
Pubblicato in: ACS Applied Polymer Materials, Numero 3/4, 2021, Pagina/e 1964-1972, ISSN 2637-6105
Editore: American Chemical Society
DOI: 10.1021/acsapm.1c00018

Gold(I) N-heterocyclic carbene precursors for focused electron beam-induced deposition

Autori: Cristiano Glessi, Aya Mahgoub, Cornelis W Hagen, Mats Tilset
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 12, 2021, Pagina/e 257-269, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.12.21

Efficient NH3-based process to remove chlorine from electron beam deposited ruthenium produced from (η3-C3H5)Ru(CO)3Cl

Autori: Markus Rohdenburg, Hannah Boeckers, Christopher R. Brewer, Lisa McElwee-White, Petra Swiderek
Pubblicato in: Scientific Reports, Numero 10/1, 2020, ISSN 2045-2322
Editore: Nature Publishing Group
DOI: 10.1038/s41598-020-67803-y

Electron-Induced Reactions of Ru(CO) 4 I 2 : Gas Phase, Surface, and Electron Beam-Induced Deposition

Autori: Rachel M. Thorman, Pernille A. Jensen, Jo-Chi Yu, Scott J. Matsuda, Lisa McElwee-White, Oddur Ingólfsson, D. Howard Fairbrother
Pubblicato in: The Journal of Physical Chemistry C, Numero 124/19, 2020, Pagina/e 10593-10604, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.0c01801

Effect of molecular weight on the EUV-printability of main chain scission type polymers

Autori: Ashish Rathore, Ivan Pollentier, Harpreet Singh, Roberto Fallica, Danilo De Simone, Stefan De Gendt
Pubblicato in: Journal of Materials Chemistry C, Numero 8/17, 2020, Pagina/e 5958-5966, ISSN 2050-7534
Editore: Royal Society of Chemistry
DOI: 10.1039/c9tc06482f

Low Energy Electron- and Ion-Induced Surface Reactions of Fe(CO)5 Thin Films

Autori: E. Bilgilisoy, R. M. Thorman, M. S. Barclay, H. Marbach, D. H. Fairbrother
Pubblicato in: Journal of Physical Chemistry C, Numero 125, 2021, Pagina/e 17749-17760, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.1c05826

Dissociation of the FEBID precursor cis -Pt(CO) 2 Cl 2 driven by low-energy electrons

Autori: Filipe Ferreira da Silva, Rachel M. Thorman, Ragnar Bjornsson, Hang Lu, Lisa McElwee-White, Oddur Ingólfsson
Pubblicato in: Physical Chemistry Chemical Physics, Numero 22/11, 2020, Pagina/e 6100-6108, ISSN 1463-9076
Editore: Royal Society of Chemistry
DOI: 10.1039/c9cp06633k

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Autori: Ashish Rathore, Maicol Cipriani, Ching-Chung Huang, Lionel Amiaud, Céline Dablemont, Anne Lafosse, Oddur Ingólfsson, Danilo De Simone, Stefan De Gendt
Pubblicato in: Physical Chemistry Chemical Physics, Numero 23/15, 2021, Pagina/e 9228-9234, ISSN 1463-9076
Editore: Royal Society of Chemistry
DOI: 10.1039/d1cp00065a

Vacuum versus ambient pressure inert gas thermogravimetry: a study of silver carboxylates

Autori: Jakub Jurczyk, Cristiano Glessi, Katarzyna Madajska, Luisa Berger, Jeroen Ingolf Ketele Nyrud, Iwona Szymańska, Czesław Kapusta, Mats Tilset, Ivo Utke
Pubblicato in: Journal of Thermal Analysis and Calorimetry, 2021, ISSN 1388-6150
Editore: Akademiai Kiado
DOI: 10.1007/s10973-021-10616-6

Organometallic chemistry in aqua regia : metal and ligand based oxidations of (NHC)AuCl complexes

Autori: Volodymyr Levchenko, Cristiano Glessi, Sigurd Øien-Ødegaard, Mats Tilset
Pubblicato in: Dalton Transactions, Numero 49/11, 2020, Pagina/e 3473-3479, ISSN 1477-9226
Editore: Royal Society of Chemistry
DOI: 10.1039/c9dt04472h

Charged Particle-Induced Surface Reactions of Organometallic Complexes as a Guide to Precursor Design for Electron- and Ion-Induced Deposition of Nanostructures

Autori: Jo-Chi Yu, Mohammed K. Abdel-Rahman, D. Howard Fairbrother, and Lisa McElwee-White
Pubblicato in: ACS APPLIED MATERIALS & INTERFACES, Numero 13(41), 2021, Pagina/e 48333-48348, ISSN 1944-8244
Editore: American Chemical Society
DOI: 10.1021/acsami.1c12327

Detection of Au+ Ions During Fluorine Gas-Assisted Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) for the Complete Elemental Characterization of Microbatteries

Autori: Agnieszka Priebe, Jordi Sastre, Moritz H. Futscher, Jakub Jurczyk, Marcos V. Puydinger dos Santos, Yaroslav E. Romanyuk, and Johann Michler
Pubblicato in: ACS APPLIED MATERIALS & INTERFACES, Numero 13 (34), 2021, Pagina/e 41262-41274, ISSN 1944-8244
Editore: American Chemical Society
DOI: 10.1021/acsami.1c10352

Direct Electron Beam Writing of Silver-Based Nanostructures

Autori: Katja Höflich, Jakub Jurczyk, Yucheng Zhang, Marcos V. Puydinger dos Santos, Maximilian Götz, Carlos Guerra-Nuñez, James P. Best, Czeslaw Kapusta, Ivo Utke
Pubblicato in: ACS Applied Materials & Interfaces, Numero 9/28, 2017, Pagina/e 24071-24077, ISSN 1944-8244
Editore: American Chemical Society
DOI: 10.1021/acsami.7b04353

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

Autori: Christian Preischl, Linh Hoang Le, Elif Bilgilisoy, Armin Gölzhäuser, Hubertus Marbach
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 12, 2021, Pagina/e 319-329, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.12.26

Gas-assisted silver deposition with a focused electron beam

Autori: Luisa Berger, Katarzyna Madajska, Iwona B Szymanska, Katja Höflich, Mikhail N Polyakov, Jakub Jurczyk, Carlos Guerra-Nuñez, Ivo Utke
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 9, 2018, Pagina/e 224-232, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.9.24

Towards the third dimension in direct electron beam writing of silver

Autori: Katja Höflich, Jakub Mateusz Jurczyk, Katarzyna Madajska, Maximilian Götz, Luisa Berger, Carlos Guerra-Nuñez, Caspar Haverkamp, Iwona Szymanska, Ivo Utke
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 9, 2018, Pagina/e 842-849, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.9.78

Surface-Anchored Metal–Organic Frameworks as Versatile Resists for Gas-Assisted E-Beam Lithography: Fabrication of Sub-10 Nanometer Structures

Autori: Martin Drost, Fan Tu, Luisa Berger, Christian Preischl, Wencai Zhou, Hartmut Gliemann, Christof Wöll, Hubertus Marbach
Pubblicato in: ACS Nano, Numero 12/4, 2018, Pagina/e 3825-3835, ISSN 1936-0851
Editore: American Chemical Society
DOI: 10.1021/acsnano.8b01071

Rapid Water Permeation Through Carbon Nanomembranes with Sub-Nanometer Channels

Autori: Yang Yang, Petr Dementyev, Niklas Biere, Daniel Emmrich, Patrick Stohmann, Riko Korzetz, Xianghui Zhang, André Beyer, Sascha Koch, Dario Anselmetti, Armin Gölzhäuser
Pubblicato in: ACS Nano, Numero 12/5, 2018, Pagina/e 4695-4701, ISSN 1936-0851
Editore: American Chemical Society
DOI: 10.1021/acsnano.8b01266

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

Autori: Ziyan Warneke, Markus Rohdenburg, Jonas Warneke, Janina Kopyra, Petra Swiderek
Pubblicato in: Beilstein Journal of Nanotechnology, Numero 9, 2018, Pagina/e 77-90, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.9.10

Electron Beam-Induced Surface Activation of Metal–Organic Framework HKUST-1: Unraveling the Underlying Chemistry

Autori: Kai Ahlenhoff, Christian Preischl, Petra Swiderek, Hubertus Marbach
Pubblicato in: The Journal of Physical Chemistry C, Numero 122/46, 2018, Pagina/e 26658-26670, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.8b06226

Focused Electron Beam-Induced Deposition and Post-Growth Purification Using the Heteroleptic Ru Complex (η 3 -C 3 H 5 )Ru(CO) 3 Br

Autori: Jakub Jurczyk, Christopher R. Brewer, Olivia M. Hawkins, Mikhail N. Polyakov, Czeslaw Kapusta, Lisa McElwee-White, Ivo Utke
Pubblicato in: ACS Applied Materials & Interfaces, Numero 11/31, 2019, Pagina/e 28164-28171, ISSN 1944-8244
Editore: American Chemical Society
DOI: 10.1021/acsami.9b07634

Cisplatin as a Potential Platinum Focused Electron Beam Induced Deposition Precursor: NH 3 Ligands Enhance the Electron-Induced Removal of Chlorine

Autori: Markus Rohdenburg, Petra Martinović, Kai Ahlenhoff, Sascha Koch, Daniel Emmrich, Armin Gölzhäuser, Petra Swiderek
Pubblicato in: The Journal of Physical Chemistry C, Numero 123/35, 2019, Pagina/e 21774-21787, ISSN 1932-7447
Editore: American Chemical Society
DOI: 10.1021/acs.jpcc.9b05756

Mechanical Properties of 3D Nanostructures Obtained by Focused Electron/Ion Beam-Induced Deposition: A Review

Autori: Ivo Utke, Johann Michler, Robert Winkler, Harald Plank
Pubblicato in: Micromachines, Numero 11/4, 2020, Pagina/e 397, ISSN 2072-666X
Editore: Multidisciplinary Digital Publishing Institute (MDPI)
DOI: 10.3390/mi11040397

Metals by Micro‐Scale Additive Manufacturing: Comparison of Microstructure and Mechanical Properties

Autori: Alain Reiser, Lukas Koch, Kathleen A. Dunn, Toshiki Matsuura, Futoshi Iwata, Ofer Fogel, Zvi Kotler, Nanjia Zhou, Kristin Charipar, Alberto Piqué, Patrik Rohner, Dimos Poulikakos, Sanghyeon Lee, Seung Kwon Seol, Ivo Utke, Cathelijn Nisselroy, Tomaso Zambelli, Jeffrey M. Wheeler, Ralph Spolenak
Pubblicato in: Advanced Functional Materials, 2020, Pagina/e 1910491, ISSN 1616-301X
Editore: John Wiley & Sons Ltd.
DOI: 10.1002/adfm.201910491

Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers

Autori: Olivier Lugier, Alessandro Troglia, Najmeh Sadegh, Luc van Kessel, Roland Bliem, Nicola Mahne, Stefano Nannarone, Sonia Castellanos
Pubblicato in: Journal of Photopolymer Science and Technology, Numero 33/2, 2020, Pagina/e 229-234, ISSN 0914-9244
Editore: Technical Association of Photopolymers
DOI: 10.2494/photopolymer.33.229

Electron beam-induced deposition of platinum from Pt(CO)(2)Cl-2 and Pt(CO)(2)Br-2

Autori: Aya Mahgoub, Hang Lu, Rachel M. Thorman, Konstantin Preradovic, Titel Jurca, Lisa McElwee-White, Howard Fairbrothe and Cornelis W. Hagen
Pubblicato in: BEILSTEIN JOURNAL OF NANOTECHNOLOGY, Numero 11, 2020, Pagina/e 1789-1800, ISSN 2190-4286
Editore: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI: 10.3762/bjnano.11.161

Nanoscale Ruthenium-Containing Deposits from Ru(CO)4I2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond,

Autori: E. Bilgilisoy, J. C. Yu, C. Preischl, L. McElwee-White, H.P. Steinrück, H. Marbach
Pubblicato in: ACS Applied Nano Mater, Numero 5, 2022, Pagina/e 3855-3865, ISSN 2574-0970
Editore: American Chemical Society
DOI: 10.1021/acsanm.1c04481

Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition

Autori: Po-Yuan Shih, Reza Tafrishi, Maicol Cipriani, Christian Felix Hermanns, Jens Oster, Armin Gölzhäuser, Klaus Edinger and Oddur Ingólfsson
Pubblicato in: PHYSICAL CHEMISTRY CHEMICAL PHYSICS, Numero 16 (24), 2022, Pagina/e 9564-9575, ISSN 1463-9076
Editore: Royal Society of Chemistry
DOI: 10.1039/d2cp00257d

Mechanism of Interlayer Transport on a Growing Au(111) Surface: 2D vs. 3D Growth

Autori: Abi Ali and Hannes Jónsson
Pubblicato in: SURFACES AND INTERFACES, Numero 31, 2022, Pagina/e 2468-0230, ISSN 2468-0230
Editore: Elsevier
DOI: 10.1016/j.surfin.2022.101944

Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

Autori: I. Utke, P. Swiderek, K. Höflich, K. Madajska, J. Jurczyk, P. Martinović, I.B. Szymańska
Pubblicato in: Coordination Chemistry Reviews, Numero 458, 2022, Pagina/e 213851, ISSN 0010-8545
Editore: Elsevier BV
DOI: 10.1016/j.ccr.2021.213851

Smooth or not: Robust fused silica micro-components by femtosecond-laser-assisted etching

Autori: Remo N. Widmer, David Bischof, Jakub Jurczyk, Markus Michler, Jakob Schwiedrzik, Johann Michler
Pubblicato in: Materials & Design, Numero 204, 2021, Pagina/e 109670, ISSN 0264-1275
Editore: Elsevier BV
DOI: 10.1016/j.matdes.2021.109670

Relating mask repair performance to physical and chemical aspects of focused electron beam induced deposition (FEBID)

Autori: Po-Yuan Shih
Pubblicato in: 2022, Pagina/e 1-185
Editore: Fakultät für Physik, Universität Bielefeld
DOI: 10.4119/unibi/2962553

New material chemistry exploration for Extreme Ultraviolet Lithography

Autori: Ashish Rathore
Pubblicato in: 2021
Editore: KU Leuven, Faculty of Science

Study of novel precursors for Focused Electron Beam Induced Depo- sition of Metal Nanowires

Autori: Jakub Mateusz Jurczyk
Pubblicato in: 2021, Pagina/e 1-174
Editore: AGH-University of Science and Technology, Faculty of Physics and Applied Computer Sciences, Department of Solid State Physics

Atomic Scale Simulations of Pt and Au Adatom Diffusion and Interlayer Transport

Autori: Abid Ali
Pubblicato in: 2022, Pagina/e 1-185, ISBN 978-9935-9630-1-7
Editore: University of Iceland, School of Engineering and Natural Sciences, Faculty of Physical Sciences

Gold-NHC Complexes for Vacuum Deposition Applications: Synthesis, Characterization, and Applications in FEBID

Autori: Cristiano Glessi
Pubblicato in: 2021, ISSN 1501-7710
Editore: Universitetet i Oslo, Det matematisk-naturvitenskapelige fakultet

Synthesis and characterization of novel photoresist for extreme UV lithography

Autori: Ching-Chung Huang
Pubblicato in: 2021, Pagina/e 1-226
Editore: E308 - Institut für Werkstoffwissenschaft und Werkstofftechnologie, Technische Universität Wien
DOI: 10.34726/hss.2021.59302

Ligand Size and Chain Length Study of Silver Carboxylates in Focused Electron Beam Induced Deposition

Autori: Jakub Jurczyk, Katarzyna Madajska, Luisa Berger, Leo Brockhuis, Thomas Edward James Edwards, Katja Höflich, Czesław Kapusta, Iwona Szymanska, Ivo Utke
Pubblicato in: preprints.org, 2021
Editore: preprints.org
DOI: 10.20944/preprints202101.0415.v1

Dissociative Electron Attachment Cross Sections for Ni(CO)4, Co(CO)3NO, Cr(CO)6

Autori: Maria Pintea, Nigel Mason, Maria Tudorovskaya
Pubblicato in: 2022
Editore: arxiv
DOI: 10.48550/arxiv.2201.10976

Velocity Map Imaging and Cross Sections of Fe(CO)5 for FEBIP Applications

Autori: Maria Pintea, Nigel Mason, Maria Tudorovskaya
Pubblicato in: 2022, Pagina/e 1-19
Editore: arxiv
DOI: 10.48550/arxiv.2201.04953

Development of main chain scission type photoresists for EUV lithography

Autori: Akihide Shirotori, Yannick Vesters, Manabu Hoshino, Ashish Rathore, Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2019, 2019, Pagina/e 17, ISBN 9781510629981
Editore: SPIE
DOI: 10.1117/12.2536348

Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure

Autori: Yannick Vesters, Atish Rathore, Pieter Vanelderen, John Petersen, Danilo De Simone, Geert Vandenberghe, Ivan Pollentier
Pubblicato in: Advances in Patterning Materials and Processes XXXV, 2018, Pagina/e 11, ISBN 9781-510616653
Editore: SPIE
DOI: 10.1117/12.2299593

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