Metrology Advances for Digitized ECS industry 4.0

Risultati finali

D6.3.4: SEMICON Europa 2021 Dissemination Factsheets

D634 SEMICON Europa 2021 Dissemination Factsheets

D6.3.5: ENBIS 2021 data management / machine learning Workshop Dissemination Factsheet

D635 ENBIS 2021 data management machine learning Workshop Dissemination Factsheet

D6.3.3: SEMI Technology Unites Global Summit Dissemination Factsheets
SEMICON Europa 2019 Dissemination Factsheets - 1
D6.3.6: SEMI Technology Unites Global Summit Dissemination Factsheets

D636 SEMI Technology Unites Global Summit Dissemination Factsheets

Pubblicazioni

Atomistic Simulation of Ultra-Fast Annealing Processes (Invited Talk)

Autori: Antonino La Magna
Pubblicato in: EMRS (European Material Research Society) Fall, 2022 September 19-23, 2022
Editore: Elsevier

Predictive virtual processes, metrology and maintenance in power device manufacturing

Autori: Antonino La Magna (CNR), Umberto Amato (CNR), Daniele Pagano (ST-I), Patrizia Vasquez (ST-I), Anastasiia Doinychko (MENTOR), Andrea Calimera (POLITO), Alex Rosenbaum (MELLANOX), Marius Enachescu (UPB), Ioannis Deretzis (CNR)
Pubblicato in: "ISBIS CONFERENCE 2022 on ""Statistics and Data Science in Business and Industry""", 2022, Pagina/e 37, ISBN 979-12-210-1389-4
Editore: ISBIS

Structural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealing

Autori: Paolo Badalà, Emanuele Smecca, Simone Rascunà, Corrado Bongiorno, Egidio Carria, Anna Bassi, Gabriele Bellocchi, Cristina Tringali, Antonino La Magna and Alessandra Alberti
Pubblicato in: 13th European Conference on Silicon Carbide and Related materials ECSCRM 2021, 2021
Editore: ECSCRM

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Autori: Claudia G. Fatuzzo, Philipp Hönicke, Claudia Caliri, Roberta Ricciari, Daniele Pagano, Andreas G. Karydas, Francesco Paolo Romano
Pubblicato in: EXRS2022 European Conference on X-ray Spectrometry 2022, 2022
Editore: EXRS2022

MFIG - a Mass Filtered Ion Gauge

Autori: Bekman, H.H.P.T. Westland, Y. Elstgeest, T.H. Mechielsen, T.W. Haye, M.J. Emmelkamp, J. Molkenboer, F.T. Koster, N.B. Lensen, H.A.
Pubblicato in: 2022
Editore: IVC-22, 22nd International Vacuum Congress (https://ivc22.org/)

A fusion of electronic design, process and metrology in semiconductor manufacturing for improved process optimization and control

Autori: Anastasiia Doinychko, Andres Torres, Ivan Kissiov, Melody Tao, Sanghyun Choi (Mentor - S-EDA)
Pubblicato in: "ISBIS CONFERENCE 2022 on ""Statistics and Data Science in Business and Industry""", 2022, Pagina/e PAg.34, ISBN 979-12-210-1389-4
Editore: ISBIS

Industry4.0 Productivity Improvement in Major EU Fabs

Autori: Daniele Pagano (ST-I)
Pubblicato in: Webinar: Next Generation Inspection and Metrology Solutions, 2022
Editore: SEMI

Chasing Abnormalities on Time Series for Predictive Maintenance and Advanced Process Control

Autori: C. Girou, F. Bergeret, D. Pagano, P. Vasquez, G. Prinzivalli, G. Tochino
Pubblicato in: 20th European Advanced Process Control and Manufacturing Conference (apc|m), 2022
Editore: APCM - Silicon Saxony

Ni-silicide ohmic contacts on 4H-SiC formed by multi pulse excimer laser annealing

Autori: P. Badalà (ST-I), I. Deretzis (CNR), S. Sanzaro (CNR), C. Bongiorno (CNR), G. Fisicaro (CNR), S. Rascunà (ST-I), G. Bellocchi (ST-I), A. Bassi (ST-I), M. Boscaglia (ST-I), D. Pagano (ST-I), P. Vasquez (ST-I), M. Enachescu (UPB), A. Alberti (CNR), A. La Magna (CNR)
Pubblicato in: ICSCRM 2022 (International Conference on Silicon Carbide and Related Materials) 19th International Conference on Silicon Carbide and Related Materials, 2022, Pagina/e Pag.42
Editore: ICSCRM

Multiscale simulations of plasma etching in silicon carbide structures

Autori: M.Italia, I.Deretzis, S.Scalese, A.La Magna, M.Pirnaci, D.Pagano, D.Tenaglia, P.Vasquez
Pubblicato in: 13th European Conference on Silicon Carbide and Related materials ECSCRM 2021, 2021
Editore: ECSCRM

Block copolymer line roughness measurement via PSD: application to fingerprint samples

Autori: Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron
Pubblicato in: 2020
Editore: SPIE
DOI: 10.1117/12.2551854

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources for archeometric applications

Autori: Claudia G. Fatuzzo, Philipp Hönicke, Claudia Caliri, Andreas Karydas and Francesco Paolo Romano
Pubblicato in: 107th National Congress - Italian Physical Society, 2021
Editore: SIF

A Comparative Evaluation of Deep Learning Anomaly Detection Techniques on Semiconductor Multivariate Time Series Data

Autori: Philip Tchatchoua, Guillaume Graton, Mustapha Ouladsine, Michel Juge
Pubblicato in: IEEE 17th International Conference on Automation Science and Engineering (CASE), 2021
Editore: IEEE
DOI: 10.1109/case49439.2021.9551541

Health Indicator for Batch Processes Based on SP-LASSO

Autori: Dima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton
Pubblicato in: 2022
Editore: IFAC
DOI: 10.1016/j.ifacol.2022.07.156

Closed-loop active object recognition with constrained illumination power

Autori: Jacques Noom, Oleg Soloviev, Carlas Smith, Michel Verhaegen
Pubblicato in: Proc. SPIE 12102, Real-Time Image Processing and Deep Learning 2022, Numero 1210203 (27 May 2022), 2022
Editore: SPIE
DOI: 10.1117/12.2618750

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Autori: G. J. Rademaker, A. Le Pennec, T. J. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiro
Pubblicato in: 2020
Editore: SPIE
DOI: 10.1117/12.2552003

Particle detection using closed-loop active model diagnosis

Autori: Jacques Noom, Oleg Soloviev, Carlas Smith, Hieu Thao Nguyen, Michel Verhaegen
Pubblicato in: Proc. SPIE 12019, AI and Optical Data Sciences III, Numero 120190F (2 March 2022), 2022
Editore: SPIE
DOI: 10.1117/12.2605452

High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

Autori: Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten E. van Reijzen, Cornel Bozdog, Hamed M. Sadeghian
Pubblicato in: Proceedings SPIE Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC120530I (2022), 2022
Editore: SPIE
DOI: 10.1117/12.2616089

Data fusion by artificial neural network for hybrid metrology development

Autori: L. Penlap Woguia, J. Reche, M. Besacier, P. Gergaud, G. Rademaker
Pubblicato in: 2021
Editore: SPIE
DOI: 10.1117/12.2583590

TXRF/GIXRF high precision laboratory setup with high flux monochromatic source

Autori: Claudia G. Fatuzzo, Philipp Hönicke, Claudia Caliri, Roberta Ricciari, Daniele Pagano, Andreas G. Karydas, Patrizia Vasquez, Francesco Paolo Romano
Pubblicato in: 6th PTB Seminar - VUV and EUV Metrology, 2021
Editore: PTB

LASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing Processes

Autori: Dima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton
Pubblicato in: 2022
Editore: IEEE
DOI: 10.23919/ecc55457.2022.9838058

Multi-branch neural network for hybrid metrology improvement

Autori: P. Digraci, M. Besacier, P. Gergaud, G. Rademaker, J. Reche
Pubblicato in: 2022
Editore: SPIE
DOI: 10.1117/12.2612798

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

Autori: Noom, J., Thao, N.H., Soloviev, O., Verhaegen, M.
Pubblicato in: Intelligent Systems Design and Applications. ISDA 2020. Advances in Intelligent Systems and Computing, vol 1351, 2021
Editore: Springer
DOI: 10.1007/978-3-030-71187-0_60

Autori: Dima el Jamal, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton
Pubblicato in: International Conference on Control, Automation and Diagnosis (ICCAD), 2021
Editore: IEEE
DOI: 10.1109/iccad52417.2021.9638776

Virtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating Deposition

Autori: A. Doinychko, U. Amato, S. Raitsyn, S. Perna, F. Blundo, C. Genua, D. Vinciguerra, A. La Magna, A. Torres, A. Rosenbaum, M.-R. Amini, and P. Vasquez
Pubblicato in: 2021 IEEE 17th International Conference on Automation Science and Engineering, 2021
Editore: IEEE

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

Autori: M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. C. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. E. van Reijzen, C. Bozdog, H. Sadeghian
Pubblicato in: Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250M (2022), Numero XXVIII, 2022
Editore: SPIE
DOI: 10.1117/12.2641698

Predictive discarding of wafers based on power leakage predictions from single layer misalignment data

Autori: Geert H. van Kollenburg, Mike Holenderski, Patrizia Vasquez, Nirvana Meratnia
Pubblicato in: ISM 2021 - International Conference on Industry 4.0 and Smart Manufacturing, 2022
Editore: Procedia Computer Science - Elsevier

Increase of wafer inspection tool throughput with computational imaging

Autori: Oleg Soloviev, Hieu Thao Nguyen, Jacques Noom, and Michel Verhaegen
Pubblicato in: Proc. SPIE 12098, Dimensional Optical Metrology and Inspection for Practical Applications XI, Numero 120980G (31 May 2022), 2022
Editore: SPIE
DOI: 10.1117/12.2618736

Phase retrieval from overexposed PSF: a projection-based approach

Autori: Oleg Soloviev, Jacques Noom, Hieu Thao Nguyen, Gleb Vdovin, and Michel Verhaegen
Pubblicato in: Proc. SPIE 11970, Quantitative Phase Imaging VIII, Numero 119700K (2 March 2022), 2022
Editore: SPIE
DOI: 10.1117/12.2609697

Modelling Ion Production inside an Electron Impact Ionizer for High-Vacuum Gas Analysis

Autori: J. Emmelkamp, F.T. Molkenboer, H.H.P.Th. Bekman, J. van den Brink, D.A. Wismeijer, N.B. Koster, D.J. Maas, O. Kievit, H.A. Lensen
Pubblicato in: 2020
Editore: COMSOL AB

Ensemble Machine Learning Algorithms for Anomaly Detection in Multivariate Time-Series

Autori: Youssef Trardi, Bouchra Ananou, Philip Tchatchoua, Mustapha Ouladsine
Pubblicato in: International Conference on Control, Automation and Diagnosis (ICCAD), 2022
Editore: IEEE
DOI: 10.1109/iccad55197.2022.9853995

Multi party privacy preserving machine learning for process control

Autori: Wilfried Verachtert, Tom Ashby, Imen Chakroun, Roel Wuyts, Sayantan Das, Sandip Halder, Philippe Leray
Pubblicato in: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 2021, Pagina/e 42, ISBN 9781510640566
Editore: SPIE
DOI: 10.1117/12.2584893

1D ResNet for Fault Detection and Classification on Sensor Data in Semiconductor Manufacturing

Autori: Philip Tchatchoua, Guillaume Graton, Mustapha Ouladsine, Julien Muller, Abraham Traore, Michel Juge
Pubblicato in: International Conference on Control, Automation and Diagnosis (ICCAD), 2022
Editore: IEEE
DOI: 10.1109/iccad55197.2022.9853997

Semiconductor Multivariate Time-Series Anomaly Classification Based on Machine Learning Ensemble Techniques

Autori: Samia Mellah, Youssef Trardi, Guillaume Graton, Bouchra Ananou, El Mostafa El Adel, Mustapha Ouladsine
Pubblicato in: 2022
Editore: IFAC
DOI: 10.1016/j.ifacol.2022.07.174

Combining Approaches of Brownian Motion and Similarity Principle to Improve the Remaining Useful Life Prediction

Autori: Dima el Jamal, Mohamed Al-Kharaz, Bouchra Ananou, Guillaume Graton, Mustapha Ouladsine, Jacques Pinaton
Pubblicato in: IEEE International Conference on Prognostics and Health Management (ICPHM), 2021
Editore: IEEE
DOI: 10.1109/icphm51084.2021.9486507

A semi-analytical approach for the characterization of ordered 3D nano structures using grazing-incidence X-ray fluorescence

Autori: Nikolaev, K. V.; Soltwisch, V.; Hoenicke, P.; Scholze, F.; de la Rie, J.; Yakunin, S. N.; Makhotkin, I. A.; van de Kruijs, R. W. E.; Bijkerk, F.
Pubblicato in: Journal of Synchrotron Radiation, Numero 27, 2020, Pagina/e 386-395, ISSN 0909-0495
Editore: Blackwell Publishing Inc.
DOI: 10.1107/s1600577519016345

Convex combination of alternating projection and Douglas–Rachford operators for phase retrieval

Autori: Nguyen Hieu Thao, Oleg Soloviev, Michel Verhaegen
Pubblicato in: Advances in Computational Mathematics, Numero 47/3, 2021, ISSN 1019-7168
Editore: Kluwer Academic Publishers
DOI: 10.1007/s10444-021-09861-y

Robust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular Disorders

Autori: Shobha Jose, S. Thomas George, M. S. P. Subathra, Vikram Shenoy Handiru, Poornaselvan Kittu Jeevanandam, Umberto Amato, Easter Selvan Suviseshamuthu
Pubblicato in: IEEE Open Journal of Engineering in Medicine and Biology, Numero 1, 2020, Pagina/e 235-242, ISSN 2644-1276
Editore: IEEE Access
DOI: 10.1109/ojemb.2020.3017130

Study of plasma etching impact on chemoepitaxy directed self-assembly

Autori: Maria Gabriela Gusmão Cachoa), Khatia Benotmane, Aurélie Le Pennec, Charlotte Bouet, Patricia Pimenta-Barros, Guido Rademaker, Maxime Argoud, Raluca Tiron, and Nicolas Possémé
Pubblicato in: Journal of Vacuum Science and Technology A, 2021, ISSN 0734-2101
Editore: American Institute of Physics
DOI: 10.1116/6.0000850

Predictive discarding for sustainable Industry 5.0

Autori: Geert van Kollenburg (TU/e), Mike Holenderski (TU/e), Nirvana Meratnia (TU/e), Daniele Pagano (ST-I), Patrizia Vasquez (ST-I)
Pubblicato in: Research Outreach, Numero 132, 2022, ISSN 2517-7028
Editore: Research Outreach

Phase Retrieval from Overexposed PSF with Projection Methods

Autori: O.A. Soloviev
Pubblicato in: Optics Communications, 2022, ISSN 0030-4018
Editore: Elsevier BV

Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

Autori: S.P. Rosoiu, A.G. Pantazi, A. Petica, A. Cojocaru, S. Costovici, C. Zanella, T. Visan, L. Anicai and M. Enachescu
Pubblicato in: Metals, Numero 20754701, 2020, Pagina/e 1455, ISSN 2075-4701
Editore: MDPI Publishing Services
DOI: 10.3390/met10111455

Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging

Autori: Jacopo Frascaroli (1), Marta Tonini (1), Selene Colombo (1), Luisito Livellara (1), Luca Mariani (1), Paolo Targa (1), Roberto Fumagalli (1), Viktor Samu (2), Máté Nagy (2), Gábor Molnár (2), Áron Horváth (2), Zoltán Bartal (2), Zoltán Kiss (2),Tamás Sipőcz (2), Isabella Mica (1). (1) STMicroelectronics, Agrate Brianza, Italy (2) Semilab Semiconductor Physics Laboratory Company Ltd., B
Pubblicato in: IEEE Transactions on Semiconductor Manufacturing, Numero Volume: 35, Numero: 3, August 2022, 2022, Pagina/e 540 - 545, ISSN 0894-6507
Editore: Institute of Electrical and Electronics Engineers
DOI: 10.1109/tsm.2022.3189847

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Autori: Salvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Giovanni Franco, Patrizia Vasquez, Alessandra Alberti, Antonino La Magna
Pubblicato in: Applied Surface Science, Numero 539, 2021, Pagina/e 148218, ISSN 0169-4332
Editore: Elsevier BV
DOI: 10.1016/j.apsusc.2020.148218

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Autori: Salvatore Sanzaro, Corrado Bongiorno, Paolo Badalà, Anna Bassi, Ioannis Deretzis, Marius Enachescu, Giovanni Franco, Giuseppe Fisicaro, Patrizia Vasquez, Alessandra Alberti, Antonino La Magna
Pubblicato in: Materials, Numero 14/16, 2021, Pagina/e 4769, ISSN 1996-1944
Editore: MDPI Open Access Publishing
DOI: 10.3390/ma14164769

MFIG — A Mass Filtered Ion Gauge

Autori: Herman Bekman , Jurjen Emmelkamp, Youyou Westland, Dorus Elstgeest, Thomas Mechielsen, Michael Haye, Freek Molkenboer, Norbert Koster, Henk Lensen
Pubblicato in: e-Journal of Surface Science and Nanotechnology, 2023, ISSN 1348-0391
Editore: Surface Science Society of Japan
DOI: 10.1380/ejssnt.2023-059

An optical system and image processing tool for predicting PIN malfunctioning in growth Chambers of semiconductors

Autori: U. Amato (CNR), A. Antoniadis (CNR), D.Fazio (ST-I), C. Genua (ST-I), D. Granata (CNR), A. Lamagna (CNR), D. Pagano (ST-I), G. Tochino (ST-I), P. Vasquez (ST-I)
Pubblicato in: Sensors, 2022, ISSN 1424-8220
Editore: Multidisciplinary Digital Publishing Institute (MDPI)

Wavelet-based robust estimation and variable selection in nonparametric additive models

Autori: Umberto Amato, Anestis Antoniadis, Italia De Feis,Irène Gijbels
Pubblicato in: Statistics and Computing, Numero Vol. 32, Numero 11, February 2022, 2022, ISSN 0960-3174
Editore: Kluwer Academic Publishers
DOI: 10.1007/s11222-021-10065-z

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Autori: J. Noom, C. Smith, G. J. Verbiest, A. J. Katan, O. Soloviev and M. Verhaegen
Pubblicato in: IEEE Transactions on Nanotechnology, Numero vol. 22, 2023, Pagina/e 273-279, ISSN 1941-0085
Editore: IEEE
DOI: 10.1109/tnano.2023.3284654

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

Autori: U. Amato (CNR), A. Antoniadis (CNR), A. Doinychko (Mentor), A. Lamagna (CNR), D. Pagano (ST-I), F. Piccinini (ST-I), E. Selvan (CNR), C. Severgnini (ST-I), A. Torres (Mentor), P. Vasquez (ST-I)
Pubblicato in: ASMBI - Applied Stochastic Models in Business and Industry (formerly Applied Stochastic Models and Data Analysis), 2022, ISSN 1524-1904
Editore: John Wiley & Sons Inc.

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Autori: C.C. Moise, L. Rachmani, G.V. Mihai, O.A. Lazar, M. Enachescu, N. Naveh
Pubblicato in: Polymers, Numero 20734360, 2021, Pagina/e 1138, ISSN 2073-4360
Editore: MDPI Publishing Services
DOI: 10.3390/polym13071138

Analysis of Line-Edge Roughness Using EUV Scatterometry

Autori: A. Fernández Herrero, F. Scholze, G. Dai, V. Soltwisch
Pubblicato in: Nanomanufacturing and Metrology, Numero 2520811X, 2022, Pagina/e 149–158, ISSN 2520-811X
Editore: Springer
DOI: 10.1007/s41871-022-00126-w

Flexible, boundary adapted, nonparametric methods for the estimation of univariate piecewise-smooth functions

Autori: Umberto Amato, Anestis Antoniadis, Italia De Feis
Pubblicato in: Statistics Surveys, Numero 14/none, 2020, ISSN 1935-7516
Editore: Institute of Mathematical Statistics
DOI: 10.1214/20-ss128

Penalized wavelet estimation and robust denoising for irregular spaced data

Autori: Umberto Amato, Anestis Antoniadis, Italia De Feis, Irène Gijbels
Pubblicato in: Computational Statistics, Numero Volume 36 Numero 4, December 2021, 2021, ISSN 0943-4062
Editore: Physica-Verlag Gmbh und Co.
DOI: 10.1007/s00180-021-01174-4

PROLIFIC: A Fast and Robust Profile-Likelihood-Based Muscle Onset Detection in Electromyogram Using Discrete Fibonacci Search

Autori: Easter S. Suviseshamuthu, Didier Allexandre, Umberto Amato, Biancamaria Della Vecchia, Guang H. Yu
Pubblicato in: IEEE Access, Numero 8, 2020, Pagina/e 105362-105375, ISSN 2169-3536
Editore: Institute of Electrical and Electronics Engineers Inc.
DOI: 10.1109/access.2020.3000693

Penalised robust estimators for sparse and high-dimensional linear models

Autori: Umberto Amato, Anestis Antoniadis, Italia De Feis, Irene Gijbels
Pubblicato in: Statistical Methods & Applications, Numero 30/1, 2021, Pagina/e 1-48, ISSN 1618-2510
Editore: Springer Verlag
DOI: 10.1007/s10260-020-00511-z

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

Autori: Maria Gabriela Gusmão Cacho, Khatia Benotmane, Patricia Pimenta-Barros, Charlotte Bouet, Guido Rademaker, Maxime Argoud, Christophe Navarro, Raluca Tiron, and Nicolas Possémé
Pubblicato in: Journal of Vacuum Science & Technology B, 2021, ISSN 2166-2746
Editore: AIP
DOI: 10.1116/6.0001102

Surface Topography of Si/TiO2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation

Autori: C.C. Moise, A. Pantazi, G.V. Mihai, A. Jderu, M. Bercu, A.A. Messina, M. Enachescu
Pubblicato in: Coatings, Numero 20796412, 2021, Pagina/e 1350, ISSN 2079-6412
Editore: MDPI Publishing Services
DOI: 10.3390/coatings11111350

Projection methods for high numerical aperture phase retrieval

Autori: Nguyen Hieu Thao, Oleg Soloviev, Russell Luke, Michel Verhaegen
Pubblicato in: Inverse Problems, Numero 37, 125005, 2021, ISSN 0266-5611
Editore: Institute of Physics Publishing
DOI: 10.1088/1361-6420/ac3322

Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures

Autori: P. Hönicke, Y. Kayser, K.V. Nikolaev, V. Soltwisch, J.E. Scheerder, C. Fleischmann, T. Siefke, A. Andrle, G. Gwalt, F. Siewert, J. Davis, M. Huth, A. Veloso, R. Loo, D. Skroblin, M. Steinert, A. Undisz, M. Rettenmayr, B. Beckhoff
Pubblicato in: Small, Numero 16136810, 2021, Pagina/e 2105776, ISSN 1613-6810
Editore: Wiley - V C H Verlag GmbbH & Co.
DOI: 10.1002/smll.202105776

Grazing incidence-X-ray fluorescence for a dimensional and elemental characterization of well-ordered nanostructures

Autori: Hönicke, Philipp; Andrle, Anna; Kayser, Yves; Nikolaev, Konstantin V.; Probst, Jürgen; Scholze, Frank; Soltwisch, Victor; Weimann, Thomas; Beckhoff, Burkhard
Pubblicato in: Nanotechnology, Numero 31, 2020, Pagina/e 505709, ISSN 0957-4484
Editore: Institute of Physics Publishing
DOI: 10.1088/1361-6528/abb557

Uncertainties in the reconstruction of nanostructures in {EUV} scatterometry and grazing incidence small-angle X-ray scattering

Autori: A. Fernández Herrero, M. Pflüger, J. Puls, F. Scholze, V. Soltwisch
Pubblicato in: Optics Express, Numero 10944087, 2021, Pagina/e 35580-35591, ISSN 1094-4087
Editore: Optical Society of America
DOI: 10.1364/oe.430416

Shape- and Element-Sensitive Reconstruction of Periodic Nanostructures with Grazing Incidence X-ray Fluorescence Analysis and Machine Learning.

Autori: Anna Andrle; Philipp Hönicke; Grzegorz Gwalt; Philipp-Immanuel Schneider; Yves Kayser; Frank Siewert; Victor Soltwisch
Pubblicato in: Nanomaterials, Numero 20794991, 2021, Pagina/e 1647, ISSN 2079-4991
Editore: MPDI
DOI: 10.48550/arxiv.2102.06600

Diritti di proprietà intellettuale

APPARATUS AND METHOD FOR DEFECT DETECTION IN WORK PIECES

Numero candidatura/pubblicazione: 21 190120
Data: 2015-12-04
Candidato/i: ICOS VISION SYSTEMS NV

APPARATUS, METHOD AND COMPUTER PROGRAM PRODUCT FOR DEFECT DETECTION IN WORK PIECES

Numero candidatura/pubblicazione: 15 865251
Data: 2015-12-04
Candidato/i: ICOS VISION SYSTEMS NV

COMBINED TRANSMITTED AND REFLECTED LIGHT IMAGING OF INTERNAL CRACKS IN SEMICONDUCTOR DEVICES

Numero candidatura/pubblicazione: 20 843595
Data: 2020-07-20
Candidato/i: ICOS VISION SYSTEMS NV

SYSTEM AND METHOD FOR INSPECTION AND METROLOGY OF FOUR SIDES OF SEMICONDUCTOR DEVICES

Numero candidatura/pubblicazione: 20 21057485
Data: 2021-11-01
Candidato/i: ICOS VISION SYSTEMS NV

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