The project necessitated a transition from 3D confined colloidal nanoparticles suspended in solution, on which the foundations for this project were demonstrated, to thin films (stage 1). We have successfully completed this step and transitioned to nanoantennas that are produced via electron beam lithography on a silicon substrate. Fundamental explorations of the underlying physical phenomena are still in progress. The proposed project included two research avenues set to run independently: (a) construction of a prototype that demonstrates dynamic writing capabilities, and (b) development of a plasmon-enhanced photocatalytic mask for genuine CMOS compatible nano - photolithography. Due to COVID-related limited recruitment and the slow start of the research, we elected to focus exclusively on the latter, which, embodies the ultimate goal of the project. We successfully produced the first and second generation of plasmonic nanoantennas with various designs, following simulations of field enhancement. We explored different catalytic reactions and conditions in order to better understand the effects of these parameters on the reaction pathway, and underline the mechanism. Understanding the mechanism is vital for the proper design and optimization of our mask. In addition, we started working towards the implementation of robust high-throughput characterization tools.