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Plasmon Enhanced Photocatalytic Nano Lithography

Periodic Reporting for period 2 - NanoGraphy (Plasmon Enhanced Photocatalytic Nano Lithography)

Periodo di rendicontazione: 2021-07-01 al 2022-12-31

The emergence of nanoscience and nanotechnology, with envisioned applications spanning from nano-optics and nano-photonics, to plasmonics and nano-electronics, depends on the capability to fabricate a variety of nanometre-scale structures. Despite the impressive development in these fields, breakthroughs remain in the laboratory, largely due to technological limitations in the ability to manufacture complex and accurate nanometer-resolved surface patterns, with satisfying resolution and on a large area. The development of a new fabrication methodology is thus required. We are developing a novel technique for nanoscale photolithography that would bring 21st-century nanotechnology breakthroughs out of the lab and into the public sphere. The inspiration for this technique originates in our discovery that multi-electron photocatalytic reactions could be directed to progress exclusively under a plasmonic field. In the course of this project, we leverage this phenomenon for pattering and high-resolution nanolithography. We employ plasmon-enhanced optical phenomena for promoting a specific set of photocatalytic reactions in a controlled and highly confined manner, in order to enable nanoscale patterning.
The project necessitated a transition from 3D confined colloidal nanoparticles suspended in solution, on which the foundations for this project were demonstrated, to thin films (stage 1). We have successfully completed this step and transitioned to nanoantennas that are produced via electron beam lithography on a silicon substrate. Fundamental explorations of the underlying physical phenomena are still in progress. The proposed project included two research avenues set to run independently: (a) construction of a prototype that demonstrates dynamic writing capabilities, and (b) development of a plasmon-enhanced photocatalytic mask for genuine CMOS compatible nano - photolithography. Due to COVID-related limited recruitment and the slow start of the research, we elected to focus exclusively on the latter, which, embodies the ultimate goal of the project. We successfully produced the first and second generation of plasmonic nanoantennas with various designs, following simulations of field enhancement. We explored different catalytic reactions and conditions in order to better understand the effects of these parameters on the reaction pathway, and underline the mechanism. Understanding the mechanism is vital for the proper design and optimization of our mask. In addition, we started working towards the implementation of robust high-throughput characterization tools.
At the end of the 5-year project, we expect to be in a position to demonstrate our platform for lithographic writing of an interesting nanopattern of high quality and establish the potential of this methodology as a powerful instrument in the nanotechnology researcher’s toolbox. We trust that the successful implementation of this project would fundamentally change the way in which nanotechnology affects modern life.
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