The project required a transition from three-dimensionally confined colloidal nanoparticles suspended in solution, on which the initial proof-of-concept was demonstrated, to thin films (Stage 1). We successfully completed this transition and moved to fabricating nanostructures via electron beam lithography on silicon substrates. This was followed by fundamental investigations into the underlying physical phenomena (stage 2). The original project proposal outlined two parallel research paths: a) the construction of a prototype demonstrating dynamic writing capabilities, and b) the development of a photocatalytic mask enabling true CMOS-compatible nano-photolithography. Due to recruitment limitations during the COVID-19 pandemic and a delayed research start, we chose to focus exclusively on the latter path, which represents the project's ultimate objective. We successfully fabricated first- and second-generation antennas in a variety of designs, guided by simulations of field enhancement. We investigated different catalytic reactions and operating conditions to better understand their impact on reaction pathways and to elucidate the underlying mechanism — an essential step for effective mask design and optimization. In parallel, we initiated the development of robust, high-throughput characterization tools. Despite the project’s premature termination due to personal considerations of the principal investigator, we achieved a major milestone: demonstrating the technique’s ability to pattern ordered arrays of resist dots on a silicon wafer, using visible light in ambient air.
