Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Informazioni relative al progetto

Nanolace

ID dell’accordo di sovvenzione: 863127

DOI

10.3030/863127

Progetto chiuso

Data della firma CE 24 Settembre 2019

Data di avvio 1 Gennaio 2020

Data di completamento 31 Dicembre 2024

Finanziato da

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Costo totale

€ 3 642 284,24

Contributo UE

€ 3 356 511,75

Coordinato da

UNIVERSITETET I BERGEN
Norway

Periodic Reporting for period 4 - Nanolace (Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution)

Periodo di rendicontazione: 2023-09-01 al 2024-12-31

Sintesi del contesto e degli obiettivi generali del progetto

Problem/issue being addressed:

Lithography refers to the transfer of a pattern onto a substrate. Lithography techniques are used in the production of a huge range of devices and materials ranging from microelectronics and MEMS devices to optical metamaterials and smart surfaces for medical and other applications. The ultimate goal and limit of lithography is to obtain fast and large scale patterning which enables the controlled positioning of individual molecules or atoms. This requires fast, large scale single nm resolution patterning. At the moment no techniques are available that can do that. Fast positioning of individual molecules or atoms over large areas can path the way for the creation and industrial application of whole new classes of materials and devices including room temperature quantum electronic devices, electronic metamaterials as well as nano filtration membranes and can push the performance of todays microelectronics. The highest resolution fast, large scale lithography technique today is photolithography where a photon beam is projected through a mask, so that the pattern from the mask is replicated by direct imaging on a substrate coated with resist. Next generation Extreme UltraViolet (EUV) lithography uses 92 eV photons and is targeted to deliver 8 nm resolution. The EUV ultimate limit, determined by the secondary electron generation blur, is estimated to be around 6 nm, which does not enable single nm resolution patterning. Further reductions in the photolithography resolution of the patterning would increase the photon energy, exacerbating the secondary blur.

Why is it important for society?

i) industrial scale production of quantum electronic and spintronics devices, where operation at room temperature requires that two or all of the device dimensions are less than 5 nm;
ii) making electron meta-materials, a whole new class of materials that are the electronic counterpart to optical meta-materials;
iii) producing nanomembranes with holes in the range 1-10 nm, to be used for example for nanofiltration;
iv) addressing the ongoing miniaturisation need of today’s microelectronic;

Overall objectives:

The aim of the Nanolace project is to demonstrate mask-based lithography with 1 nm resolution in two different ways using atom beam based technology.

Conclusion: The targed lithography aims could not be achieved. Progress was made in the manipulation of bose einstein condensates, development of novel resist formulations and the theory for generating holographic masks could be extended. In addition novel laser techniques were pursued which are finding applications also in other areas of quantum technology.

Lavoro eseguito dall’inizio del progetto fino alla fine del periodo coperto dalla relazione e principali risultati finora ottenuti

At the end of the project progress has been made on the design and construction of the two lithography instruments. First demonstration of focussing of a bose einstein condensate could be demonstrate. In this context the development of novel laser techniques were pursued which are finding applications in other areas of quantum technology. First solid state masks were produced with a pitch of 50 nm and a hole size of 25 nm. Novel resist formulation for metastabele helium atoms and helium ion lithography were developed. The theory for generating holographic masks could be extended.

Progressi oltre lo stato dell’arte e potenziale impatto previsto (incluso l’impatto socioeconomico e le implicazioni sociali più ampie del progetto fino ad ora)

Progress beyond the state of the art until the end of the project:

The project progressed beyond the state of the art in the manipulation of bose einstein condensates, the development of novel resist formulations, laser technology and theory of holographic pattern generation.


Potential impact including socio-economic impact:

The aim of nanolace was to make it possible to do industrial scale production of devices, where two or all of the device dimensions are less than 5 nm;
and producing nanomembranes with holes in the range 1-10 nm. During the past ten to fifteen years the EU has taken a leadership role in both research and commercial
development of lithography. EU lithography tool vendor ASML is the world leader for commercial tools. Innovative new lithography technologies from EU companies, such as multiple electron beam lithography and thermal scanning probe lithography
amongst others, together with the high investment of the EU commission to support research projects in this field, demonstrate the strong interest of the EU in this topic. Nanolace breakthroughs will strengthen the leading position of Europe in the lithography industry, supporting EU policies on EU competitiveness and innovation.


The increase in the capability of computer processors and their improved power performance and efficiency thanks to the introduction of quantum electronic devices will ultimately simplify or enhance consumers’ lives, who are increasingly connected to information at all times, and remove one of the biggest obstacles holding back the Internet of Things and wearable computing, namely: poor battery performance. Moreover, the miniaturisation of electronic devices thanks to Nanolace will satisfy consumer’s increasing demand of smart, small and light wearable devices. The application of Nanolace for the production of nanomembranes for energy efficient de-salination has the potential of a huge societal impact. The UN Sustainable development goal calls for universal access to drinking water. According to the International Water Organisation around 1% of the world’s drinking water is currently
provided by desalination. Desalination is a particularly attractive mean for providing water in the long term, because over 50% of the world population lives in urban centres bordering the ocean and, in many parts, including
Northern Africa the population concentration along the coast exceeds 75%.

While the nanolace goals could not be achieved in the framework of this project the perspectives remain important.

SEM micrograph of 2-micron square regions containing a square array of 50 nm period holes