Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Informazioni relative al progetto

Nanolace

ID dell’accordo di sovvenzione: 863127

DOI 10.3030/863127

Data della firma CE 24 Settembre 2019

Data di avvio 1 Gennaio 2020

Data di completamento 31 Dicembre 2024

Finanziato da

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Costo totale € 3 642 284,24

Contributo UE € 3 356 511,75

Coordinato da

UNIVERSITETET I BERGEN
Norway

Risultati finali

Demonstrators, pilots, prototypes (3)

He* prototype resist

Synthesis of He* prototype resist to be supplied to WP5

Helium Ion Beam Resist

Synthesis of Helium Ion Beam Resist

Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Websites, patent fillings, videos etc. (1)

Website online and logo created

Public website available online and logo of the project created

Open Research Data Pilot (1)

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Pubblicazioni

Peer reviewed articles (2)

Realistic mask generation for matter-wave lithography via machine learning

Autori: Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Pubblicato in: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Editore: IOP Publishing
DOI: 10.1088/2632-2153/acd988

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Autori: Johannes Fiedler; Bodil Holst
Pubblicato in: Journal of Physics B: Atomic, Molecular and Optical Physics, Numero 00223700, 2022, ISSN 0022-3700
Editore: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41