SILICON WAFER FOR AN ELECTRONIC COMPONENT AND METHOD FOR THE PRODUCTION THEREOF
Numéro de demande/publication:
17
717389
Date:
2017-04-11
Demandeur(s):
NEXWAFE GMBH
METHOD AND CARRIER ELEMENT FOR PRODUCING A WAFER LAYER
Numéro de demande/publication:
20
20079032
Date:
2020-10-15
Demandeur(s):
NEXWAFE GMBH
PROCESS CHAMBER GUIDE, PROCESS CHAMBER, AND METHOD FOR GUIDING A SUBSTRATE CARRIER IN A PROCESS POSITION
Numéro de demande/publication:
18
712202
Date:
2018-03-19
Demandeur(s):
NEXWAFE GMBH
APPARATUS AND METHOD FOR ETCHING ONE SIDE OF A SEMICONDUCTOR SUBSTRATE
Numéro de demande/publication:
16
819015
Date:
2016-12-08
Demandeur(s):
NEXWAFE GMBH
PROCESS AND APPARATUS FOR REMOVAL OF IMPURITIES FROM CHLOROSILANES
Numéro de demande/publication:
18
792913
Date:
2018-10-19
Demandeur(s):
NEXWAFE GMBH
METHOD AND DEVICE FOR PRODUCING A SEMICONDUCTOR LAYER
Numéro de demande/publication:
17
717389
Date:
2016-09-27
Demandeur(s):
NEXWAFE GMBH
APPARATUS AND METHOD FOR ETCHING ONE SIDE OF A SEMICONDUCTOR LAYER OF A WORKPIECE
Numéro de demande/publication:
19
723738
Date:
2019-05-06
Demandeur(s):
NEXWAFE GMBH
METHOD AND APPARATUS FOR THE CONTINUOUS VAPOR DEPOSITION OF SILICON ON SUBSTRATES
Numéro de demande/publication:
18
793404
Date:
2018-10-25
Demandeur(s):
NEXWAFE GMBH
METHOD FOR ARRANGING A PLURALITY OF SEED SUBSTRATES ON A CARRIER ELEMENT AND CARRIER ELEMENT HAVING SEED SUBSTRATES
Numéro de demande/publication:
17
761219
Date:
2017-08-24
Demandeur(s):
NEXWAFE GMBH