Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

Informazioni relative al progetto

OPTIMAL

ID dell’accordo di sovvenzione: 101057029

DOI

10.3030/101057029

Data della firma CE 24 Maggio 2022

Data di avvio 1 Ottobre 2022

Data di completamento 31 Marzo 2027

Finanziato da

• Digital, Industry and Space

Costo totale

€ 5 616 876,00

Contributo UE

€ 5 616 875,00

Coordinato da

JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
Austria

CORDIS fornisce collegamenti ai risultati finali pubblici e alle pubblicazioni dei progetti ORIZZONTE.

I link ai risultati e alle pubblicazioni dei progetti del 7° PQ, così come i link ad alcuni tipi di risultati specifici come dataset e software, sono recuperati dinamicamente da .OpenAIRE .

Risultati finali

Documents, reports (4)

Lithographic patterning properties

Properties of lithographic patterning for a positive & a negative tone resist series to generate binary (2D), grayscale 2.5D and 3D patterns by using 1) a mask aligner process, 2) one photon laser & a two/ multi photon process and 3) interference lithography process, Summary of chemical, optical, mechanical, and thermal properties of resist patterns.

Updated plan for Dissemination and Communication

The updated Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Plan for Dissemination and Communication

The Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Environmental impacts of photoresist material

Report describing the environmental impacts of the photoresist materials using the methodology LCA.

Pubblicazioni

Conference proceedings (3)

Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

Autori: Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Pubblicato in: Proceedings Volume 12497, Novel Patterning Technologies, Numero Volume 12497, 2023
Editore: SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)
DOI: 10.1117/12.2661526

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Autori: Christine Schuster, Marina Heinrich, Anja Voigt, Andy Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Gruetzner
Pubblicato in: Novel Patterning Technologies 2024, 2024
Editore: SPIE
DOI: 10.1117/12.3010852

Design and fabrication of hierarchical microstructures for advanced optical applications

Autori: Daniel Mrena, Daniel Jandura, Matej Goraus, Dušan Pudiš, Christine Schuster, Anja Voigt, David Kuhness, Christine Prietl, Ladislav Kuna, Markus Postl
Pubblicato in: Holography: Advances and Modern Trends IX, 2025
Editore: SPIE
DOI: 10.1117/12.3056720

Peer reviewed articles (2)

Data-driven optimization of maskless grayscale laser lithography

Autori: Adrian H. A. Lutey, David Kuhness, Seyyedhossein Mckee, Vincenzo Ferraro, Marco Negozio, Walter Belardi, Luca Romoli, Markus Postl, Barbara Stadlober
Pubblicato in: Scientific Reports, Numero 15, 2025, ISSN 2045-2322
Editore: Springer Science and Business Media LLC
DOI: 10.1038/S41598-025-24652-X

Combining laser interference lithography and direct write lithography for hierarchical structures fabrication

Autori: D. Mrena, D. Pudis, M. Goraus, Ch. Schuster, A. Voigt, D. Kuhness, Ch. Prietl, L. Kuna, M. Postl
Pubblicato in: 2024 15th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM), 2025, ISSN 2474-9737
Editore: IEEE
DOI: 10.1109/ASDAM63148.2024.10844637