Publications
Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist
Author(s):
Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Published in:
Proceedings Volume 12497, Novel Patterning Technologies, Issue Volume 12497, 2023
Publisher:
SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)
DOI:
10.1117/12.2661526
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