Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

Project Information

OPTIMAL

Grant agreement ID: 101057029

DOI

10.3030/101057029

EC signature date 24 May 2022

Start date 1 October 2022

End date 30 September 2026

Funded under

• Digital, Industry and Space

Total cost

€ 5 616 876,00

EU contribution

€ 5 616 875,00

Coordinated by

JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
Austria

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Deliverables

Documents, reports (2)

Lithographic patterning properties

Properties of lithographic patterning for a positive & a negative tone resist series to generate binary (2D), grayscale 2.5D and 3D patterns by using 1) a mask aligner process, 2) one photon laser & a two/ multi photon process and 3) interference lithography process, Summary of chemical, optical, mechanical, and thermal properties of resist patterns.

Plan for Dissemination and Communication

The Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Publications

Conference proceedings (3)

Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

Author(s): Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Published in: Proceedings Volume 12497, Novel Patterning Technologies, Issue Volume 12497, 2023
Publisher: SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)
DOI: 10.1117/12.2661526

Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns

Author(s): Christine Schuster, Marina Heinrich, Anja Voigt, Andy Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Gruetzner
Published in: Novel Patterning Technologies 2024, 2024
Publisher: SPIE
DOI: 10.1117/12.3010852

Design and fabrication of hierarchical microstructures for advanced optical applications

Author(s): Daniel Mrena, Daniel Jandura, Matej Goraus, Dušan Pudiš, Christine Schuster, Anja Voigt, David Kuhness, Christine Prietl, Ladislav Kuna, Markus Postl
Published in: Holography: Advances and Modern Trends IX, 2025
Publisher: SPIE
DOI: 10.1117/12.3056720

Peer reviewed articles (2)

Data-driven optimization of maskless grayscale laser lithography

Author(s): Adrian H. A. Lutey, David Kuhness, Seyyedhossein Mckee, Vincenzo Ferraro, Marco Negozio, Walter Belardi, Luca Romoli, Markus Postl, Barbara Stadlober
Published in: Scientific Reports, Issue 15, 2025, ISSN 2045-2322
Publisher: Springer Science and Business Media LLC
DOI: 10.1038/S41598-025-24652-X

Combining laser interference lithography and direct write lithography for hierarchical structures fabrication

Author(s): D. Mrena, D. Pudis, M. Goraus, Ch. Schuster, A. Voigt, D. Kuhness, Ch. Prietl, L. Kuna, M. Postl
Published in: 2024 15th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM), 2025, ISSN 2474-9737
Publisher: IEEE
DOI: 10.1109/ASDAM63148.2024.10844637