Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

Rezultaty

Properties of lithographic patterning for a positive & a negative tone resist series to generate binary (2D), grayscale 2.5D and 3D patterns by using 1) a mask aligner process, 2) one photon laser & a two/ multi photon process and 3) interference lithography process, Summary of chemical, optical, mechanical, and thermal properties of resist patterns.

Plan for Dissemination and Communication

The Plan for Dissemination and Communication is a working document where the dissemination strategy and tools to be used during the life of the project are described.

Publikacje

Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

Autorzy: Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Opublikowane w: Proceedings Volume 12497, Novel Patterning Technologies, Numer Volume 12497, 2023
Wydawca: SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)
DOI: 10.1117/12.2661526

Rezultaty

Publikacje

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