CORDIS provides links to public deliverables and publications of HORIZON projects.
Links to deliverables and publications from FP7 projects, as well as links to some specific result types such as dataset and software, are dynamically retrieved from OpenAIRE .
Publications
Author(s):
Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, Issue 2017, 2017, Page(s) 101430D
Publisher:
SPIE
DOI:
10.1117/12.2258025
Author(s):
Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber, Iacopo Mochi, Roberto Fallica, Zuhal Tasdemir, Yasin Ekinci
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, Issue 2017, 2017, Page(s) 101430T
Publisher:
SPIE
DOI:
10.1117/12.2260153
Author(s):
Roderik van Es, Mark van de Kerkhof, Leon Levasier, Rudy Peeters, Hans Jasper
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, Issue 2017, 2017, Page(s) 2, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2281184
Author(s):
Mark A. van de Kerkhof, Arthur W. E. Minnaert, Marco Pieters, Hans Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier
Published in:
Extreme Ultraviolet (EUV) Lithography IX, Issue 2018, 2018, Page(s) 13, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2299503
Author(s):
Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura
Published in:
Extreme Ultraviolet (EUV) Lithography VIII, Issue 2017, 2017, Page(s) 101430G
Publisher:
SPIE
DOI:
10.1117/12.2261079
Author(s):
Eelco van Setten, Gerardo Bottiglieri, Laurens de Winter, Jan Lubkoll, John McNamara, Paul Rusu, Gijsbert Rispens, Jan van Schoot, Jens Timo Neumann, Matthias Roesch, Bernhard Kneer
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, Issue 2017, 2017, Page(s) 32, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2280624
Author(s):
Eelco van Setten, Gerardo Bottiglieri, John McNamara, Jan van Schoot, Kars Troost, Joseph Zekry, Timon Fliervoet, Stephen Hsu, Joerg Zimmermann, Matthias Roesch, Bartosz Bilski, Paul Graeupner
Published in:
Extreme Ultraviolet (EUV) Lithography X, Issue 2019, 2019, Page(s) 5, ISBN 9781-510625624
Publisher:
SPIE
DOI:
10.1117/12.2514952
Author(s):
Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura
Published in:
Extreme Ultraviolet (EUV) Lithography IX, Issue 2018, 2018, Page(s) 23, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2295800
Author(s):
Mark A. van de Kerkhof, Uwe Zeitner, Torsten Feigl, Stefan Bäumer, Robbert Jan Voogd, Ad Schasfoort, Evert Westerhuis, Wouter Engelen, Manfred Dikkers, Yassin Chowdhury, Michael D. Kriese
Published in:
Extreme Ultraviolet (EUV) Lithography IX, Issue 2018, 2018, Page(s) 24, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2297433
Author(s):
Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos P. Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Winfried Kaiser, Tilmann Heil, Sascha Migura, Peter Kuerz, Jens Timo Neumann
Published in:
International Conference on Extreme Ultraviolet Lithography 2017, Issue 2017, 2017, Page(s) 30, ISBN 9781-510613751
Publisher:
SPIE
DOI:
10.1117/12.2280592
Author(s):
Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Hans Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Erik Loopstra, Bernhard Kneer, Sascha Migura
Published in:
International Conference on Extreme Ultraviolet Lithography 2018, Issue 2018, 2018, Page(s) 33, ISBN 9781-510622142
Publisher:
SPIE
DOI:
10.1117/12.2502894
Author(s):
Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, Joerg Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser
Published in:
Extreme Ultraviolet (EUV) Lithography X, Issue 2019, 2019, Page(s) 3, ISBN 9781-510625624
Publisher:
SPIE
DOI:
10.1117/12.2515205
Author(s):
Eelco van Setten, John McNamara, Jan van Schoot, Gerardo Bottiglieri, Kars Troost, Timon Fliervoet, Stephen Hsu, Jörg Zimmermann, Jens-Timo Neumann, Matthias Rösch, Paul Graeupner
Published in:
International Conference on Extreme Ultraviolet Lithography 2018, Issue 2018, 2018, Page(s) 34, ISBN 9781-510622142
Publisher:
SPIE
DOI:
10.1117/12.2502149
Author(s):
Aurelie Juncker, William Clark, Benjamin Vincent, Joern-Holger Franke, Sandip Halder, Frederic Lazzarino, Gayle Murdoch
Published in:
Extreme Ultraviolet (EUV) Lithography IX, 2018, Page(s) 29, ISBN 9781-510616592
Publisher:
SPIE
DOI:
10.1117/12.2298761
Author(s):
Sylvain Baudot, Assawer Soussou, Alexey P. Milenin, Toby Hopf, Shouhua Wang, Pieter Wecks, Benjamin Vincent, Joseph Ervin, Steven Demuynck
Published in:
Advances in Patterning Materials and Processes XXXVI, 2019, Page(s) 22, ISBN 9781-510625686
Publisher:
SPIE
DOI:
10.1117/12.2514927
Author(s):
Mohamed Saib, Alain Moussa, Anne-Laure Charley, Philippe Leray, Joey Hung, Roy Koret, Igor Turovets, Avron Ger, Shaoren Deng, Andrea Illiberi, Jan Willem Maes, Gabriel Woodworth, Michael Strauss
Published in:
Metrology, Inspection, and Process Control for Microlithography XXXIII, 2019, Page(s) 57, ISBN 9781-510625662
Publisher:
SPIE
DOI:
10.1117/12.2515177
Author(s):
Tal Itzkovich; Aner Avakrat; Shimon Levi; Omri Baum; Noam Amit; Kevin Houchens
Published in:
SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591S (7 May 2019), Issue 2019, 2019
Publisher:
SPIE
Author(s):
S. Guissi, W. F. Clark, A. Junker, J. Ervin, K. Greiner, D. Fried, B. Briggs, K. Devriendt, F. Sebaai, A. Charley, C. J. Wilson, J. Boemmels, Z. Tőkei
Published in:
Proceedings of IEEE IITC INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2017
Publisher:
IEEE
Author(s):
Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, Jos Benschop
Published in:
Journal of Micro/Nanolithography, MEMS, and MOEMS, Issue 16/04, 2017, Page(s) 1, ISSN 1932-5150
Publisher:
S P I E - International Society for Optical Engineering
DOI:
10.1117/1.jmm.16.4.041001
Author(s):
Sascha Migura, Winfried Kaiser, Jens Timo Neumann, Hartmut Enkisch, and Dirk Hellweg
Published in:
Chapter 5: Optics for EUVL, 2018, Page(s) 225-333, ISBN 9781-510616783
Publisher:
SPIE Publications
DOI:
10.1117/3.2305675
Intellectual Property Rights
Application/Publication number:
WO
2018219569 A1
Date:
2018-05-01
Applicant(s):
ASML NETHERLANDS B.V.
Application/Publication number:
DE
DE102018214223A1
Date:
2018-08-23
Applicant(s):
CARL ZEISS SMT GMBH
Application/Publication number:
DE
102018211015A1
Date:
2018-07-04
Applicant(s):
CARL ZEISS SMT GMBH
Application/Publication number:
WO
2018188859 A1
Date:
2018-03-08
Applicant(s):
ASML NETHERLANDS B.V.
Application/Publication number:
DE
102018212195A1
Date:
2018-07-23
Applicant(s):
CARL ZEISS SMT GMBH
Application/Publication number:
WO
2018091189 A2
Date:
2017-02-10
Applicant(s):
ASML NETHERLANDS B.V.
Application/Publication number:
WO
2018041599 A1
Date:
2017-08-11
Applicant(s):
ASML NETHERLANDS B.V.
Application/Publication number:
WO
2017025374
Date:
2016-08-01
Applicant(s):
CARL ZEISS SMT GMBH
Application/Publication number:
US
9726624
Date:
2017-08-08
Applicant(s):
BRUKER TECHNOLOGIES LTD
Application/Publication number:
WO
2019001922 A1
Date:
2018-06-07
Applicant(s):
ASML NETHERLANDS B.V.
Application/Publication number:
PCT
IL2016/051350
Date:
2016-12-15
Applicant(s):
NOVA LTD
Application/Publication number:
US
9551677
Date:
2017-01-24
Applicant(s):
BRUKER TECHNOLOGIES LTD
Application/Publication number:
DE
102018207384A1
Date:
2018-05-14
Applicant(s):
CARL ZEISS SMT GMBH
Searching for OpenAIRE data...
There was an error trying to search data from OpenAIRE
No results available