Zero damage Ultra-Low-K etch using the precursor CONDensation technique

Project Information

ULKCOND

Grant agreement ID: 708106

DOI

10.3030/708106

Project closed

EC signature date 11 March 2016

Start date 1 April 2016

End date 31 March 2018

Funded under

• EXCELLENT SCIENCE - Marie Skłodowska-Curie Actions

Total cost

€ 160 800,00

EU contribution

€ 160 800,00

Coordinated by

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
Belgium

CORDIS provides links to public deliverables and publications of HORIZON projects.

Links to deliverables and publications from FP7 projects, as well as links to some specific result types such as dataset and software, are dynamically retrieved from OpenAIRE .

Publications

Conference proceedings (7)

Low damage ULK etching by means of high boiling point organic condensation

Author(s): R. Chanson, N. Holtzer, P. Lefaucheux, R. Dussart, P. Shen, K. Urabe, C. Dussarat, K. Maekawa, K. Yatsuda, S. Tahara and J.-F. de Marneffe
Published in: 2017
Publisher: MRS

Cryo-etching: fundamental mechanisms

Author(s): R. CHANSON, S. Tahara, K. Sasa, C. Dussarat, R. Dussart, T. Thillocher, P. Lefaucheux, J-F demarneff
Published in: 2017
Publisher: PTW

Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)

Author(s): Romain Chanson, Philippe Lefaucheux, Remi Dussart, Tillocher Thomas, Peng Shen, Keiichiro Urabe, Christian Dussarat, Kaoru Maekawa, Koichi Yatsuda, Shigeru Tahara, Jean-Francois de Marneffe
Published in: 2017
Publisher: iPlasmaNano-VIII

Cryo-etching for low-k integration : Phenomenon screening from condensation to damages propagation a 0 damage process is reached

Author(s): R. Chanson, J-F. De Marneffe, R. Dussart, T. Thomas, L. Philippe
Published in: 2016
Publisher: PESM

Option for low damage processing during FSAV : GPPS and alternative plug

Author(s): R. Chanson, J.F. de Marneffe, K. Babaei Gavan, F. Lazzarino, T. Yamaguchi, K. Yatsuda
Published in: 2017
Publisher: PTW

Comparison of C4F8 and Higher boiling point organic for low-k cryo-etching

Author(s): F.Leroy, N. Brochu, R. Chanson, R.Dussart, T. Tillocher, J.‑F. de Marneffe, L Zhang, K. Maekawa, K. Yatsuda, S. Tahara, C. Dussarrat
Published in: 2016
Publisher: PESM

Low-k cryo-etching : Comparison of four different High Boiling Point Organic (HBPO)

Author(s): R. CHANSON, S. Tahara, K. Sasa, C. Dussarrat, R. Dussart, T. Tillocher, P. Lefaucheux, J-F de marneffe
Published in: 2017
Publisher: AVS