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Technology Advances and Key Enablers for Module Integration for 5 nm

Pubblicazioni

Electrostatically actuated probes for Scanning Sub-surface Ultrasonic Resonance Frequency Microscopy

Autori: Maarten. H. van Es, Martijn van Riel, Tom Duivenvoorde, Hamed Sadeghian
Pubblicato in: 3rd ERP 3D Nanomanufacturing Dissemination Event Proceedings, Numero 06-11-2017, 2017
Editore: TNO

Frequency Modulation Subsurface Ultrasonic Force Microscopy

Autori: Maarten. H. van Es, Hamed Sadeghian
Pubblicato in: 3rd ERP 3D Nanomanufacturing Dissemination Event Proceedings, Numero 06-11-2017, 2017
Editore: TNO

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Autori: Mark A. van de Kerkhof, Arthur W. E. Minnaert, Marco Pieters, Hans Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier
Pubblicato in: Extreme Ultraviolet (EUV) Lithography IX, Numero 2018, 2018, Pagina/e 13, ISBN 9781-510616592
Editore: SPIE
DOI: 10.1117/12.2299503

The future of EUV lithography: continuing Moore's Law into the next decade

Autori: Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura
Pubblicato in: Extreme Ultraviolet (EUV) Lithography IX, Numero 2018, 2018, Pagina/e 23, ISBN 9781-510616592
Editore: SPIE
DOI: 10.1117/12.2295800

EUV lithography industrialization progress

Autori: Roderik van Es, Mark van de Kerkhof, Leon Levasier, Rudy Peeters, Hans Jasper
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2017, Numero 2017, 2017, Pagina/e 2, ISBN 9781-510613751
Editore: SPIE
DOI: 10.1117/12.2281184

High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)

Autori: Eelco van Setten, John McNamara, Jan van Schoot, Gerardo Bottiglieri, Kars Troost, Timon Fliervoet, Stephen Hsu, Jörg Zimmermann, Jens-Timo Neumann, Matthias Rösch, Paul Graeupner
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2018, Numero 2018, 2018, Pagina/e 34, ISBN 9781-510622142
Editore: SPIE
DOI: 10.1117/12.2502149

High NA EUV lithography: Next step in EUV imaging

Autori: Eelco van Setten, Gerardo Bottiglieri, John McNamara, Jan van Schoot, Kars Troost, Joseph Zekry, Timon Fliervoet, Stephen Hsu, Joerg Zimmermann, Matthias Roesch, Bartosz Bilski, Paul Graeupner
Pubblicato in: Extreme Ultraviolet (EUV) Lithography X, Numero 2019, 2019, Pagina/e 5, ISBN 9781-510625624
Editore: SPIE
DOI: 10.1117/12.2514952

High-NA EUV lithography exposure tool progress

Autori: Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, Joerg Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser
Pubblicato in: Extreme Ultraviolet (EUV) Lithography X, Numero 2019, 2019, Pagina/e 3, ISBN 9781-510625624
Editore: SPIE
DOI: 10.1117/12.2515205

High-NA EUV lithography exposure tool progress (Conference Presentation)

Autori: Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Hans Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Erik Loopstra, Bernhard Kneer, Sascha Migura
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2018, Numero 2018, 2018, Pagina/e 33, ISBN 9781-510622142
Editore: SPIE
DOI: 10.1117/12.2502894

Reduction in overlay error from mark asymmetry using simulation and alignment models

Autori: Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudharshanan Raghunathan, Leendertjan Karssemeijer, Irina Lyulina, Jonathan Lee, Igor Aarts, Krishanu Shome, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Chung-Tien Li, Jan Hermans, Philippe Leray
Pubblicato in: Optical Microlithography XXXI, Numero 2018, 2018, Pagina/e 11, ISBN 9781-510616677
Editore: SPIE
DOI: 10.1117/12.2297493

Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

Autori: Ting-Ju Yueh, Miao-Chi Chen, Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen, John Lin, Kevin Cheng, Alexander Padi, Cathy Wang, Jean Phillippe van Damme, Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Jason Hung, Amy Chen, Floris Teeuwisse, Robin Tijssen, Marcel Mastenbroek, Harald Vos, Wilson Tzeng, Laurens van Bokhoven, Niels Lammers
Pubblicato in: Optical Microlithography XXXI, Numero 2018, 2018, Pagina/e 8, ISBN 9781-510616677
Editore: SPIE
DOI: 10.1117/12.2297387

Holistic feedforward control for the 5 nm logic node and beyond

Autori: Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens
Pubblicato in: Optical Microlithography XXXII, Numero 2019, 2019, Pagina/e 18, ISBN 9781-510625709
Editore: SPIE
DOI: 10.1117/12.2515449

Advanced Processing for Quantitative Sub-surface Data Extraction (poster presentation)

Autori: Laurent Fillinger, Mehmet S. Tamer, Maarten H. v. Es, Marco v.d.Lans
Pubblicato in: Semicon Innovation Day 2019, Numero 21-05-2019, 2019
Editore: TNO Optomechatronics

Frequency Modulation Sub-surface Atomic Force Microscopy (poster presentation)

Autori: Aliasghar Keyvani, Mehmet S. Tamer, Maarten H. v. Es, Marco v.d.Lans
Pubblicato in: Semicon Innovation Day 2019, Numero 21-05-2019, 2019
Editore: TNO Optomechatronics

High Resolution SubSurface Probe Microscopy for node5 applications

Autori: Maarten H. van Es, Laurent Fillinger, Mehmet S. Tamer, Marco van der Lans
Pubblicato in: Semicon Innovation Day 2019, Numero 21-05-2019, 2019
Editore: TNO Optomechatronics

Sub-surface Imaging with Photo Thermal Actuation(poster presentation)

Autori: Maarten E. v. Reijzen, Mehmet S. Tamer, Maarten H. v. Es, Martijn v. Riel, Tom Duivenvoorde Aliasghar Keyvani, Hamed Sadeghian, Marco v.d. Lans
Pubblicato in: Semicon Innovation Day 2019, Numero 21-05-2019, 2019
Editore: TNO Optomechatronics

Quantitative tomography with subsurface scanning ultrasound resonance force microscopy

Autori: Maarten H. van Es, Laurent Fillinger, Hamed Sadeghian
Pubblicato in: Metrology, Inspection, and Process Control for Microlithography XXXIII, 2019, Pagina/e 20, ISBN 9781-510625662
Editore: SPIE
DOI: 10.1117/12.2515048

Improved sub-surface AFM using photothermal actuation

Autori: Maarten E. van Reijzen, Mehmet S. Tamer, Maarten H. van Es, Martijn M. C. J. M. van Riel, Sasan Keyvani, Hamed Sadeghian, Marco van der Lans
Pubblicato in: Metrology, Inspection, and Process Control for Microlithography XXXIII, Numero 2 July 2019, 2019, Pagina/e 19, ISBN 9781-510625662
Editore: SPIE
DOI: 10.1117/12.2515441

High-NA EUV imaging: challenges and outlook

Autori: Bartosz Bilski, Joerg Zimmermann, Matthias Roesch, Jack Liddle, Eelco van Setten, Gerardo Bottiglieri, Jan van Schoot
Pubblicato in: 35th European Mask and Lithography Conference (EMLC 2019), Numero 2019, 2019, Pagina/e 42, ISBN 9781-510630680
Editore: SPIE
DOI: 10.1117/12.2536329

High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)

Autori: Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2019, Numero 2019, 2019, Pagina/e 34, ISBN 9781-510629981
Editore: SPIE
DOI: 10.1117/12.2538325

High-NA EUV lithography: pushing the limits

Autori: Claus Zahlten, P. Gräupner, Jan van Schoot, Peter Kuerz, J. Stoeldraijer, Winfried Kaiser
Pubblicato in: 35th European Mask and Lithography Conference (EMLC 2019), Numero 2019, 2019, Pagina/e 43, ISBN 9781-510630680
Editore: SPIE
DOI: 10.1117/12.2536469

Advancing EUV lithography optics (Conference Presentation)

Autori: Heiko Feldmann, Olaf Conradi, Paul Graeupner, Jan van Schoot, Peter Kuerz, Winfried Kaiser
Pubblicato in: International Conference on Extreme Ultraviolet Lithography 2019, Numero 2019, 2019, Pagina/e 2, ISBN 9781-510629981
Editore: SPIE
DOI: 10.1117/12.2538927

High-NA EUV Optics – The key for miniaturization of integrated circuits in the next decade

Autori: Heiko Feldmann, Paul Graupner, Peter Kurz, Winfried Kaiser
Pubblicato in: ESSDERC 2019 - 49th European Solid-State Device Research Conference (ESSDERC), Numero 2019, 2019, Pagina/e 61-63, ISBN 978-1-7281-1539-9
Editore: IEEE
DOI: 10.1109/essderc.2019.8901696

Pushing limits of optical lithography: Status and future perspectives of EUVL optics

Autori: Lars Wischmeier
Pubblicato in: "17th Workshop ""Beams and More"", Suttgart, 2019", Numero 2019, 2019
Editore: ims chips, Stuttgart, Germany

Process window discovery methodology for extreme ultraviolet (EUV) lithography

Autori: Sandip Halder, Dieter Van den Heuvel, Stephane Lariviere, Philippe Leray, Kaushik Sah, Andrew Cross, Antonio Mani
Pubblicato in: Metrology, Inspection, and Process Control for Microlithography XXXIII, Numero 2019, 2019, Pagina/e 65, ISBN 9781-510625662
Editore: SPIE
DOI: 10.1117/12.2515805

High-NA EUV lithography optics becomes reality

Autori: L. Wischmeier, P. Gräupner, P. Kürz, W. Kaiser (ZEISS) , J. v. Schoot, J. Mallmann, J. d. Pee, J. Stoeldraijer (ASML)
Pubblicato in: 2020
Editore: SPIE

Heavily Ce 3+ -doped Y 3 Al 5 O 12 thin films deposited by a polymer sol–gel method for fast scintillation detectors

Autori: Kateřina Rubešová, Jan Havlíček, Vít Jakeš, Ladislav Nádherný, Jakub Cajzl, Dalibor Pánek, Tomáš Parkman, Alena Beitlerova, Romana Kučerková, František Hájek, Martin Nikl
Pubblicato in: CrystEngComm, Numero 21/34, 2019, Pagina/e 5115-5123, ISSN 1466-8033
Editore: Royal Society of Chemistry
DOI: 10.1039/c9ce00842j

Inspection of stochastic defects with broadband plasma optical systems for extreme ultraviolet (EUV) lithography

Autori: Kaushik Sah, Sandip Halder, Andrew Cross, Philippe Leray
Pubblicato in: IEEE Transactions on Semiconductor Manufacturing, 2020, Pagina/e 1-1, ISSN 0894-6507
Editore: Institute of Electrical and Electronics Engineers
DOI: 10.1109/tsm.2019.2963483

Chapter 5: Optical Systems for EUVL

Autori: S. Migura, W. Kaiser, J.T. Neumann, H. Enkisch, D. Hellweg
Pubblicato in: EUV Lithography, 2nd Edition, Numero 2018, 2018, Pagina/e 225-333, ISBN 9781-510616783
Editore: SPIE Press

Diritti di proprietà intellettuale

Lastabtragende Haltestruktur

Numero candidatura/pubblicazione: 10 2018219375
Data: 2018-11-13
Candidato/i: CARL ZEISS SMT GMBH

Conductive Fluid Based Non-contaminating / No Wear Electrical Transfer Device for Translating Stages

Numero candidatura/pubblicazione: WO 2018046280 A1
Data: 2017-08-18

Optische Anordnung, insbesondere für ein EUV-Lithographiesystem

Numero candidatura/pubblicazione: 10 2018218162
Data: 2018-10-24
Candidato/i: CARL ZEISS SMT GMBH

VERFAHREN UND VORRICHTUNG ZUR ANORDNUNG VON KLEINDIMENSIONIERTEN BAUTEILEN AN BAUGRUPPEN MIT EXAKTER AUSRICHTUNG DER BAUTEILE AN DER BAUGRUPPE

Numero candidatura/pubblicazione: 10 2018206967
Data: 2018-05-04
Candidato/i: CARL ZEISS SMT GMBH

Gas injection systems for particle suppression

Numero candidatura/pubblicazione: WO 2019020449 A1
Data: 2018-07-18

Improved overlay by in slit wafer heating correction from infra red heat flux

Numero candidatura/pubblicazione: WO 2018041491 A1
Data: 2017-07-28

Particle suppression systems and methods

Numero candidatura/pubblicazione: WO 2019020450 A1
Data: 2018-07-18

VERFAHREN ZUR ÜBERPRÜFUNG DER FUNKTIONSFÄHIGKEIT VON INDUKTIVEN SENSOREN

Numero candidatura/pubblicazione: 10 2018219595
Data: 2018-11-15
Candidato/i: CARL ZEISS SMT GMBH

Particle traps and barriers for particle suppression

Numero candidatura/pubblicazione: WO 2019020445 A1
Data: 2018-07-18

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