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Pilot Integration of 3nm Semiconducter technology

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Publications

High-NA EUV lithography optics becomes reality

Author(s): Lars Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan Van Schoot, Jörg Mallmann, Joost de Pee, Judon Stoeldraijer
Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 4, ISBN 9781510634145
Publisher: SPIE
DOI: 10.1117/12.2543308

Metrology of thin resist for high NA EUVL

Author(s): Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh,
Published in: SPIE Advanced Lithography + Patterning, 2022, ISBN 978-1-5106-4981-1
Publisher: Society of Photo-Optical Instrumentation Engineers (SPIE)
DOI: 10.1117/12.2614046

High-NA EUV lithography exposure tool: advantages and program progress

Author(s): Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser
Published in: SPIE Photomask Technology + EUV Lithography, Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020, 2020
Publisher: SPIE
DOI: 10.1117/12.2572932

High NA EUV optics: preparing lithography for the next big step

Author(s): Paul Graeupner, Peter Kuerz, Jan Van Schoot, Judon Stoeldraijer
Published in: SPIE Photomask Technology + EUV Lithography, Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021, 2021
Publisher: SPIE
DOI: 10.1117/12.2600962

Mask defect detection with hybrid deep learning network

Author(s): Peter Evanschitzky, Nicole Auth, Tilmann Heil, Christian Felix Hermanns, Andreas Erdmann
Published in: Journal of Micro/Nanopatterning, Materials, and Metrology, 2021, ISSN 1932-5150
Publisher: S P I E - International Society for Optical Engineering
DOI: 10.1117/1.jmm.20.4.041205