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Pilot Integration of 3nm Semiconducter technology

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High-NA EUV lithography optics becomes reality

Author(s): Lars Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan Van Schoot, Jörg Mallmann, Joost de Pee, Judon Stoeldraijer
Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 4, ISBN 9781510634145
Publisher: SPIE
DOI: 10.1117/12.2543308

High-NA EUV lithography exposure tool: advantages and program progress

Author(s): Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser
Published in: SPIE Photomask Technology + EUV Lithography, Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020, 2020
Publisher: SPIE
DOI: 10.1117/12.2572932

High NA EUV optics: preparing lithography for the next big step

Author(s): Paul Graeupner, Peter Kuerz, Jan Van Schoot, Judon Stoeldraijer
Published in: SPIE Photomask Technology + EUV Lithography, Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021, 2021
Publisher: SPIE
DOI: 10.1117/12.2600962

Mask defect detection with hybrid deep learning network

Author(s): Peter Evanschitzky, Nicole Auth, Tilmann Heil, Christian Felix Hermanns, Andreas Erdmann
Published in: Journal of Micro/Nanopatterning, Materials, and Metrology, 2021, ISSN 1932-5150
Publisher: S P I E - International Society for Optical Engineering
DOI: 10.1117/1.jmm.20.4.041205