Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Información del proyecto

Nanolace

Identificador del acuerdo de subvención: 863127

DOI 10.3030/863127

Fecha de la firma de la CE 24 Septiembre 2019

Fecha de inicio 1 Enero 2020

Fecha de finalización 31 Diciembre 2024

Financiado con arreglo a

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Coste total € 3 642 284,24

Aportación de la UE € 3 356 511,75

Coordinado por

UNIVERSITETET I BERGEN
Norway

Resultado final

Demonstrators, pilots, prototypes (3)

He* prototype resist

Synthesis of He* prototype resist to be supplied to WP5

Helium Ion Beam Resist

Synthesis of Helium Ion Beam Resist

Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Websites, patent fillings, videos etc. (1)

Website online and logo created

Public website available online and logo of the project created

Open Research Data Pilot (1)

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Publicaciones

Peer reviewed articles (2)

Realistic mask generation for matter-wave lithography via machine learning

Autores: Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Publicado en: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Editor: IOP Publishing
DOI: 10.1088/2632-2153/acd988

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Autores: Johannes Fiedler; Bodil Holst
Publicado en: Journal of Physics B: Atomic, Molecular and Optical Physics, Edición 00223700, 2022, ISSN 0022-3700
Editor: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41