Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Informacje na temat projektu

Nanolace

Identyfikator umowy o grant: 863127

DOI 10.3030/863127

Data podpisania przez KE 24 Września 2019

Data rozpoczęcia 1 Stycznia 2020

Data zakończenia 31 Grudnia 2024

Finansowanie w ramach

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Koszt całkowity € 3 642 284,24

Wkład UE € 3 356 511,75

Koordynowany przez

UNIVERSITETET I BERGEN
Norway

Rezultaty

Demonstrators, pilots, prototypes (3)

He* prototype resist

Synthesis of He* prototype resist to be supplied to WP5

Helium Ion Beam Resist

Synthesis of Helium Ion Beam Resist

Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Websites, patent fillings, videos etc. (1)

Website online and logo created

Public website available online and logo of the project created

Open Research Data Pilot (1)

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Publikacje

Peer reviewed articles (2)

Realistic mask generation for matter-wave lithography via machine learning

Autorzy: Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Opublikowane w: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Wydawca: IOP Publishing
DOI: 10.1088/2632-2153/acd988

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Autorzy: Johannes Fiedler; Bodil Holst
Opublikowane w: Journal of Physics B: Atomic, Molecular and Optical Physics, Numer 00223700, 2022, ISSN 0022-3700
Wydawca: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41