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Zawartość zarchiwizowana w dniu 2024-06-11

DESIGN, STUDY AND CONSTRUCTION OF MICROPOWER SOURCES AND THEIR USE IN MICROELECTRONICS AND COMMUNICATION TECHNOLOGIES

CORDIS oferuje możliwość skorzystania z odnośników do publicznie dostępnych publikacji i rezultatów projektów realizowanych w ramach programów ramowych HORYZONT.

Odnośniki do rezultatów i publikacji związanych z poszczególnymi projektami 7PR, a także odnośniki do niektórych konkretnych kategorii wyników, takich jak zbiory danych i oprogramowanie, są dynamicznie pobierane z systemu OpenAIRE .

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A microbattery is a battery designed and built with thin film technologies. It is a new concept. The encapsulation of the microbatteries is crucial. In order to decrease the thickness of the assembly (air and moisture), a new tight barrier is tested. This film is an iron phosphate-based glass deposited by sputtering. A new large machine able to produce 500 microbatteries per week was designed. Microbatteries can be used to power all small devices where flatness is a prime necessity and low current (100 - 200 µA/cm2) is required, e.g. it can be integrated in small flat objects like smart cards, tags, wireless electronic shelf edge labels. New solid-state micropower sources have recently been studied and developed. Then, thin secondary lithium batteries can be integrated in small flat objects like smart cards, tags, wireless electronic shelf edge labels for example. The active unit cell is only 10µm thick. The unit cell is composed of current collectors, a positive titanium oxysulfide electrode, an amorphous lithium borate based electrolyte and a negative lithium electrode. These thin films are deposited using sputtering and thermal evaporation technology. The microbattery is encapsulated to protect it from moisture. A battery can typically provide 100-200 µA/cm2, more than 1000 cycles (discharge/charge) an OCV of 2.6V and an average voltage discharge of about 2.3V. To increase the performance, new materials (electrolyte and positive electrode materials) were studied. Microwave was used to prepare both materials and sputtering target. This original method is very rapid and useful.

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