14 Anstrom CMOS IC technology

Project Information

14ACMOS

Grant agreement ID: 101096772

DOI

10.3030/101096772

EC signature date 27 November 2022

Start date 1 December 2022

End date 30 November 2025

Funded under

• Digital, Industry and Space

Total cost

€ 94 640 401,81

EU contribution

€ 21 859 931,81

Coordinated by

ASML NETHERLANDS B.V.
Netherlands

CORDIS provides links to public deliverables and publications of HORIZON projects.

Links to deliverables and publications from FP7 projects, as well as links to some specific result types such as dataset and software, are dynamically retrieved from OpenAIRE .

Publications

Other (1)

RGA developments at TNO

Author(s): Koops R.
Published in: EVC-17, 2024
Publisher: 17th European Vacuum Conference (EVC-17)

Peer reviewed articles (3)

Machine Learning‐Accelerated Reconstruction of Periodic Nanostructures with X‐ray Fluorescence Spectroscopy Methods

Author(s): Vinh‐Binh Truong, Analía Fernández Herrero, Kas Andrle, Victor Soltwisch, Philipp Hönicke
Published in: Advanced Materials Interfaces, Issue 12, 2025, ISSN 2196-7350
Publisher: Wiley
DOI: 10.1002/ADMI.202400898

Hybrid approach to reconstruct nanoscale grating dimensions using scattering and fluorescence with soft X-rays

Author(s): Leonhard M. Lohr, Richard Ciesielski, Vinh-Binh Truong, Victor Soltwisch
Published in: Nanoscale, Issue 17, 2025, ISSN 2040-3364
Publisher: Royal Society of Chemistry (RSC)
DOI: 10.1039/D4NR04580G

IEEE Transactions on Semiconductor Manufacturing

Author(s): I.-Y. Liu; L. Van Winckel; L. Boakes; M. Garcia Bardon; C. Rolin; L.-Å. Ragnarsson
Published in: IEEE Transactions on Semiconductor Manufacturing, 2024, ISSN 0894-6507
Publisher: IEEE
DOI: 10.1109/TSM.2024.3408926

Conference proceedings (5)

Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Author(s): Richard Ciesielski, Roger Loo, Yosuke Shimura, Janusz Bogdanowicz, Antonio Mani, Christoph Mitterbauer, Vinh-Binh Truong, Michael Kolbe, Victor Soltwisch
Published in: Metrology, Inspection, and Process Control XXXVIII, 2024
Publisher: SPIE
DOI: 10.1117/12.3009953

Novel metrology for mask degradation: IR-AFM, XPS depth profiling and HAXPES

Author(s): Véronique de Rooij, Shriparna Mukherjee, Chien-Ching Wu, Rob P. Ebeling, Komal Pandey, Maarten van Es, Rik Jonckheere
Published in: Photomask Technology 2024, 2024
Publisher: SPIE
DOI: 10.1117/12.3032757

Critical In-Line OCD Metrology for CFET Manufacturing

Author(s): NOVA: Joey Hung, Adam Michal Urbanowicz, Ronen Urenski, Igor Turovets, Avron Ger; IMEC: Hyukyun Kwon, Thomas Tseng, Mohamed Saib, Janusz Bogdanowicz, Stephanie Melhem, Daisy Zhou, Yong Kong Siew, Debashish Basu, Anne-Laure Charley, Jason Reifsnider
Published in: “ SPIE Advanced Lithography + Patterning [conference], 2025
Publisher: SPIE

Opportunities of polarization-resolved EUV scatterometry on photomasks

Author(s): Victor Soltwisch, Till Biskup, Michael Kolbe, Frank Scholze
Published in: 38th European Mask and Lithography Conference (EMLC 2023), 2023
Publisher: SPIE
DOI: 10.1117/12.2675921

EUV Source Metrology Using Transmissive and Diffractive Optics

Author(s): Muharrem Bayraktar
Published in: 2024 Source Workshop, 2024
Publisher: EUV Litho Inc.