Tuning of PHOtonic resonators

Informacje na temat projektu

TUPHO

Identyfikator umowy o grant: 101123050

DOI

10.3030/101123050

Projekt został zamknięty

Data podpisania przez KE 3 Sierpnia 2023

Data rozpoczęcia 1 Grudnia 2023

Data zakończenia 31 Maja 2025

Finansowanie w ramach

• European Research Council (ERC)

Koszt całkowity

Brak danych

Wkład UE

€ 150 000,00

Koordynowany przez

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS
France

Periodic Reporting for period 1 - TUPHO (Tuning of PHOtonic resonators)

Okres sprawozdawczy: 2023-12-01 do 2025-05-31

Podsumowanie kontekstu i ogólnych celów projektu

Nanoscale manufacturing, particularly of integrated photonics, has faced significant challenges in the resolution and error of cleanroom devices. Although the dimensional errors have been reduced to between 1 and 10 nanometres, manufacturing technology is pressed to keep up with the need for more and more components in increasingly compact spaces, both to limit losses and to enhance applicability. The ERC-funded TUPHO project aims to address this problem with its patented technique to resolve errors permanently at the end of the manufacturing process, enabling the tuning of photonic resonators with unprecedented accuracy. The project will enable the scientists to transpose the technique onto select silicon devices for easy use by manufacturers.

Prace wykonane od początku projektu do końca okresu sprawozdawczego oraz najważniejsze dotychczasowe rezultaty

A tuning technique for photonic devices, which had been established by the partner in III_V semiconductor devices a few years back, has been transposed to silicon during the project. This tuning technique now enables correcting fabrication errors typically found at the output of clean-room fabrication processes. On top of this technical achievement, a business analysis was carried and a project of start-up incorporation could be established on solid grounds. The project will be pursued by a transitioning phase towards concrete use-cases and a scale-up of the technology.

Innowacyjność oraz oczekiwany potencjalny wpływ (w tym dotychczasowe znaczenie społeczno-gospodarcze i szersze implikacje społeczne projektu)

The project demonstrated a technique to tune silicon-based photonic resonator with a dimension precision at the picometer-level, 4 orders of magnitude more precise that the current state-of-the-art in clean-room fabrication processes. The technique was patented towards the project's end, and is now being tested in selected use-cases.