Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
(s’ouvre dans une nouvelle fenêtre)
Auteurs:
Luong Nguyen Dang, Li-Ting Tseng, Anil Rajak, Thomas Gädda, Markus Laukkanen, Jagadish Salunke, Shima Moosakkani, Jyri Paulasaari, Juha Rantala, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci
Éditeur:
SPIE
DOI:
10.1117/12.3014297
Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
(s’ouvre dans une nouvelle fenêtre)
Auteurs:
Dang, Luong Nguyen; Tseng, Li-Ting; Rajak, Anil; Gädda, Thomas; Laukkanen, Markus; Salunke, Jagadish; Moosakkani, Shima; Paulasaari, Jyri; Rantala, Juha; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin
Publié dans:
Advances in Patterning Materials and Processes XLI
Éditeur:
SPIE
DOI:
10.1117/12.3014297
Semiconductor Chips Enabling the Era of AI and Advanced Photonic Applications
Auteurs:
Thomas Gädda, Anton Anisimov, Lily Tseng, Kimmo Karaste, Lauri Manner, Neha Thakur, Uula Kantojärvi, Juha Rantala
Éditeur:
European Photonics Industry Consortium