Skip to main content
Vai all'homepage della Commissione europea (si apre in una nuova finestra)
italiano italiano
CORDIS - Risultati della ricerca dell’UE
CORDIS
Contenuto archiviato il 2024-04-16

Metal-Organic Research for Semiconductor Epitaxy

Obiettivo

The MORSE project aims to develop novel non-toxic precursors and to test their quality by MOVPE and CBE.
The overall project objectives are to: develop new, better suited group III and V precursors for metal organic vapour phase epitaxy (MOVPE) and chemical beam epitaxy (CBE) growth applications. The precursor studies aim to identify new source materials which provide both improved operational characteristics (primarily vapour pressure, stability and toxicity) and also reduced unintentional impurity uptake in the resulting epitaxial layers; and to appraise the new CBE technique for the growth of advanced III-V demonstrator devices such as gallium arsenide/gallium aluminium arsenide and gallium arsenide/gallium indium phosphide heterojunction bipolar transistors (HBT) in order to allow direct comparison with corresponding devices produced using the present generation molecular beam epitaxy (MBE) and MOVPE growth processes. Alternative new liquid organic precursors have been synthesized and characterized. Studies on biphosphinoethane (BPE) or tertiary butyl phosphine (TBP) and tertiary butyl arsine (TBAs) had led to the conclusion that state of the art, highly uniform multiple quantum well (MQW) laser structures can be grown using these much safer precursors.
Diethyl-aluminium-hydride-trimethylamine (DEAlH-NMe3) appears to be the best suited new aluminium precursor, with higher vapour pressure than TEAL (x 5), and low carbon and oxygen contamination when tested in CBE.
Studies on indium prescursors concentrated on dimethylaminopropy-dimethyl-indium (DADI). This compound is a promising candidated, being liquid at room temperature and having a high vapour pressure comparable to that of TEIn. High quality indium phosphide has been reproducibly grown with best low temperature mobilities of u(77 k) greater than 110000 cm{2} V{-1} s{-1}.
Preliminary experiments have been conducted on the growth of gallium indium phosphide with TBP. As observed in the case of indium phosphide, carbon concentrations are strongly reduced by using TBP instead of phosphide. No significant differ ence is noted for the sulphur, silicon and oxygen levels.
High n-type doping of CBE gallium arsenide and gallium indium phosphide has been successfully achieved using concentrated sources of disilane and hydrogen sulphide. Thanks to its higher incorporation efficiency with lower memory effect, hydrogen sulphide preferred to disilane as n-type dopant for both gallium arsenide and gallium indium phosphide. An ultra-high level gallium arsenide p-type doping capability has also been established using the TMGa precursor for specific application to the base region of the HBT device.
The overall objectives were to:

- develop new, better suited group III and V precursors for MOVPE (metal organic vapour phase epitaxy) and CBE (chemical beam epitaxy) growth applications. The precursor studies aim to identify new source materials which provide both improved operational characteristics (primarily vapour pressure, stability and toxicity) and also reduced unintentional impurity uptake in the resulting epitaxial layers.
- appraise the new CBE technique for the growth of advanced III-V demonstrator devices such as GaAs/GaAlAs and GaAs/GaInP HBT, in order to allow direct comparison with corresponding devices produced using the present-generation MBE (molecular beam epitaxy) and MOVPE growth processes.

Campo scientifico (EuroSciVoc)

CORDIS classifica i progetti con EuroSciVoc, una tassonomia multilingue dei campi scientifici, attraverso un processo semi-automatico basato su tecniche NLP. Cfr.: Il Vocabolario Scientifico Europeo.

È necessario effettuare l’accesso o registrarsi per utilizzare questa funzione

Programma(i)

Programmi di finanziamento pluriennali che definiscono le priorità dell’UE in materia di ricerca e innovazione.

Argomento(i)

Gli inviti a presentare proposte sono suddivisi per argomenti. Un argomento definisce un’area o un tema specifico per il quale i candidati possono presentare proposte. La descrizione di un argomento comprende il suo ambito specifico e l’impatto previsto del progetto finanziato.

Dati non disponibili

Invito a presentare proposte

Procedura per invitare i candidati a presentare proposte di progetti, con l’obiettivo di ricevere finanziamenti dall’UE.

Dati non disponibili

Meccanismo di finanziamento

Meccanismo di finanziamento (o «Tipo di azione») all’interno di un programma con caratteristiche comuni. Specifica: l’ambito di ciò che viene finanziato; il tasso di rimborso; i criteri di valutazione specifici per qualificarsi per il finanziamento; l’uso di forme semplificate di costi come gli importi forfettari.

Dati non disponibili

Coordinatore

Thomson CSF
Contributo UE
Nessun dato
Indirizzo
Domaine de Corbeville
91404 Orsay
Francia

Mostra sulla mappa

Costo totale

I costi totali sostenuti dall’organizzazione per partecipare al progetto, compresi i costi diretti e indiretti. Questo importo è un sottoinsieme del bilancio complessivo del progetto.

Nessun dato

Partecipanti (9)

Il mio fascicolo 0 0