Novel approach to Area selective Deposition for BEOL Interconnect Applications

Project Information

NADIA

Grant agreement ID: 888163

DOI 10.3030/888163

Project closed

EC signature date 6 April 2020

Start date 1 September 2020

End date 31 August 2022

Funded under

• EXCELLENT SCIENCE - Marie Skłodowska-Curie Actions

Total cost € 178 320,00

EU contribution € 178 320,00

Coordinated by

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
Belgium

Publications

Peer reviewed articles (3)

Vapor deposited thin organic–inorganic capping layers preventing copper line oxidation in polymer-based RDL technologies

Author(s): Chery, Emmanueal; Brady-Boyd, Anita; Lin, Yuyuan; Grimes, Michael; Springer, David; Slabbekoorn, John; Walsby, Edward; Croes, Kristof; Beyne, Eric
Published in: Microelectron. Eng., Issue 01679317, 2022, ISSN 0167-9317
Publisher: Elsevier BV
DOI: 10.1016/j.mee.2022.111896

Investigating the Efficacy of Hafnium Dioxide Barrier Layers to Halt Copper Oxide Formation in Redistribution Layers for Three- Dimensional (3D) Packaging

Author(s): Brady-Boyd, Anita; Chery, Emmanuel; Armini, Silvia
Published in: J. Phys. Chem. Lett., Issue 19487185, 2022, ISSN 1948-7185
Publisher: American Chemical Society
DOI: 10.1021/acs.jpclett.2c02080

The Role of Atomic Oxygen in the Decomposition of Self-Assembled Monolayers During Area-Selective Atomic Layer Deposition

Author(s): Brady-Boyd, Anita; O' Connor, Robert; Armini, Silvia; Selvaraju, Venkateswaran; Pasquali, Mattia; Hughes, Greg; Bogan, Justin
Published in: Crossref, Issue 01694332, 2022, ISSN 0169-4332
Publisher: Elsevier BV
DOI: 10.1016/j.apsusc.2022.152679