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Technology Advances for Pilotline of Enhanced Semiconductors for 3nm

Publications

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Author(s): Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS, Issue 19/04, 2020, ISSN 1932-5150
DOI: 10.1117/1.jmm.19.4.041001

Multi-patterning strategies for navigating the sub-5 nm frontier, part 2

Author(s): Jae Uk Lee, Ryoung-han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy
Published in: 2019

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Author(s): Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hoenicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Vijayakrishnan Nair, Eric Hendrickx
Published in: Extreme Ultraviolet Lithography 2020, 2020, Page(s) 28
DOI: 10.1117/12.2573125

Additional real-time diagnostics on the EBL2 EUV exposure facility

Author(s): Peter van der Walle, Jetske K. Stortelder, Chien-Ching Wu, Henk Lensen, Norbert B. Koster
Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 66
DOI: 10.1117/12.2552011

Multi-patterning strategies for navigating the sub-5 nm frontier, part 1

Author(s): Jae Uk Lee, Ryoung-han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy
Published in: 2019

Mask absorber for next generation EUV lithography

Author(s): Meiyi Wu, Devesh Thakare, Jean-François de Marneffe, Patrick Jaenen, Laurent Souriau, Karl Opsomer, Jean-Philippe Soulié, Andreas Erdmann, Hazem Mesilhy, Philipp Naujok, Markus Foltin, Victor Soltwisch, Qais Saadeh, Vicky Philipsen
Published in: Extreme Ultraviolet Lithography 2020, 2020, Page(s) 2
DOI: 10.1117/12.2572114

High-NA EUV lithography optics becomes reality

Author(s): Lars Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan Van Schoot, Jörg Mallmann, Joost de Pee, Judon Stoeldraijer
Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 4
DOI: 10.1117/12.2543308

High-NA EUV Lithography Exposure Tool - Advantages and Program Progress

Author(s): Jan van Schoot, Eelco van Setten, Ruben Maas, Kars Troost, Jo Finders, Sjoerd Lok, Rudy Peeters, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser
Published in: 2020

High-NA EUV Optics – The key for miniaturization of integrated circuits in the next decade

Author(s): Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser
Published in: 2019

Characterization and Mitigation of 3D Mask Effects in Extreme Ultraviolet Lithography

Author(s): ] Erdmann, A., Xu, D., Evanschitzky, P., Philipsen, V., Luong, V., Hendrickx, E.
Published in: 2017

High-NA EUV Lithography Exposure System - Advantages and Program Progress

Author(s): Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser
Published in: 2020

Self-aligned block technology: a step toward further scaling

Author(s): Frédéric Lazzarino, Nihar Mohanty, Yannick Feurprier, Lior Huli, Vinh Luong, Marc Demand, Stefan Decoster, Victor Vega Gonzalez, Julien Ryckaert, Ryan Ryoung Han Kim, Arindam Mallik, Philippe Leray, Chris Wilson, Jürgen Boemmels, Kaushik Kumar, Kathleen Nafus, Anton deVilliers, Jeffrey Smith, Carlos Fonseca, Julie Bannister, Steven Scheer, Zsolt Tokei, Daniele Piumi, Kathy Barla
Published in: Advanced Etch Technology for Nanopatterning VI, 2017, Page(s) 1014908
DOI: 10.1117/12.2258028

Sub-40mV Sigma-VTH IGZO nFETs in 300mm Fab

Author(s): Jerome Mitard, Luka Kljucar, Nouredine Rassoul, Harold F. W. Dekkers, Michiel van Setten, Adrian Chasin, Geoffrey Pourtois, Attilio Belmonte, Romain Delhougne, Gabriele Luca Donadio, Ludovic Goux, Manoj Nag, Chris Wilson, Zsolt Tokei, Jose Ignacio del agua Borniquel, Soeren Steudel and Gouri Sankar Kar
Published in: ECS Transactions, Issue 98 (7), 2020, Page(s) 205-217

Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

Author(s): Philipsen, V., Luong, K.V., Souriau, L., Erdmann, A., Evanschitzky, P., van de Kruijs, R.W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S., Reuter, C., Hendrickx, E.
Published in: Journal of Micro/Nanolithography MEMS and MOEMS 16, 2017

High-NA EUV Optics –the Key for Miniaturizationof Integrated Circuitsin the Next Decade

Author(s): Bartosz Bilski, Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser
Published in: 2019

VLSI Keynote: EUVL - Optics: Status and Future Perspectives

Author(s): Winfried Kaiser
Published in: 2019

Optics for EUV Lithography

Author(s): Sascha Migura
Published in: 2019

Datasets

The anisotropy in the optical constants of quartz crystals for soft X-rays

Author(s): Andrle, Anna; Hönicke, Philipp; Vinson, Jon; Quintanilha, Richard; Saadeh, Qais; Heidenreich, Sebastian; Scholze, Frank; Soltwisch, Victor
Published in: Zenodo