Publications Peer reviewed articles (4) Perspectives and tradeoffs of absorber materials for high NA EUV lithography Author(s): Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS, Issue 19/04, 2020, ISSN 1932-5150 Publisher: S P I E - International Society for Optical Engineering DOI: 10.1117/1.jmm.19.4.041001 Very-High Dynamic Range, 10,000 Frames/Second Pixel Array Detector for Electron Microscopy Author(s): Hugh T. Philipp, Mark W. Tate, Katherine S. Shanks, Luigi Mele, Maurice Peemen, Pleun Dona, Reinout Hartong, Gerard van Veen, Yu-Tsun Shao, Zhen Chen, Julia Thom-Levy, David A. Muller, Sol M. Gruner Published in: Microscopy and Microanalysis, Issue Volume 28, Issue 2, March 2022, 2022, ISSN 1431-9276 Publisher: Cambridge University Press DOI: 10.1017/s1431927622000174 Dynamics of crosshatch patterns in heteroepitaxy Author(s): Fabrizio Rovaris, Marvin H. Zoellner, Peter Zaumseil, Anna Marzegalli, Luciana Di Gaspare, Monica De Seta, Thomas Schroeder, Peter Storck, Georg Schwalb, Giovanni Capellini, and Francesco Montalenti Published in: PHYSICAL REVIEW B, Issue Phys. Rev. B 100, 085307, 2019, ISSN 2469-9969 Publisher: American Physical Society DOI: 10.1103/physrevb.100.085307 Controlling the relaxation mechanism of low strain Si1−xGex/Si(001) layers and reducing the threading dislocation density by providing a preexisting dislocation source Author(s): L. Becker, P. Storck, T. Schulz, M. H. Zoellner, L. Di Gaspare, F. Rovaris, A. Marzegalli, F. Montalenti, M. De Seta, G. Capellini, G. Schwalb, T. Schroeder, M. Albrecht Published in: Journal of Applied Physics, Issue Journal of Applied Physics 128, 215305 (2020), 2020, ISSN 0021-8979 Publisher: American Institute of Physics DOI: 10.1063/5.0032454 Conference proceedings (19) SALELE process from theory to fabrication Author(s): Youssef Drissi, Werner Gillijns, Jae Uk Lee, Ryan Ryoung han Kim, Ahmed Hamed Fatehy, Rehab K. Ali, Rajiv Sejpal, Germain Fenger, James Word Published in: Design-Process-Technology Co-optimization for Manufacturability XIII, 2019, Page(s) 30, ISBN 9781510625723 Publisher: SPIE DOI: 10.1117/12.2517051 Multi-patterning strategies for navigating the sub-5 nm frontier, part 2 Author(s): Jae Uk Lee, Ryoung-han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy Published in: 2019 Publisher: EDN Network Study of EUV reticle storage effects through exposure on EBL2 and NXE Author(s): Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hoenicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Vijayakrishnan Nair, Eric Hendrickx Published in: Extreme Ultraviolet Lithography 2020, 2020, Page(s) 28, ISBN 9781510638433 Publisher: SPIE DOI: 10.1117/12.2573125 Better prediction on patterning failure mode with hotspot aware OPC modeling Author(s): Chih-I Wei, Stewart Wu, Yunfei Deng, Gurdaman Khaira, Ir Kusnadi, Germain Fenger, Seulki Kang, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns, Gian Lorusso Published in: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 2021, Page(s) 32, ISBN 9781510640566 Publisher: SPIE DOI: 10.1117/12.2583837 Additional real-time diagnostics on the EBL2 EUV exposure facility Author(s): Peter van der Walle, Jetske K. Stortelder, Chien-Ching Wu, Henk Lensen, Norbert B. Koster Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 66, ISBN 9781510634145 Publisher: SPIE DOI: 10.1117/12.2552011 Optical design of EUV attenuated PSM for contact-hole applications Author(s): Chang-Nam Ahn, Dong-Seok Nam, Nakgeuon Seong, Anthony Yen Published in: SPIE Advanced Lithography, Issue Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090D (2021), 2021 Publisher: SPIE DOI: 10.1117/12.2583462 Exploring patterning limit and enhancement techniques to improve printability of 2D shapes at 3nm node Author(s): Rehab Kotb Ali, Ahmed Hamed Fatehy, James Word Published in: Design-Process-Technology Co-optimization for Manufacturability XIV, 2020, Page(s) 33, ISBN 9781510634244 Publisher: SPIE DOI: 10.1117/12.2552091 Multi-patterning strategies for navigating the sub-5 nm frontier, part 1 Author(s): Jae Uk Lee, Ryoung-han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy Published in: 2019 Publisher: EDN Network Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula Author(s): Azat Latypov, Gurdaman Khaira, Germain L. Fenger, John L. Sturtevant, Chih-I Wei, Peter De Bisschop Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 17, ISBN 9781510634145 Publisher: SPIE DOI: 10.1117/12.2551965 Investigation into a prototype EUV attenuated phase-shift mask Author(s): Claire van Lare, Frank Timmermans, Jo Finders, Olena Romanets, Cheuk-Wah Man, Paul van Adrichem, Yohei Ikebe, Takeshi Aizawa, Takahiro Onoue Published in: SPIE Advanced Lithography, Issue Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090A (2021), 2021 Publisher: SPIE DOI: 10.1117/12.2584725 Mask absorber for next generation EUV lithography Author(s): Meiyi Wu, Devesh Thakare, Jean-François de Marneffe, Patrick Jaenen, Laurent Souriau, Karl Opsomer, Jean-Philippe Soulié, Andreas Erdmann, Hazem Mesilhy, Philipp Naujok, Markus Foltin, Victor Soltwisch, Qais Saadeh, Vicky Philipsen Published in: Extreme Ultraviolet Lithography 2020, 2020, Page(s) 2, ISBN 9781510638433 Publisher: SPIE DOI: 10.1117/12.2572114 High-NA EUV lithography optics becomes reality Author(s): Lars Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan Van Schoot, Jörg Mallmann, Joost de Pee, Judon Stoeldraijer Published in: Extreme Ultraviolet (EUV) Lithography XI, 2020, Page(s) 4, ISBN 9781510634145 Publisher: SPIE DOI: 10.1117/12.2543308 High-NA EUV Lithography Exposure Tool - Advantages and Program Progress Author(s): Jan van Schoot, Eelco van Setten, Ruben Maas, Kars Troost, Jo Finders, Sjoerd Lok, Rudy Peeters, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser Published in: 2020 Publisher: EUVL Workshop 2020 High-NA EUV Optics – The key for miniaturization of integrated circuits in the next decade Author(s): Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser Published in: 2019 Publisher: ESSCIRC/ESSDERC 2019, Cracow, Poland Realizing more accurate OPC models by utilizing SEM contours Author(s): Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns Published in: Metrology, Inspection, and Process Control for Microlithography XXXIV, 2020, Page(s) 2, ISBN 9781510634183 Publisher: SPIE DOI: 10.1117/12.2554527 Characterization and Mitigation of 3D Mask Effects in Extreme Ultraviolet Lithography Author(s): ] Erdmann, A., Xu, D., Evanschitzky, P., Philipsen, V., Luong, V., Hendrickx, E. Published in: 2017 Publisher: Advanced Optical Technologies 6 High-NA EUV Lithography Exposure System - Advantages and Program Progress Author(s): Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser Published in: 2020 Publisher: SPIE Self-aligned block technology: a step toward further scaling Author(s): Frédéric Lazzarino, Nihar Mohanty, Yannick Feurprier, Lior Huli, Vinh Luong, Marc Demand, Stefan Decoster, Victor Vega Gonzalez, Julien Ryckaert, Ryan Ryoung Han Kim, Arindam Mallik, Philippe Leray, Chris Wilson, Jürgen Boemmels, Kaushik Kumar, Kathleen Nafus, Anton deVilliers, Jeffrey Smith, Carlos Fonseca, Julie Bannister, Steven Scheer, Zsolt Tokei, Daniele Piumi, Kathy Barla Published in: Advanced Etch Technology for Nanopatterning VI, 2017, Page(s) 1014908 Publisher: SPIE DOI: 10.1117/12.2258028 First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials Author(s): Jetske Stortelder, Robert P. Ebeling, Corné Rijnsent, Michel van Putten, Veronique de Rooij-Lohmann, Maximilian Smit, Arnold J. Storm, Norbert Koster, Henk A. Lensen, Vicky Philipsen, Karl Opsomer, Devesh Thakare, Torsten Feigl, Philipp Naujok Published in: International Conference on Extreme Ultraviolet Lithography 2021, 2021, Page(s) 19, ISBN 9781510645530 Publisher: SPIE DOI: 10.1117/12.2600928 Other (9) Techniques for SAMP cut/block mask design decomposition Author(s): BY JAE UK LEE, RYOUNG HAN KIM, DAVID ABERCROMBIE, AND REHAB KOTB ALI Published in: 2021 Publisher: EDN.com Progress in High NA EUV Optics Development of sub-10nm resolution Author(s): Lars Wischmeier Published in: 2020 Publisher: ESSCIRC/ESSDERC 2020, Dresden, Germany High NA EUV optics: preparing lithography for the next big step Author(s): Paul Graeupner Published in: 2021 Publisher: ESSCIRC/ESSDERC 2021, Grenoble, France Multi-patterning strategies for navigating the sub-5 nm frontier, part 3 Author(s): Jae Uk Lee, Ryoung-han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy Published in: 2020 Publisher: EDN.com Comparing multi-patterning at 5nm: SADP, SAQP, and SALELE Author(s): Jae Uk Lee, Apoorva Oak, Ryoung Han Kim, David Abercrombie, Rehab Kotb Ali, Ahmed Hamed-Fatehy Published in: 2019 Publisher: Siemens High-NA EUV Optics –the Key for Miniaturizationof Integrated Circuitsin the Next Decade Author(s): Bartosz Bilski, Heiko Feldmann, Paul Gräupner, Peter Kürz, Winfried Kaiser Published in: 2019 Publisher: ESSCIRC/ESSDERC 2019, Cracow, Poland VLSI Keynote: EUVL - Optics: Status and Future Perspectives Author(s): Winfried Kaiser Published in: 2019 Publisher: VLSI-TSA 2019 Optics for EUV Lithography Author(s): Sascha Migura Published in: 2019 Publisher: EUVL Workshop Self-aligned multi-patterning Track decomposition techniques Author(s): Jae Uk Lee, David Abercrombie, Rehab Kotb Ali Published in: 2020 Publisher: Siemens Non-peer reviewed articles (2) Sub-40mV Sigma-VTH IGZO nFETs in 300mm Fab Author(s): Jerome Mitard, Luka Kljucar, Nouredine Rassoul, Harold F. W. Dekkers, Michiel van Setten, Adrian Chasin, Geoffrey Pourtois, Attilio Belmonte, Romain Delhougne, Gabriele Luca Donadio, Ludovic Goux, Manoj Nag, Chris Wilson, Zsolt Tokei, Jose Ignacio del agua Borniquel, Soeren Steudel and Gouri Sankar Kar Published in: ECS Transactions, Issue 98 (7), 2020, Page(s) 205-217 Publisher: The Electrochemical Society Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers Author(s): Philipsen, V., Luong, K.V., Souriau, L., Erdmann, A., Evanschitzky, P., van de Kruijs, R.W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S., Reuter, C., Hendrickx, E. Published in: Journal of Micro/Nanolithography MEMS and MOEMS 16, 2017 Publisher: Journal of Micro/Nanolithography MEMS and MOEMS 16 Searching for OpenAIRE data... There was an error trying to search data from OpenAIRE No results available
