Risultati finali
•Program: Review of the R&D activities on stand-alone techniques of the first two 3DAM years •Authors: specialists of the 3DAM partner companies, academia and research institutes. •Timing: April 2018, right after the imec Partner Technical Week •Place: imec premises •Publication: => HD video recording of the lecturer, synchronized with a HD screen-recording of the presentation slides => PDF versions of the presentations will also be available => The result is a set of technical/scientific presentations open to the public, and on-line accessible on any device (laptop, tablet) through the Imec Academy streaming facilities •Participants: open to the public after registration at Imec Academy
Workshops year 1 and publication of presented material•Program: reviews of the 2016 state-of-the-art of metrology and characterization techniques relevant for 3DAM •Authors: specialists from the 3DAM partner companies. •Timing: April 2017, right after the imec Partner Technical Week •Place: imec premises •Publication: => HD video recording of the lecturer, synchronized with a HD screen-recording of the presentation slides => PDF versions of the presentations will also be available => The result is an e-learning package which can be used as a tutorial on HVM metrology, open to the public, and on-line accessible on any device (laptop, tablet) through the Imec Academy streaming facilities •Participants: open to the public after registration at Imec Academy
Workshops year 3 and publication of presented material•Program: Review of the hybrid/correlative techniques as from the results obtained during 3DAM •Authors: specialists from the 3DAM partner companies. •Timing: March 2019 •Place: MINATEC Grenoble •Publication: => PDF versions of the presentations will be available for the participant at the workshop •Participants: open to the public after registration
Pubblicazioni
Autori:
Steven Folkersma, Janusz Bogdanowicz, Andreas Schulze, Paola Favia, Dirch H Petersen, Ole Hansen, Henrik H Henrichsen, Peter F Nielsen, Lior Shiv, Wilfried Vandervorst
Pubblicato in:
Beilstein Journal of Nanotechnology, Numero 9, 2018, Pagina/e 1863-1867, ISSN 2190-4286
Editore:
Beilstein-Institut Zur Forderung der Chemischen Wissenschaften
DOI:
10.3762/bjnano.9.178
Autori:
David M. A. Mackenzie, Patrick R. Whelan, Peter Bøggild, Peter Uhd Jepsen, Albert Redo-Sanchez, David Etayo, Norbert Fabricius, Dirch Hjorth Petersen
Pubblicato in:
Optics Express, Numero 26/7, 2018, Pagina/e 9220, ISSN 1094-4087
Editore:
Optical Society of America
DOI:
10.1364/oe.26.009220
Autori:
David M. A. Mackenzie, Jonas D. Buron, Patrick R. Whelan, José M. Caridad, Martin Bjergfelt, Birong Luo, Abhay Shivayogimath, Anne L. Smitshuysen, Joachim D. Thomsen, Timothy J. Booth, Lene Gammelgaard, Johanna Zultak, Bjarke S. Jessen, Peter Bøggild, Dirch H. Petersen
Pubblicato in:
Nano Research, Numero 10/10, 2017, Pagina/e 3596-3605, ISSN 1998-0124
Editore:
Tsinghua Univ Press
DOI:
10.1007/s12274-017-1570-y
Autori:
Alberto Cagliani, Frederik W. Østerberg, Ole Hansen, Lior Shiv, Peter F. Nielsen, Dirch H. Petersen
Pubblicato in:
Review of Scientific Instruments, Numero 88/9, 2017, Pagina/e 095005, ISSN 0034-6748
Editore:
American Institute of Physics
DOI:
10.1063/1.4989994
Autori:
David M A Mackenzie, Vishal Panchal, Héctor Corte-León, Dirch H Petersen, Olga Kazakova
Pubblicato in:
2D Materials, Numero 6/2, 2019, Pagina/e 025023, ISSN 2053-1583
Editore:
IOP Publishing Ltd
DOI:
10.1088/2053-1583/ab0572
Autori:
Patrick R. Whelan, Vishal Panchal, Dirch H. Petersen, David M. A. Mackenzie, Christos Melios, Iwona Pasternak, John Gallop, Frederik W. Østerberg, Peter U. Jepsen, Wlodek Strupinski, Olga Kazakova, Peter Bøggild
Pubblicato in:
ACS Applied Materials & Interfaces, Numero 10/37, 2018, Pagina/e 31641-31647, ISSN 1944-8244
Editore:
American Chemical Society
DOI:
10.1021/acsami.8b11428
Autori:
T. Nuytten, J. Bogdanowicz, L. Witters, G. Eneman, T. Hantschel, A. Schulze, P. Favia, H. Bender, I. De Wolf, W. Vandervorst
Pubblicato in:
APL Materials, Numero 6/5, 2018, Pagina/e 058501, ISSN 2166-532X
Editore:
APL Materials
DOI:
10.1063/1.4999277
Diritti di proprietà intellettuale
Numero candidatura/pubblicazione:
USPTO for US20180012728A1
Application for US20180012728A1
Data:
2018-01-11
Candidato/i:
APPLIED MATERIALS ISRAEL LTD
Numero candidatura/pubblicazione:
US
US 16/106,914
Data:
2018-08-21
Candidato/i:
FEI ELECTRON OPTICS BV
È in corso la ricerca di dati su OpenAIRE...
Si è verificato un errore durante la ricerca dei dati su OpenAIRE
Nessun risultato disponibile